| Project/Area Number |
15H03913
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| Research Category |
Grant-in-Aid for Scientific Research (B)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Fluid engineering
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| Research Institution | Tohoku University |
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Principal Investigator |
ISHIMOTO JUN 東北大学, 流体科学研究所, 教授 (10282005)
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| Co-Investigator(Kenkyū-buntansha) |
堀邊 英夫 大阪市立大学, 大学院工学研究科, 教授 (00372243)
松浦 一雄 愛媛大学, 大学院理工学研究科, 准教授 (20423577)
真田 俊之 静岡大学, 大学院総合科学技術研究科, 准教授 (50403978)
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| Co-Investigator(Renkei-kenkyūsha) |
OCHIAI NAOYA 東北大学, 流体科学研究所, 助教 (40614508)
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| Research Collaborator |
Combescure Alain INSA de Lyon, LaMCoS, 教授
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| Project Period (FY) |
2015-04-01 – 2018-03-31
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| Project Status |
Completed (Fiscal Year 2017)
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| Budget Amount *help |
¥17,030,000 (Direct Cost: ¥13,100,000、Indirect Cost: ¥3,930,000)
Fiscal Year 2017: ¥3,120,000 (Direct Cost: ¥2,400,000、Indirect Cost: ¥720,000)
Fiscal Year 2016: ¥3,770,000 (Direct Cost: ¥2,900,000、Indirect Cost: ¥870,000)
Fiscal Year 2015: ¥10,140,000 (Direct Cost: ¥7,800,000、Indirect Cost: ¥2,340,000)
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| Keywords | 混相流 / 極低温 / 微粒化 / 流体解析 / 噴霧 / 半導体洗浄 / 超高熱流束 / 冷却 / ナノ洗浄 |
|---|
| Outline of Final Research Achievements |
The application of cryogenic high-speed spray of micro-solid nitrogen (SN2) to the non-aqueous resist-removal and ultra-cleaning system of semiconductor wafer is a focus of great interest.
In the present study, we have newly developed the new single-component micro-nano SN2 particle production method by using super adiabatic Laval nozzle (converging-diverging nozzle). The physical photo resist removal-cleaning performance using cryogenic particulate spray are investigated by a new type of integrated ToF-SIMS, XPS measurement coupled supercomputing technique. As a result, it has been clarified that the newly developed cryogenic spray cleaning method is effective particularly for the removal and cleaning process of novolac type resists.
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