Spin-dependent electron tunneling in a perpendicular orientated mesoporous silica thin films
Project/Area Number |
15K05982
|
Research Category |
Grant-in-Aid for Scientific Research (C)
|
Allocation Type | Multi-year Fund |
Section | 一般 |
Research Field |
Electronic materials/Electric materials
|
Research Institution | Shinshu University |
Principal Investigator |
HAEIWA Tetsuji 信州大学, 学術研究院工学系, 准教授 (60175528)
|
Project Period (FY) |
2015-10-21 – 2018-03-31
|
Project Status |
Completed (Fiscal Year 2017)
|
Budget Amount *help |
¥3,770,000 (Direct Cost: ¥2,900,000、Indirect Cost: ¥870,000)
Fiscal Year 2017: ¥1,170,000 (Direct Cost: ¥900,000、Indirect Cost: ¥270,000)
Fiscal Year 2016: ¥1,040,000 (Direct Cost: ¥800,000、Indirect Cost: ¥240,000)
Fiscal Year 2015: ¥1,560,000 (Direct Cost: ¥1,200,000、Indirect Cost: ¥360,000)
|
Keywords | メソポーラス薄膜 / 垂直配向 / 配向領域拡大 / 磁性金属充填 / 垂直配向メソ孔 / バイアス電圧依存性 / 規則化の向上 / 薄膜形成速度制御 |
Outline of Final Research Achievements |
I investigated optimization of the condition of the electric assist self-assembly method to get the perpendicular oriented hexagonal mesoporous silica thin films with magnetic metal particles in the mesopore. A bias electric field and constant current mode on low-resistive Si substrate were effective in oriented mesopore. Co particles filled using a pulse-plating method were deposited on substrate, not inside the mesopore, because of irregular structures of initial film layer and low adhesion of films. I investigate continually about regularization of initial layer of films and the adhesion improvement of films.
|
Report
(4 results)
Research Products
(5 results)