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Precise measurement of optical constants of thin films in soft X-ray region

Research Project

Project/Area Number 15H03592
Research Category

Grant-in-Aid for Scientific Research (B)

Allocation TypeSingle-year Grants
Section一般
Research Field Quantum beam science
Research InstitutionUniversity of Hyogo

Principal Investigator

Kinoshita Hiroo  兵庫県立大学, 産学連携・研究推進機構, 特任教授 (50285334)

Co-Investigator(Kenkyū-buntansha) 原田 哲男  兵庫県立大学, 高度産業科学技術研究所, 助教 (30451636)
村松 康司  兵庫県立大学, 工学研究科, 教授 (50343918)
渡邊 健夫  兵庫県立大学, 高度産業科学技術研究所, 教授 (70285336)
Co-Investigator(Renkei-kenkyūsha) WATANABE Takeo  兵庫県立大学, 高度産業科学技術研究所, 教授 (70285336)
MURAMATSU Yasuji  兵庫県立大学, 工学研究科, 教授 (50343918)
Project Period (FY) 2015-04-01 – 2018-03-31
Project Status Completed (Fiscal Year 2017)
Budget Amount *help
¥13,520,000 (Direct Cost: ¥10,400,000、Indirect Cost: ¥3,120,000)
Fiscal Year 2017: ¥2,600,000 (Direct Cost: ¥2,000,000、Indirect Cost: ¥600,000)
Fiscal Year 2016: ¥2,470,000 (Direct Cost: ¥1,900,000、Indirect Cost: ¥570,000)
Fiscal Year 2015: ¥8,450,000 (Direct Cost: ¥6,500,000、Indirect Cost: ¥1,950,000)
Keywords光学定数 / 透過率 / 吸収係数 / フォトレジスト / 極端紫外線 / フィルター / 多層膜 / 反射率 / フォトダイオード / PMMA / 軟X線 / 軟X線 / 偏光 / 軟X線光学定数
Outline of Final Research Achievements

In order to evaluate the optical constants, accurate reflectance evaluation is required. Significant things are higher order light removal, polarization control, scattering component removal. Among them, a high order light control mechanism and a polarization control mechanism were developed, and a beam line capable of accurate optical constant evaluation was constructed. In particular, the absorption coefficient of photoresist has become an important parameter of resist development, and the measured values by transmission method and reflection method are compared. In addition, the optical constants of Si, Mo, Zr, Si3N4, and TaN which are often used in the EUV region were measured. Furthermore, in the resonance absorption region of the carbon K absorption end of the photoresist, the optical constant was measured by the reflection method and compared with the spectrum measured by the total electron yield method.

Report

(4 results)
  • 2017 Annual Research Report   Final Research Report ( PDF )
  • 2016 Annual Research Report
  • 2015 Annual Research Report
  • Research Products

    (22 results)

All 2017 2016 2015 Other

All Journal Article (6 results) (of which Peer Reviewed: 4 results,  Open Access: 6 results) Presentation (14 results) (of which Int'l Joint Research: 2 results,  Invited: 5 results) Book (1 results) Remarks (1 results)

  • [Journal Article] Absorption Coefficient Measurement Advanced Method of EUV Resist by Direct-Resist Coating on a Photodiode2017

    • Author(s)
      S. Niihara, D. Mamezaki, M. Watanabe, T. Harada, and T. Watanabe
    • Journal Title

      Journal of Photopolymer Science and Technology

      Volume: 30 Issue: 1 Pages: 87-92

    • DOI

      10.2494/photopolymer.30.87

    • NAID

      130005950331

    • ISSN
      0914-9244, 1349-6336
    • Related Report
      2017 Annual Research Report
    • Peer Reviewed / Open Access
  • [Journal Article] Phase Imaging Results of Phase Defect Using Micro Coherent EUV Scatterometry Microscope2016

    • Author(s)
      Tetsuo Harada, Hiraku Hashimoto, Tsuyoshi Amano, Hiroo Kinoshita
    • Journal Title

      J. Micro-Nanolith. Mem

      Volume: 15 Pages: 21007-21007

    • Related Report
      2015 Annual Research Report
    • Peer Reviewed / Open Access
  • [Journal Article] Actual defect observation results of an extreme ultraviolet blank mask by coherent diffraction imaging2016

    • Author(s)
      Tetsuo Harada, Hiraku Hashimoto, Tsuyoshi Amano, Hiroo Kinoshita
    • Journal Title

      Appl. Phys. Express

      Volume: 9 Pages: 35202-35202

    • NAID

      210000137831

    • Related Report
      2015 Annual Research Report
    • Peer Reviewed / Open Access
  • [Journal Article] Development of a reflectometer for a large EUV mirror in NewSUBARU2015

    • Author(s)
      Haruki Iguchi, Hiraku Hashimoto, Masaki Kuki, Tetsuo Harada, Takeo Watanabe, and Hiroo Kinoshita
    • Journal Title

      Proc. SPIE

      Volume: 9658 Pages: 965819-965819

    • Related Report
      2015 Annual Research Report
    • Open Access
  • [Journal Article] Development of element technologies for EUVL2015

    • Author(s)
      Hiroo Kinoshita, Takeo Watanabe and Tetsuo Harada
    • Journal Title

      Adv. Opt. Techn

      Volume: 4(4) Pages: 319-331

    • Related Report
      2015 Annual Research Report
    • Peer Reviewed / Open Access
  • [Journal Article] Phase Imaging Results of Phase Defect Using Micro Coherent EUV Scatterometry Microscope2015

    • Author(s)
      Tetsuo Harada, Hiraku Hashimoto, Tsuyoshi Amano, Hiroo Kinoshita
    • Journal Title

      Proc. SPIE

      Volume: 9635

    • Related Report
      2015 Annual Research Report
    • Open Access
  • [Presentation] EUV反射率計用のMo/Siワイドバンド多層膜偏光子の開発,2017

    • Author(s)
      渡辺雅紀、井口晴貴、原田哲男、渡邊健夫
    • Organizer
      第64回応用物理学会春季学術講演会
    • Place of Presentation
      横浜
    • Year and Date
      2017-03-14
    • Related Report
      2016 Annual Research Report
  • [Presentation] EUV反射率計用のMo/Siワイドバンド多層膜偏光子の開発,2017

    • Author(s)
      渡辺雅紀、井口晴貴、原田哲男、渡邊健夫
    • Organizer
      先端技術セミナー
    • Place of Presentation
      姫路
    • Year and Date
      2017-03-03
    • Related Report
      2016 Annual Research Report
  • [Presentation] EUV反射率計用の垂直偏光制御機構の開発2017

    • Author(s)
      原田哲男、井口晴貴、渡辺雅紀、渡邊健夫
    • Organizer
      第30回日本放射光学会年会・放射光科学合同シンポジウム
    • Place of Presentation
      神戸
    • Year and Date
      2017-01-08
    • Related Report
      2016 Annual Research Report
  • [Presentation] EUV反射率計用のワイドバンド多層膜偏光子の開発2017

    • Author(s)
      渡辺雅紀、井口晴貴、原田哲男、渡邊健夫
    • Organizer
      第30回日本放射光学会年会・放射光科学合同シンポジウム
    • Place of Presentation
      神戸
    • Year and Date
      2017-01-08
    • Related Report
      2016 Annual Research Report
  • [Presentation] EUV反射率計用の垂直偏光制御機構の開発2017

    • Author(s)
      原田哲男、井口晴貴、渡辺雅紀、渡邊健夫
    • Organizer
      放射光学会年会
    • Related Report
      2017 Annual Research Report
  • [Presentation] EUV反射率計用のワイドバンド多層膜偏光子の開発2017

    • Author(s)
      渡辺雅紀、井口晴貴、原田哲男、渡邊健夫
    • Organizer
      放射光学会年会
    • Related Report
      2017 Annual Research Report
  • [Presentation] 大型反射率計によるEUV集光ミラーの評価2017

    • Author(s)
      井口晴貴、橋本拓、原田哲男、渡邊健夫
    • Organizer
      放射光学会年会
    • Related Report
      2017 Annual Research Report
  • [Presentation] Absorption Coefficient Measurement Advanced Method of EUV Resist by Direct-Resist Coating on a Photodiode2017

    • Author(s)
      Shota Niihara, Daiki Mamezaki, Masanori Watanabe, Tetsuo Harada, and Takeo Watanabe
    • Organizer
      The 34th International Conference of Photopolymer Science and Technology (ICPST-34)
    • Related Report
      2017 Annual Research Report
  • [Presentation] フォトダイオード直接塗布法による EUVレジストの高精度な吸収係数測定法2017

    • Author(s)
      新原 章汰、豆﨑 大輝、渡辺 雅紀、原田 哲男、渡邊 健夫
    • Organizer
      第78回応用物理学会秋季学術講演会
    • Related Report
      2017 Annual Research Report
  • [Presentation] コヒーレントスキャトロメトリー顕微鏡を用いたマスク検査装置の開発2015

    • Author(s)
      木下博雄
    • Organizer
      レーザー学会第483回研究会
    • Place of Presentation
      広島大学
    • Year and Date
      2015-12-02
    • Related Report
      2015 Annual Research Report
    • Invited
  • [Presentation] 30 years have passed from the first experiment2015

    • Author(s)
      Hiroo Kinoshita
    • Organizer
      EUVL Symposium
    • Place of Presentation
      Maastricht Netherlland
    • Year and Date
      2015-10-06
    • Related Report
      2015 Annual Research Report
    • Int'l Joint Research / Invited
  • [Presentation] Early Stage of EUVL Development2015

    • Author(s)
      HirooKinoshita
    • Organizer
      Next Generation Lithography 応用物理学会分科会
    • Place of Presentation
      東京工業大学
    • Year and Date
      2015-07-07
    • Related Report
      2015 Annual Research Report
    • Invited
  • [Presentation] 極端紫外線リソグラフィー研究30年2015

    • Author(s)
      木下博雄
    • Organizer
      半導体親和会
    • Place of Presentation
      NTT 武蔵野研究所
    • Year and Date
      2015-06-05
    • Related Report
      2015 Annual Research Report
    • Invited
  • [Presentation] 30 years of R&D of EUVL and its mask inspection technologies2015

    • Author(s)
      Hiroo Kinoshita
    • Organizer
      Photo mask Japan 2015
    • Place of Presentation
      Pacifico Yokohama Japan
    • Year and Date
      2015-04-22
    • Related Report
      2015 Annual Research Report
    • Int'l Joint Research / Invited
  • [Book] Extreme Ultraviolet Lithography -Principles and elements technology2016

    • Author(s)
      Hiroo Kinoshita
    • Total Pages
      160
    • Publisher
      OmniScritum GmbH& Co.KG
    • Related Report
      2016 Annual Research Report
  • [Remarks] http://www.lasti.u-hyogo.ac.jp

    • Related Report
      2016 Annual Research Report

URL: 

Published: 2015-04-16   Modified: 2019-03-29  

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