| Budget Amount *help |
¥17,550,000 (Direct Cost: ¥13,500,000、Indirect Cost: ¥4,050,000)
Fiscal Year 2017: ¥2,860,000 (Direct Cost: ¥2,200,000、Indirect Cost: ¥660,000)
Fiscal Year 2016: ¥1,950,000 (Direct Cost: ¥1,500,000、Indirect Cost: ¥450,000)
Fiscal Year 2015: ¥12,740,000 (Direct Cost: ¥9,800,000、Indirect Cost: ¥2,940,000)
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| Outline of Final Research Achievements |
Low-energy electron diffraction apparatus using field emission gun has been developed. The electron beams were emitted from tungsten tips those were sharpened by chemical electro-polish and field-assisted gas etching. The field-assisted gas etching was done in the ultra-high vacuum chamber using oxygen, nitrogen and water vapor, and the tip apexes were atomically sharpened. These tip apexes could emit electron beams at low energies with small opening angles, and the beams were focused on the sample surfaces using magnetic lenses. The diffracted electron beams were measured by microchannel plate. The spot sizes of obtained diffraction patterns were smaller (40%) than those of the conventional apparatus. The origin of sharpness of the developed apparatus is high coherence length of the field emission beams. It demonstrates that the new apparatus opens up a way to analyze very complex surface structures.
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