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Computational study of pattern formation process in scale-boundary region

Research Project

Project/Area Number 15K13978
Research Category

Grant-in-Aid for Challenging Exploratory Research

Allocation TypeMulti-year Fund
Research Field Electron device/Electronic equipment
Research InstitutionOsaka Prefecture University

Principal Investigator

YASUDA MASAAKI  大阪府立大学, 工学(系)研究科(研究院), 准教授 (30264807)

Co-Investigator(Kenkyū-buntansha) 小寺 正敏  大阪工業大学, 工学部, 教授 (40170279)
Co-Investigator(Renkei-kenkyūsha) HIRAI YOSHIHIKO  大阪府立大学, 工学研究科, 教授 (50285300)
Project Period (FY) 2015-04-01 – 2018-03-31
Project Status Completed (Fiscal Year 2017)
Budget Amount *help
¥3,900,000 (Direct Cost: ¥3,000,000、Indirect Cost: ¥900,000)
Fiscal Year 2017: ¥780,000 (Direct Cost: ¥600,000、Indirect Cost: ¥180,000)
Fiscal Year 2016: ¥1,170,000 (Direct Cost: ¥900,000、Indirect Cost: ¥270,000)
Fiscal Year 2015: ¥1,950,000 (Direct Cost: ¥1,500,000、Indirect Cost: ¥450,000)
Keywordsパターン形成 / 電子線リソグラフィ / 極端紫外線リソグラフィ / ナノインプリント / マルチスケールシミュレーション / スケール境界領域 / レジスト分子 / 分子動力学法 / 確率論的シミュレーション / マルチスケール解析 / 半導体リソグラフィ / モンテカルロ法
Outline of Final Research Achievements

Multiscale simulations are performed to clarify the factors to determine the pattern formation process in scale-boundary region. In the electron beam and extreme ultraviolet lithography, when the pattern size is enough large compared to the resist molecular size, the exposure and development conditions becomes dominant in the pattern formation process. However, the pattern size becomes smaller than the resist molecular size, the structure and behavior of the resist molecules largely affect the pattern formation process. In the nanoimprint lithography, the formed pattern structures are also determined by the relation between the pattern and resist molecular sizes.

Report

(4 results)
  • 2017 Annual Research Report   Final Research Report ( PDF )
  • 2016 Research-status Report
  • 2015 Research-status Report
  • Research Products

    (26 results)

All 2018 2017 2016 2015

All Journal Article (5 results) (of which Peer Reviewed: 5 results,  Open Access: 2 results,  Acknowledgement Compliant: 2 results) Presentation (21 results) (of which Int'l Joint Research: 13 results,  Invited: 6 results)

  • [Journal Article] Computational Study on UV Curing Characteristics in Nanoimprint Lithography: Stochastic Simulation2017

    • Author(s)
      M. Koyama, M. Shirai, H. Kawata, Y. Hirai and M. Yasuda
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 56 Issue: 6S1 Pages: 06GL03-06GL03

    • DOI

      10.7567/jjap.56.06gl03

    • NAID

      210000147920

    • Related Report
      2017 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Multiscale Simulation of the Development Process in Electron Beam Lithography2017

    • Author(s)
      M. Yasuda, S. Hitomi, H. Kawata and Y. Hirai
    • Journal Title

      Journal of Photopolymer Science and Technology

      Volume: 30 Issue: 2 Pages: 205-209

    • DOI

      10.2494/photopolymer.30.205

    • NAID

      130005950259

    • ISSN
      0914-9244, 1349-6336
    • Related Report
      2017 Annual Research Report
    • Peer Reviewed / Open Access
  • [Journal Article] Stochastic Simulation of the UV Curing Process in Nanoimprint Lithography: Pattern Size and Shape Effects in Sub-50 nm Lithography2017

    • Author(s)
      M. Koyama, M. Shirai, H. Kawata, Y. Hirai and M. Yasuda
    • Journal Title

      Journal of Vacuum Science and Technology B

      Volume: 35 Issue: 6

    • DOI

      10.1116/1.4997295

    • Related Report
      2017 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Multiphysics Simulation of Nanopatterning in Electron Beam Lithography2016

    • Author(s)
      M. Yasuda, K. Tada and M. Kotera
    • Journal Title

      Journal of Photopolymer Science and Technology

      Volume: 29 Issue: 5 Pages: 725-730

    • DOI

      10.2494/photopolymer.29.725

    • NAID

      130005261816

    • ISSN
      0914-9244, 1349-6336
    • Related Report
      2016 Research-status Report
    • Peer Reviewed / Open Access / Acknowledgement Compliant
  • [Journal Article] Multiscale simulation of resist pattern shrinkage during scanning electron microscope observations2015

    • Author(s)
      M. Yasuda, Y. Furukawa, H. Kawata and Y. Hirai
    • Journal Title

      Journal of Vacuum Science and Technology B

      Volume: 33 Issue: 6

    • DOI

      10.1116/1.4935956

    • Related Report
      2015 Research-status Report
    • Peer Reviewed / Acknowledgement Compliant
  • [Presentation] 電子線リソグラフィにおけるパターン形成の確率論的シミュレーション2018

    • Author(s)
      香山真範、白井正充、川田博昭、平井義彦、安田雅昭
    • Organizer
      第65回応用物理学会春季学術講演会
    • Related Report
      2017 Annual Research Report
  • [Presentation] ナノインプリントにおけるレジスト分子挙動の理論解析2017

    • Author(s)
      安田雅昭,平井義彦
    • Organizer
      第64回応用物理学会春季学術講演会
    • Place of Presentation
      パシフィコ横浜(神奈川県横浜市)
    • Year and Date
      2017-03-15
    • Related Report
      2016 Research-status Report
    • Invited
  • [Presentation] Stochastic simulation of UV-curing process in nanoimprint lithography: Pattern size and shape effects in sub-50 nm2017

    • Author(s)
      M. Koyama, M. Shirai, H. Kawata, Y. Hirai and M. Yasuda
    • Organizer
      61st Int. Conf. on Electron, Ion and Photon Beam Technology and Nanofabrication
    • Related Report
      2017 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Multiscale Simulation of Development Process in Electron Beam Lithography2017

    • Author(s)
      M. Yasuda, S. Hitomi, H. Kawata and Y. Hirai
    • Organizer
      34th International Conference of Photopolymer Science and Technology
    • Related Report
      2017 Annual Research Report
    • Int'l Joint Research / Invited
  • [Presentation] UVナノインプリントにおけるレジスト硬化の確率論的シミュレーション2017

    • Author(s)
      安田雅昭、香山真範、白井正充、川田博昭、平井義彦
    • Organizer
      次世代リソグラフィワークショップ 2017
    • Related Report
      2017 Annual Research Report
    • Invited
  • [Presentation] Computational study of pattern formation in electron beam lithography for negative type resists2017

    • Author(s)
      M. Yasuda, M. Koyama, M. Shirai, H. Kawata and Y. Hirai
    • Organizer
      43rd Int. Conf. on Micro- and Nano-Engineering 2017
    • Related Report
      2017 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Impact of Mold Cavity Size on Resist Pattern Shape in Nanoimprint Lithography: Molecular Dynamics Study2017

    • Author(s)
      R. Sakata, H. Kawata, Y. Hirai and M. Yasuda
    • Organizer
      16th International Conference on Nanoimprint and Nanoprint Technology
    • Related Report
      2017 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Early Stages of Development Process in Electron-Exposed Resists: A Molecular Dynamics Study2016

    • Author(s)
      S. Hitomi, H. Kawata, Y. Hirai and M. Yasuda
    • Organizer
      2016 Int. Microprocesses and Nanotechnology Conf.
    • Place of Presentation
      ANA Crowne Plaza Kyoto, Kyoto, Japan
    • Year and Date
      2016-11-10
    • Related Report
      2016 Research-status Report
    • Int'l Joint Research
  • [Presentation] Molecular Dynamics Study of Pattern Edge Structures in Extreme Ultraviolet Lithography2016

    • Author(s)
      A. Iwai, H. Kawata, Y. Hirai and M. Yasuda
    • Organizer
      2016 Int. Symp. on Extreme Ultraviolet Lithography
    • Place of Presentation
      International Conference Center Hiroshima, Hiroshima, Japan
    • Year and Date
      2016-10-24
    • Related Report
      2016 Research-status Report
    • Int'l Joint Research
  • [Presentation] Molecular Dynamics Study of Pattern Formation in Extreme Ultraviolet Lithography2016

    • Author(s)
      M. Yasuda, A. Iwai, H. Kawata and Y. Hirai
    • Organizer
      42nd Int. Conf. on Micro- and Nano-Engineering
    • Place of Presentation
      Reed Messe Wien, Wien, Austria
    • Year and Date
      2016-09-20
    • Related Report
      2016 Research-status Report
    • Int'l Joint Research
  • [Presentation] Multiphysics Simulation of Nanopatterning in Electron Beam Lithography2016

    • Author(s)
      M. Yasuda, K. Tada and M. Kotera
    • Organizer
      33nd International Conference of Photopolymer Science and Technology
    • Place of Presentation
      Makuhari Messe, Chiba, Japan
    • Year and Date
      2016-06-24
    • Related Report
      2016 Research-status Report
    • Int'l Joint Research / Invited
  • [Presentation] 電子線リソグラフィにおけるパターン形成のマルチスケール解析2016

    • Author(s)
      人見洋,川田博昭,平井義彦, 安田雅昭
    • Organizer
      マルチスケール材料力学シンポジウム
    • Place of Presentation
      富山大学(富山県富山市)
    • Year and Date
      2016-05-27
    • Related Report
      2016 Research-status Report
  • [Presentation] Multiscale Simulation of Pattern Formation in Electron Beam Lithography2016

    • Author(s)
      S. Hitomi, H. Kawata, Y. Hirai and M. Yasuda
    • Organizer
      23rd Symposium on Photomask and NGL Mask Technology
    • Place of Presentation
      Pachifico Yokohama, Yokohama, Japan
    • Year and Date
      2016-04-07
    • Related Report
      2016 Research-status Report
    • Int'l Joint Research
  • [Presentation] EUVリソグラフィの分子シミュレーション2016

    • Author(s)
      岩井瑛規,川田博昭,平井義彦, 安田雅昭
    • Organizer
      第63回応用物理学会春季学術講演会
    • Place of Presentation
      東京工業大学(東京都目黒区)
    • Year and Date
      2016-03-20
    • Related Report
      2015 Research-status Report
  • [Presentation] SEM観察における有機高分子レジスト収縮の理論解析2016

    • Author(s)
      香山真範, 古川雄基,川田博昭,平井義彦, 安田雅昭
    • Organizer
      第63回応用物理学会春季学術講演会
    • Place of Presentation
      東京工業大学(東京都目黒区)
    • Year and Date
      2016-03-19
    • Related Report
      2015 Research-status Report
  • [Presentation] Computational Study of Pattern Formation in Extreme Ultra Violet Lithography2015

    • Author(s)
      M. Yasuda, A. Iwai, S. Hitomi, H. Kawata and Y. Hirai
    • Organizer
      2015 Int. Microprocesses and Nanotechnology Conf.
    • Place of Presentation
      Toyama International Conference Center, Toyama, Japan
    • Year and Date
      2015-11-13
    • Related Report
      2015 Research-status Report
    • Int'l Joint Research
  • [Presentation] Molecular Dynamics Study on Line Width Roughness and Critical Dimensional Error in Nanoimprint Lithography2015

    • Author(s)
      N. Iwata, M. Yasuda, H. Kawata and Y. Hirai
    • Organizer
      2015 Int. Microprocesses and Nanotechnology Conf.
    • Place of Presentation
      Toyama International Conference Center, Toyama, Japan
    • Year and Date
      2015-11-12
    • Related Report
      2015 Research-status Report
    • Int'l Joint Research
  • [Presentation] Molecular dynamics simulation of pattern formation in electron beam lithography2015

    • Author(s)
      M. Yasuda
    • Organizer
      Electron Beam Scattering Simulation Workshop
    • Place of Presentation
      Aranvert Hotel Kyoto, Kyoto, Japan
    • Year and Date
      2015-11-09
    • Related Report
      2015 Research-status Report
    • Invited
  • [Presentation] Molecular Dynamics Study of Line Edge Roughness in Nanoimprint Lithography2015

    • Author(s)
      N. Iwata, M. Yasuda, H. Kawata and Y. Hirai
    • Organizer
      13th International Conference on Nanoimprint and Nanoprint Technology
    • Place of Presentation
      Silverado Resort and Spa, Napa, USA
    • Year and Date
      2015-10-23
    • Related Report
      2015 Research-status Report
    • Int'l Joint Research
  • [Presentation] Computational study on template release process for peeling (rotating) release method2015

    • Author(s)
      T. Tochino, T. Iida, M. Yasuda, H. Kawata and Y. Hirai
    • Organizer
      41st Int. Conf. on Micro- and Nano-Engineering 2015
    • Place of Presentation
      World Forum, Hague, Netherlands
    • Year and Date
      2015-09-22
    • Related Report
      2015 Research-status Report
    • Int'l Joint Research
  • [Presentation] 電子線リソグラフィにおけるSub-10nmパターン形成の分子動力学解析2015

    • Author(s)
      安田雅昭
    • Organizer
      次世代リソグラフィワークショップ2015
    • Place of Presentation
      東京工業大学(東京都目黒区)
    • Year and Date
      2015-07-07
    • Related Report
      2015 Research-status Report
    • Invited

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Published: 2015-04-16   Modified: 2019-03-29  

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