Surface figure measurement of EUV optics by coherent EUV light (high-order harmonics).
| Project/Area Number |
16206010
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| Research Category |
Grant-in-Aid for Scientific Research (A)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Applied optics/Quantum optical engineering
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| Research Institution | RIKEN |
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Principal Investigator |
MIDORIKAWA Katsumi RIKEN, Midorikawa laser technology laboratory, Chief scientist, 緑川レーザー物理工学研究室, 主任研究員 (40166070)
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| Co-Investigator(Kenkyū-buntansha) |
NAGATA Yutaka RIKEN, Midorikawa laser technology laboratory, Senior research scientist, 緑川レーザー物理工学研究室, 先任研究員 (50311353)
NABEKAWA Yasuo RIKEN, Midorikawa laser technology laboratory, Senior research scientist, 緑川レーザー物理工学研究室, 先任研究員 (90344051)
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| Project Period (FY) |
2004 – 2005
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| Project Status |
Completed (Fiscal Year 2005)
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| Budget Amount *help |
¥45,110,000 (Direct Cost: ¥34,700,000、Indirect Cost: ¥10,410,000)
Fiscal Year 2005: ¥21,970,000 (Direct Cost: ¥16,900,000、Indirect Cost: ¥5,070,000)
Fiscal Year 2004: ¥23,140,000 (Direct Cost: ¥17,800,000、Indirect Cost: ¥5,340,000)
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| Keywords | high-order harmonics / coherent x-ray / single-shot measurement / EUV lithography / 13-nm light / NbN beam separator / interferometry / femtosecond laser / EUV / 超短パルスレーザー / 軟X線光学 |
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| Research Abstract |
Single-shot inspection using a compact EUV light source makes it possible to simplify measurement apparatus, because experimental errors, such as sample and measurement apparatus vibrations and pointing stability of a light source, could be avoided. We demonstrate a high-throughput, high-damage-threshold beam separator for wavelengths shorter than 30 nm. The beam separator uses a 10-nm-thick niobium nitrogen film deposited on a Si substrate set at the Brewster's angle. The film was deposited by RF reactive magnetron sputtering on the Si substrate. The beam separator has an attenuation ratio of 0.01 and a damage-threshold intensity of at least 0.8 TW/cm^2 for a 26-fs pump pulse. The measured reflectivity of the beam separator exceeded 70% in a wavelength range of 13 to 18 nm. The reflectivity did not decrease after irradiation with 2 × 10^6 shot laser pulse. The damage-threshold intensity for the pump pulse is guaranteed to be above 0.8 TW/cm^2. This broadband beam separator, which may be used to eliminate energetic laser pulses from longitudinally pumped x-ray lasers as well as from high-order harmonics, are useful for many applications using EUV optics. Using this beam separator, we also demonstrated a single-shot measurement of spatial coherence of a 13-nm high-order harmonic beam in a Young's double slit experiment. A beam divergence of 0.35 mrad and a high fringe visibility of 0.96 are obtained with optimal phase-matching condition for the 13-nm harmonics. Spatial coherence length of the 13-nm harmonics is about two times larger than the beam diameter. To our knowledge, this is the first demonstration of spatial coherence measurement of the 13-nm harmonic beam with a single-shot. This result shows that the 13-nm harmonic beam is useful for applications in interferometry, imaging and microscopy.
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Report
(3 results)
Research Products
(10 results)
