Mist CVD method for inorganic-organic perovskites solar-cell
| Project/Area Number |
15H06343
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| Research Category |
Grant-in-Aid for Research Activity Start-up
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| Allocation Type | Single-year Grants |
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| Research Field |
Crystal engineering
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| Research Institution | Kyoto Institute of Technology |
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Principal Investigator |
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| Project Period (FY) |
2015-08-28 – 2017-03-31
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| Project Status |
Completed (Fiscal Year 2016)
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| Budget Amount *help |
¥2,990,000 (Direct Cost: ¥2,300,000、Indirect Cost: ¥690,000)
Fiscal Year 2016: ¥1,430,000 (Direct Cost: ¥1,100,000、Indirect Cost: ¥330,000)
Fiscal Year 2015: ¥1,560,000 (Direct Cost: ¥1,200,000、Indirect Cost: ¥360,000)
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| Keywords | 有機無機ペロブスカイト / ミストCVD / 混晶 / 太陽電池 / 成膜技術 |
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| Outline of Final Research Achievements |
Mist CVD method is a promising technique for the deposition technology of semiconductors to achieve the use of both solution precursors and vapor phase processes. We demonstrated the deposition of inorganic-organic perovskites in the capor phase via a chemical reaction using the solution precursors. The formation mechanism of the inorganic-organic perovskites grown by the laminar flow-type mist CVD method is a vapor phase reaction in spite of the fact that the solution were used as the CVD precursors. Furthermore, the mist CVD was applied to the growth process for alloying inorganic-organic perovskites taking advantages of using the solution precursors. We have successfully grown the alloying inorganic-organic perovskites (CH3NH3Pb(Br1-xClx)3)by mist CVD.
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Report
(3 results)
Research Products
(3 results)
