Design of thermally stable SiOC networks via hydrosilylation for the application to gas separation membranes
| Project/Area Number |
15K06544
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| Research Category |
Grant-in-Aid for Scientific Research (C)
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| Allocation Type | Multi-year Fund |
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| Section | 一般 |
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| Research Field |
Properties in chemical engineering process/Transfer operation/Unit operation
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| Research Institution | Hiroshima University |
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Principal Investigator |
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| Project Period (FY) |
2015-04-01 – 2018-03-31
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| Project Status |
Completed (Fiscal Year 2017)
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| Budget Amount *help |
¥4,940,000 (Direct Cost: ¥3,800,000、Indirect Cost: ¥1,140,000)
Fiscal Year 2017: ¥1,430,000 (Direct Cost: ¥1,100,000、Indirect Cost: ¥330,000)
Fiscal Year 2016: ¥1,560,000 (Direct Cost: ¥1,200,000、Indirect Cost: ¥360,000)
Fiscal Year 2015: ¥1,950,000 (Direct Cost: ¥1,500,000、Indirect Cost: ¥450,000)
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| Keywords | ゾル－ゲル法 / ヒドロシリル化 / SiOC構造 / 耐熱性 / 気体分離膜 / 分子ふるい / ゾル-ゲル法 |
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| Outline of Final Research Achievements |
In this project, SiOC membranes were fabricated by utilizing triethoxysilane (TRIES) and vinyltrimethoxysilane (VTMS) via sol-gel method. Amorphous SiOC structures were designed via the Si-O-Si unit by hydrolysis and condensation of silsesquioxane and the Si-C-C-Si unit via in-situ hydrosilylation. The network pore size was successfully controlled by the precursor ratio and thermal and oxidative stability was higher than conventional organosilica membranes.
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Report
(4 results)
Research Products
(26 results)
