Photoalignment of functional polymeric films by controlling the polymer-free surface adjustment
Project/Area Number |
15H03869
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Research Category |
Grant-in-Aid for Scientific Research (B)
|
Allocation Type | Single-year Grants |
Section | 一般 |
Research Field |
Polymer/Textile materials
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Research Institution | University of Hyogo |
Principal Investigator |
|
Co-Investigator(Kenkyū-buntansha) |
春山 雄一 兵庫県立大学, 高度産業科学技術研究所, 准教授 (10316036)
近藤 瑞穂 兵庫県立大学, 工学研究科, 助教 (70447564)
|
Project Period (FY) |
2015-04-01 – 2018-03-31
|
Project Status |
Completed (Fiscal Year 2017)
|
Budget Amount *help |
¥17,810,000 (Direct Cost: ¥13,700,000、Indirect Cost: ¥4,110,000)
Fiscal Year 2017: ¥3,380,000 (Direct Cost: ¥2,600,000、Indirect Cost: ¥780,000)
Fiscal Year 2016: ¥2,860,000 (Direct Cost: ¥2,200,000、Indirect Cost: ¥660,000)
Fiscal Year 2015: ¥11,570,000 (Direct Cost: ¥8,900,000、Indirect Cost: ¥2,670,000)
|
Keywords | 高分子液晶 / 光配向 / 光化学 / 自己組織化 / 機能性高分子 / 光科学 / 高分子構造・物性 / 界面制御 / 水素結合 / 光機能性高分子 / 光応答性 / 外部応答液晶フィルム |
Outline of Final Research Achievements |
A selective introduction of photosensitivity to the polymeric film by adjusting the H-bond and in-situ reaction such as condensation at the free surface attained a precise photoinduced orientation (photoalignment) of the film. Especially, we have successfully investigated the formation of photoreactive Schiff base using a polymeric film containing phenyl aldehyde side groups coating of a amine derivatives, which showed the photoinduced orientation, and introduction of the H-bond between a benzoic acid derivatives and Schiff base and/or cinnamic acid derivatives which showed selective photoalignment and introduction of the photoinactivity of the aligned film.
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Report
(4 results)
Research Products
(73 results)