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Development of photoaddition with TiO2-SiC hybrid microreactor

Research Project

Project/Area Number 15K13651
Research Category

Grant-in-Aid for Challenging Exploratory Research

Allocation TypeMulti-year Fund
Research Field Organic chemistry
Research InstitutionMiyakonojo National College of Technology

Principal Investigator

Yamashita Toshiaki  都城工業高等専門学校, 物質工学科, 教授 (80191287)

Project Period (FY) 2015-04-01 – 2017-03-31
Project Status Completed (Fiscal Year 2016)
Budget Amount *help
¥1,950,000 (Direct Cost: ¥1,500,000、Indirect Cost: ¥450,000)
Fiscal Year 2016: ¥650,000 (Direct Cost: ¥500,000、Indirect Cost: ¥150,000)
Fiscal Year 2015: ¥1,300,000 (Direct Cost: ¥1,000,000、Indirect Cost: ¥300,000)
Keywordsマクロリアクター / 酸化チタン / 炭化ケイ素 / マイクロリアクター
Outline of Final Research Achievements

SiC and TiO2 films were deposited by the RF magnetron sputtering. In deposition of SiC the effect of the RF power and the pressure of argon on the deposition rate, the kinetic energy of sputtered particles, crystallinity and optical properties of the films were revealed. The control of the kinetic energy enabled crystallization of the SiC film(6H-SiC)in low temperature. As for the TiO2 film, photoreduction of nitro compounds in the narrow channel on the TiO2 film proceeded efficiently with the microreactor. Pt-loaded TiO2 film acted as a photocatalyst effectively in photoreduction and photoaddition of alkenes.

Report

(3 results)
  • 2016 Annual Research Report   Final Research Report ( PDF )
  • 2015 Research-status Report

URL: 

Published: 2015-04-16   Modified: 2018-03-22  

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