Development of anion-doped oxide epitaxy
| Project/Area Number |
15H05424
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| Research Category |
Grant-in-Aid for Young Scientists (A)
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| Allocation Type | Single-year Grants |
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| Research Field |
Thin film/Surface and interfacial physical properties
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| Research Institution | The University of Tokyo |
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Principal Investigator |
Chikamatsu Akira 東京大学, 大学院理学系研究科(理学部), 助教 (40528048)
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| Project Period (FY) |
2015-04-01 – 2018-03-31
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| Project Status |
Completed (Fiscal Year 2017)
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| Budget Amount *help |
¥24,960,000 (Direct Cost: ¥19,200,000、Indirect Cost: ¥5,760,000)
Fiscal Year 2017: ¥1,820,000 (Direct Cost: ¥1,400,000、Indirect Cost: ¥420,000)
Fiscal Year 2016: ¥1,820,000 (Direct Cost: ¥1,400,000、Indirect Cost: ¥420,000)
Fiscal Year 2015: ¥21,320,000 (Direct Cost: ¥16,400,000、Indirect Cost: ¥4,920,000)
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| Keywords | 複合アニオン / エピタキシャル薄膜 / 薄膜新材料 / 複合アニオン化合物薄膜 / エピタキシャル |
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| Outline of Final Research Achievements |
I developed new thin-film growth techniques of mixed-anion transition metal oxides by combining pulsed-laser deposition and topotactic synthesis methods. In this study, I succeeded in creating some new mixed-anion oxide films and mixed-anion oxide/oxide heterostructures by these methods. Anion-doping oxide epitaxy is an effective way to search for new functionalities and new phenomena in mixed-anion transition metal oxides.
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Report
(4 results)
Research Products
(41 results)
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[Journal Article] Topotactic fluorination of perovskite strontium ruthenate thin films using polyvinylidene fluoride2017
Author(s)
K. Kawahara, A. Chikamatsu, T. Katayama, T. Onozuka, D. Ogawa, K. Morikawa, E. Ikenaga, Y. Hirose, I. Harayama, D. Sekiba, T. Fukumura, and T. Hasegawa
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Journal Title
CrystEngComm
Volume: 19
Issue: 2
Pages: 313-317
DOI
Related Report
Peer Reviewed / Acknowledgement Compliant
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