| Budget Amount *help |
¥16,120,000 (Direct Cost: ¥12,400,000、Indirect Cost: ¥3,720,000)
Fiscal Year 2017: ¥4,160,000 (Direct Cost: ¥3,200,000、Indirect Cost: ¥960,000)
Fiscal Year 2016: ¥4,290,000 (Direct Cost: ¥3,300,000、Indirect Cost: ¥990,000)
Fiscal Year 2015: ¥7,670,000 (Direct Cost: ¥5,900,000、Indirect Cost: ¥1,770,000)
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| Outline of Final Research Achievements |
Boron nitride films have attracted much attention recently due to the unique structures such as sp2- and sp3-bonded phases. In this study, the structure modification induced by plasma exposure was investigated in detail. It was found that the change in the indentation hardness strongly depends on the energy of incident ions from plasma. Molecular dynamics simulations predicted that the transition from sp3-bonded to sp2-bonded phases was observed in the surface region of the prepared structures. Moreover, the observed phase change was confirmed to be a function of the energy of incident ions. The present findings imply that the ion-energy control during plasma exposure was key to the structure optimization of BN films in future.
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