Development of Electrodes on Deep UV Light Emitting Diodes Using Nitride Semiconductors for Short Wavelengths
Project/Area Number |
15K21684
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Research Category |
Grant-in-Aid for Young Scientists (B)
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Allocation Type | Multi-year Fund |
Research Field |
Crystal engineering
Electronic materials/Electric materials
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Research Institution | Kanagawa Industrial Technology Center |
Principal Investigator |
KUROUCHI Masahito 神奈川県産業技術センター, 電子技術部, 主任研究員 (10452187)
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Research Collaborator |
YASUI Manabu 神奈川県産業技術センター, 電子技術部, 主任研究員
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Project Period (FY) |
2015-04-01 – 2017-03-31
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Project Status |
Completed (Fiscal Year 2016)
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Budget Amount *help |
¥4,160,000 (Direct Cost: ¥3,200,000、Indirect Cost: ¥960,000)
Fiscal Year 2016: ¥650,000 (Direct Cost: ¥500,000、Indirect Cost: ¥150,000)
Fiscal Year 2015: ¥3,510,000 (Direct Cost: ¥2,700,000、Indirect Cost: ¥810,000)
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Keywords | 窒化物半導体 / 窒化アルミニウムガリウム / オーミック電極 / 電子線リソグラフィ / 電極 / 微細加工 |
Outline of Final Research Achievements |
Difficulty in forming low-resistance ohmic contacts of deep UV light emitting diodes (LEDs) using Al-rich AlGaN is an important issue. Ohmic contacts on N-polar AlGaN plane have high potential because N-vacancies are generated efficiently in N-polar AlGaN plane by annealing process due to high evaporation rate of N. N-polar plane can be exposed by formation of 3-dimentional structures. Purpose of present study is to develop processing techniques of such 3-dimentional structures. In order to form high density patterns, electron beam lithography was investigated. Exposure conditions of half-pitch 50nm line-and-space patterns were examined. The relationship among dose, exposure area width and pattern size was fitted by 2-variable 2nd order functions, giving a fine fit. Conditions of proximity effect correction (PEC) are estimated from fitting parameters obtained from experimental data.
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Report
(3 results)
Research Products
(10 results)
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[Presentation] Ni-W thick film processing with higher frequency of pulse plating2017
Author(s)
Manabu Yasui, Satoru Kaneko, Masahito Kurouchi, Hiroaki Ito, Takeshi Ozawa, and Masahiro Araki
Organizer
9th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma2017)
Place of Presentation
Chubu University, Aichi, Japan
Year and Date
2017-03-01
Related Report
Int'l Joint Research
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[Presentation] Study of metal ion concentration in Ni-W bath for glass imprinting mold2016
Author(s)
Manabu Yasui, Masahito Kurouchi, Hiroaki Ito, Takeshi Ozawa and Msahiro Arai
Organizer
ISPlasma 2016/IC-PLANTS2016(8th International Symposium on Advanced Plasma Science and Applications for Nitrides and Nanomaterials/ 9th International Conference on Plasma-Nano
Place of Presentation
Nagoya University(Nagoya, Aichi Pref., Japan)
Year and Date
2016-03-06
Related Report
Int'l Joint Research
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