Structural analysis of ABRZ formation at the resin-enamel interface
| Project/Area Number |
15K11105
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| Research Category |
Grant-in-Aid for Scientific Research (C)
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| Allocation Type | Multi-year Fund |
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| Section | 一般 |
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| Research Field |
Conservative dentistry
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| Research Institution | Tokyo Medical and Dental University |
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Principal Investigator |
NIKAIDO Toru 東京医科歯科大学, 大学院医歯学総合研究科, 講師 (00251538)
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| Co-Investigator(Kenkyū-buntansha) |
井上 剛 東京医科歯科大学, 大学院医歯学総合研究科, 助教 (40431928)
高垣 智博 東京医科歯科大学, 大学院医歯学総合研究科, 助教 (60516300)
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| Project Period (FY) |
2015-04-01 – 2018-03-31
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| Project Status |
Completed (Fiscal Year 2017)
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| Budget Amount *help |
¥4,680,000 (Direct Cost: ¥3,600,000、Indirect Cost: ¥1,080,000)
Fiscal Year 2017: ¥1,430,000 (Direct Cost: ¥1,100,000、Indirect Cost: ¥330,000)
Fiscal Year 2016: ¥1,430,000 (Direct Cost: ¥1,100,000、Indirect Cost: ¥330,000)
Fiscal Year 2015: ¥1,820,000 (Direct Cost: ¥1,400,000、Indirect Cost: ¥420,000)
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| Keywords | エナメル質 / ABRZ / 接着 / セルフエッチング接着システム / リン酸エッチング / 電子顕微鏡 / 接着試験 / セルフエッチングシステム / 歯質接着 / エナメル質ABRZ / 機能性モノマー / 化学結合 / フッ素徐放 |
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| Outline of Final Research Achievements |
A self-etching primer is much milder than phosphoric acid, which is concerned in enamel bonding. The purpose of this study was to evaluate the acid-base resistant zone (ABRZ) at the adhesive/enamel interface of self-etching adhesives with/without prior phosphoric acid etching. After application of self-etching adhesives on enamel surfaces, a flowable composite was placed. For observation of the acid-base resistant zone (ABRZ), the bonded interface was subjected to the acid-base challenge, morphological attributes of the interface were observed using SEM. ABRZ formation was confirmed in all groups, however, the morphology of the ABRZ was adhesive material dependent. The funnel-shaped erosion beneath the interface was present in one-step self-etch adhesives. With phosphoric acid etching, the ABRZs were obviously thicker compared with no phosphoric acid etching. In the case of the one-step self-etching adhesives, enamel etching should be recommended to improve the interfacial quality.
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Report
(4 results)
Research Products
(14 results)
