| Project/Area Number |
15K13954
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| Research Category |
Grant-in-Aid for Challenging Exploratory Research
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| Allocation Type | Multi-year Fund |
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| Research Field |
Electronic materials/Electric materials
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| Research Institution | Nara Institute of Science and Technology |
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Principal Investigator |
Nakamura Masakazu 奈良先端科学技術大学院大学, 物質創成科学研究科, 教授 (80332568)
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| Co-Investigator(Kenkyū-buntansha) |
松原 亮介 静岡大学, 工学部, 助教 (60611530)
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| Co-Investigator(Renkei-kenkyūsha) |
KOJIMA Hirotaka 奈良先端科学技術大学院大学, 物質創成科学研究科, 助教 (70713634)
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| Project Period (FY) |
2015-04-01 – 2018-03-31
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| Project Status |
Completed (Fiscal Year 2017)
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| Budget Amount *help |
¥3,900,000 (Direct Cost: ¥3,000,000、Indirect Cost: ¥900,000)
Fiscal Year 2017: ¥780,000 (Direct Cost: ¥600,000、Indirect Cost: ¥180,000)
Fiscal Year 2016: ¥1,820,000 (Direct Cost: ¥1,400,000、Indirect Cost: ¥420,000)
Fiscal Year 2015: ¥1,300,000 (Direct Cost: ¥1,000,000、Indirect Cost: ¥300,000)
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| Keywords | 有機薄膜 / 真空蒸着法 / 高速分子線 / 有機薄膜デバイス / プロセスコスト削減 / 有機トランジスタ / 有機太陽電池 |
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| Outline of Final Research Achievements |
To eliminate the disadvantages of vacuum-evaporation methods for the fabrication of organic semiconductor devices, long process time and high instrumental costs, the high-velocity molecular-beam (HVMB) cell with a hot capillary has been developed. By designing, manufacturing, and improving HVMB cells and general-use evaporation-source components, the growth rate became 50-fold faster than that by the conventional method. We have demonstrated that the total process time, including those for evacuation and cell heating/cooling, to fabricate a semiconductor layer of a transistor can be reduced to 1/3 of that by the conventional method. Sufficiently high carrier mobility is obtained by heating the substrate to 60°C even under the high-speed evaporation condition.
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