| Project/Area Number |
15K13841
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| Research Category |
Grant-in-Aid for Challenging Exploratory Research
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| Allocation Type | Multi-year Fund |
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| Research Field |
Production engineering/Processing studies
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| Research Institution | The University of Tokyo |
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Principal Investigator |
TAKAHASHI SATORU 東京大学, 先端科学技術研究センター, 教授 (30283724)
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| Co-Investigator(Kenkyū-buntansha) |
高増 潔 東京大学, 大学院工学系研究科(工学部), 教授 (70154896)
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| Project Period (FY) |
2015-04-01 – 2017-03-31
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| Project Status |
Completed (Fiscal Year 2016)
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| Budget Amount *help |
¥3,900,000 (Direct Cost: ¥3,000,000、Indirect Cost: ¥900,000)
Fiscal Year 2015: ¥3,900,000 (Direct Cost: ¥3,000,000、Indirect Cost: ¥900,000)
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| Keywords | ナノ欠陥 / ナノ計測 / 光計測 / シリコンウエハ / ナノ異物 / 欠陥検査 / シリコンウエハ基板 |
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| Outline of Final Research Achievements |
We propose a new optical measurement method, which can be applied to in-process inspection for nano particulate defects on a bare semiconductor wafer surface. The proposed method is uniquely characterized by combining a volatile inert liquid as a special near-field physical response sensing probe and a far-field optical sensing, vertical resolution of which goes beyond the nano-scale. The method can provide not only autonomously detect each nano defect by an inherent property of the volatile liquid but also simultaneously detect all defects located within a viewing field of the optical observation. Both theoretical and experimental analyses verified the basic feasibility of the proposed concept.
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