Development of Graphitic Carbon Nitride Thin Films for Electronic Devices
Project/Area Number |
15K13776
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Research Category |
Grant-in-Aid for Challenging Exploratory Research
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Allocation Type | Multi-year Fund |
Research Field |
Organic and hybrid materials
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Research Institution | Institute of Physical and Chemical Research |
Principal Investigator |
Miyajima Daigo 国立研究開発法人理化学研究所, 創発物性科学研究センター, 上級研究員 (60707826)
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Project Period (FY) |
2015-04-01 – 2018-03-31
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Project Status |
Completed (Fiscal Year 2017)
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Budget Amount *help |
¥4,030,000 (Direct Cost: ¥3,100,000、Indirect Cost: ¥930,000)
Fiscal Year 2017: ¥910,000 (Direct Cost: ¥700,000、Indirect Cost: ¥210,000)
Fiscal Year 2016: ¥650,000 (Direct Cost: ¥500,000、Indirect Cost: ¥150,000)
Fiscal Year 2015: ¥2,470,000 (Direct Cost: ¥1,900,000、Indirect Cost: ¥570,000)
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Keywords | グラフィックカーボンナイトライド / FET / 合成条件 / グラフィティックカーボンナイトライド / 屈折率 / グラフィックティックカーボンナイトライド / 薄膜 |
Outline of Final Research Achievements |
In this research program, we optimized the synthetic conditions for the preparation of highly oriented graphitic carbon nitride thin film for field-effect-transistors. After the optimization, the film quality was improved. Furthermore, we found that the obtained graphitic carbon nitride film features high refractive index.
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Report
(4 results)
Research Products
(7 results)
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[Patent(Industrial Property Rights)] 炭素材料の着色方法2016
Inventor(s)
荒添弘樹, 宮島大吾, 佐藤枝美子, 相田卓三
Industrial Property Rights Holder
荒添弘樹, 宮島大吾, 佐藤枝美子, 相田卓三
Industrial Property Rights Type
特許
Industrial Property Number
2016-107950
Filing Date
2016-05-30
Related Report
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