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Plasma anisotropic CVD as a novel method for constructing nano-structures

Research Project

Project/Area Number 16360020
Research Category

Grant-in-Aid for Scientific Research (B)

Allocation TypeSingle-year Grants
Section一般
Research Field Thin film/Surface and interfacial physical properties
Research InstitutionKYUSHU UNIVERCITY

Principal Investigator

SHIRATANI Masaharu  Kyushu University, Graduate school of information science and electrical engineering, Professor, 大学院システム情報科学研究院, 教授 (90206293)

Co-Investigator(Kenkyū-buntansha) WATANABE Yukio  Kyushu University, Graduate school of information science and electrical engineering, Professor Emeritus, 大学院システム情報科学研究院, 名誉教授 (80037902)
KOGA Kazunori  Kyushu University, Graduate school of information science and electrical engineering, Associate Researcher, 大学院システム情報科学研究院, 助手 (90315127)
Project Period (FY) 2004 – 2006
Project Status Completed (Fiscal Year 2006)
Budget Amount *help
¥15,000,000 (Direct Cost: ¥15,000,000)
Fiscal Year 2006: ¥3,700,000 (Direct Cost: ¥3,700,000)
Fiscal Year 2005: ¥5,100,000 (Direct Cost: ¥5,100,000)
Fiscal Year 2004: ¥6,200,000 (Direct Cost: ¥6,200,000)
KeywordsCopper interconnects / Plasma CVD / Anisotropic deposition / Ion-assisted CVD / Sputtering / Nano-structure / LSI / Inductive coupled plasma / ルテニウム / 異法性製膜 / 埋め込み形状
Research Abstract

We have realized anisotropic deposition of Cu, for which Cu is filled preferentially from the bottom of trenches without being deposited on their sidewall, using H-assisted plasma chemical vapor deposition (HAPCVD). The anisotropic deposition has two interesting features. One is the fact that the narrower the width of trench, the faster the deposition rate on its bottom becomes. The other is the self-limiting characteristic, that is the deposition in the trench stops automatically just after filling it completely. Such a type of deposition has a potential to overcome common problems associated with conformal filling : namely, small crystal grain size below half of the trench width, and formation of a seam with residual impurities of relatively high concentration. The key to the deposition is ion irradiation to surfaces. With increasing the flux and energy of ions, the profile changes from conformal to subconformal and then to an anisotropic one, for which Cu material is filled from the bottom of the trench without deposition on the sidewall. H_3^+ and ArH^+ are identified as the major ionic species which contribute to the control, and hence the deposition profile also depends on a ratio R=H_2/(Ar + H_2).
Moreover, mechanism of high purity Cu thin film deposition from a new F-free Cu complex, Cu(EDMDD)_2 have been studied using the HAPCVD. The species of Cu(EDMDD) is the dominant neutral radical dissociated from Cu(EDMDD)_2 by electron impact. In situ measurements by Fourier transform infrared spectroscopy show that H atoms are quite effective in removing impurities in Cu films. The simplified version of important surface reaction is Cu(EDMDD)+H _-> Cu+H(EDMDD). Cu films deposited by HAPCVD have a low as-deposited resistivity of 1.84 μΩcm and is 20 nm thick in trenches 0.5 μm wide and 2.73 μm deep.

Report

(4 results)
  • 2006 Annual Research Report   Final Research Report Summary
  • 2005 Annual Research Report
  • 2004 Annual Research Report
  • Research Products

    (25 results)

All 2006 2005 2004

All Journal Article (25 results)

  • [Journal Article] Mechanism of Cu deposition from Cu(EDMDD)_2 using H-assisted plasma CVD2006

    • Author(s)
      Kosuke Takenaka, Kazunori Koga, Masaharu Shiratani, Yukio Watanabe, Toshiya Shingen
    • Journal Title

      Thin Solid Films 506-507

      Pages: 197-201

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2006 Final Research Report Summary
  • [Journal Article] Plasma anisotropic CVD of high purity Cu using Cu(hfac)_22006

    • Author(s)
      Masaharu Shiratani, Takao Kaji, Kazunori Koga, Yukio Wtanabe, Tomohiro Kubota, Seiji Samukawa
    • Journal Title

      Proceedings of the 6th International Conference on Reactive Plasmas and 23rd Symposium on Plasma Processing

      Pages: 119-120

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2006 Final Research Report Summary
  • [Journal Article] Mechanism of Cu deposition from Cu (EDMDD)_2 using H-assisted plasma CVD2006

    • Author(s)
      K.Takenaka, K.Koga, M.Shiratani, Y.Watanabe, T.Shingen
    • Journal Title

      Thin Solid Films 506-507

      Pages: 197-201

    • Related Report
      2006 Annual Research Report
  • [Journal Article] Mechanism of Cu deposition from Cu(EDMDD)_2 using H-assisted plasma CVD2006

    • Author(s)
      Kosuke Takenaka, Kazunori Koga, Masaharu Shiratani, Yukio Watanabe, Toshiya Shingen
    • Journal Title

      Thin Solid Films (in press)

    • Related Report
      2005 Annual Research Report
  • [Journal Article] Substrate temperature dependence of deposition rate in anisotropic plasma CVD of Cu2006

    • Author(s)
      Masaharu Shiratani, Kosuke Takenaka, Takao Kaji, Kazunori Koga, Yukio Watanabe
    • Journal Title

      Thin Solid Films (in press)

    • Related Report
      2005 Annual Research Report
  • [Journal Article] Control of deposition profile of Cu for LSI interconnects by plasma chemical vapor deposition2005

    • Author(s)
      Kosuke Takenaka, Masaharu Shiratani, Manabu Takeshita, Makoto Kita, Kazunori Koga, Yukio Watanabe
    • Journal Title

      Pure Appl. Chem. 77

      Pages: 391-398

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2006 Final Research Report Summary
  • [Journal Article] Study on ion irradiation effects on plasma anisotropic Cu CVD using triode discharge2005

    • Author(s)
      Takao Kaji, Kosuke Takenaka, Kazunori Koga, Masaharu Shiratani, Yukio Watanabe
    • Journal Title

      Proc. of Plasma Science Sympoium-2005 and 22nd Symposium on Plasma Processing

      Pages: 391-398

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2006 Final Research Report Summary
  • [Journal Article] Measruement of H density in Cu CVD discharges using VUV absorption spectroscopy2005

    • Author(s)
      Kosuke Takenaka, Takao Kaji, Kazunori Koga, Masaharu Shiratani, Yukio Watanabe
    • Journal Title

      Proc. of Plasma Science Sympoium-2005 and 22nd Symposium on Plasma Processing

      Pages: 639-640

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2006 Final Research Report Summary
  • [Journal Article] Effects of ion irradiation on plasma anisotropic CVD2005

    • Author(s)
      Kosuke Takenaka, Manabu Takeshita, Kazunori Koga, Masaharu Shiratani, Yukio Watanabe
    • Journal Title

      Novel Materials Processing by Advanced Electromagnetic Energy Sources

      Pages: 75-78

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2006 Final Research Report Summary
  • [Journal Article] Control of deposition profile of Cu for LSI interconnects by plasma chemical vapor deposition2005

    • Author(s)
      Kosuke Takenaka, Masaharu Shiratani, Manabu Takeshita, Makoto Kita, Kazunori Koga, Yukio Watanabe
    • Journal Title

      Pure Appl.Chem. 77, 2

      Pages: 391-398

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2006 Final Research Report Summary
  • [Journal Article] Study on ion irradiation effects on plasma anisotropic Cu CVD using triode discharge2005

    • Author(s)
      Takao Kaji, Kosuke Takenaka, Kazunori Koga, Masaharu Shiratani, Yukio Watanabe
    • Journal Title

      Proc.of Plasma Science Sympoium-2005 and 22nd Symposium on Plasma Processing

      Pages: 641-642

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2006 Final Research Report Summary
  • [Journal Article] Measruement of H density in Cu CVD discharges using VUV absorption spectroscopy2005

    • Author(s)
      Kosuke Takenaka, Takao Kaji, Kazunori Koga, Masaharu Shiratani, Yukio Watanabe
    • Journal Title

      Proc.of Plasma Science Sympoium-2005 and 22nd Symposium on Plasma Processing

      Pages: 639-640

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2006 Final Research Report Summary
  • [Journal Article] Effects of sputtering due to ion irradiation on plasma anisotoropiv CVD of Cu2005

    • Author(s)
      Kosuke Takenaka Manabu Takeshita, Kazunori Koga, Masaharu Shiratani, Yukio Watanabe
    • Journal Title

      Novel Materials Processing by Advanced Electromagnetic Energy Sources

      Pages: 75-78

    • Related Report
      2005 Annual Research Report
  • [Journal Article] Plasma anisotropic CVD of high purity Cu using Cu(hfac)_22005

    • Author(s)
      Masaharu Shiratani, Takao Kaji, Kazunori Koga, Yukio Watanabe, Tomohiro Kubota, Seiji Samukawa
    • Journal Title

      Proc.of the 6 th International Conference on Reactive Plasmas and 23 rd Symposium on Plasma Processing

      Pages: 119-120

    • Related Report
      2005 Annual Research Report
  • [Journal Article] Mechanism of Cu deposition from Cu(EDMDD)_2 using H-assisted plasma CVD2005

    • Author(s)
      Kosuke Takenaka, Kazunori Koga, Masaharu Shiratani, Yukio Watanabe, Toshiya Shingenn
    • Journal Title

      Thin Solid Films (in press)

    • Related Report
      2004 Annual Research Report
  • [Journal Article] Anisotropic Deposition of Cu in trenches by H-assisted Plasma Chemical Vapor Deposition2004

    • Author(s)
      Kosuke Takenaka, Makoto Kita, Toshio Kinoshita, hazunori Koga, Masaharu Shiratani, Yukio Watanabe
    • Journal Title

      Journal of Vacuum Science and Technology A 22

      Pages: 1903-1907

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2006 Final Research Report Summary
  • [Journal Article] Anisotropic deposition of Cu using plasma CVD2004

    • Author(s)
      Masaharu Shiratani, Kosuke Takenaka, Kazunori Koga, Yukio Watanabe
    • Journal Title

      Proceedings of International COE Forum on Plasma Science and Technology

      Pages: 33-34

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2006 Final Research Report Summary
  • [Journal Article] Dissociative ionization of Cu(EDMDD)_2 by electron impact2004

    • Author(s)
      Kosuke Takenaka, Manabu Takeshita, Kazunori Koga, Masaharu Shiratani, Yukio Watanabe
    • Journal Title

      Proceedings of International COE Forum on Plasma Science and Technology

      Pages: 171-172

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2006 Final Research Report Summary
  • [Journal Article] Effects of solvent on properties of Cu films prepared by HAPCVD using Cu(EDMDD)_22004

    • Author(s)
      Kosuke Takenaka, Takao Kaji, Kazunori Koga, Masaharu Shiratani, Yukio Watanabe
    • Journal Title

      Proceedings of 26th International Symposium on Dry Process

      Pages: 347-352

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2006 Final Research Report Summary
  • [Journal Article] Anisotropic Deposition of Cu in trenches by H-assisted Plasma Chemical Vapor Deposition2004

    • Author(s)
      Kosuke Takenaka, Makoto Kita, Toshio Kinoshita, Kazunori Koga, Masaharu Shiratani, Yukio Watanabe
    • Journal Title

      Journal of Vacuum Science and Technology A 22, 4

      Pages: 1903-1907

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2006 Final Research Report Summary
  • [Journal Article] Anisotropic Deposition of Cu in trenches by H-assisted Plasma Chemical Vapor Deposition2004

    • Author(s)
      K.Takenaka, M.Kita, T.Kinoshita, K.Koga, M.Shiratani, Y.Watanabe
    • Journal Title

      Journal of Vacuum Science and Technology A 22・4

      Pages: 1903-1907

    • Related Report
      2004 Annual Research Report
  • [Journal Article] Effects of ion irradiation on plasma anisotropic CVD2004

    • Author(s)
      Kosuke Takenaka, Manabu Takeshita, Kazunori Koga, Masaharu Shiratani, Yukio Watanabe
    • Journal Title

      Proceedings of International Symposium on Novel Materials Processing by Adbanced Electromagnetic Energy Sources (in press)

    • Related Report
      2004 Annual Research Report
  • [Journal Article] Anisotropic deposition of Cu using plasma CVD2004

    • Author(s)
      Masaharu Shiratani, Kosuke Takenaka, Kazunori Koga, Yukio Watanabe
    • Journal Title

      Proceedings of International COR Forum on Plasma Science and Technology

      Pages: 33-34

    • Related Report
      2004 Annual Research Report
  • [Journal Article] Dissociative ionization of Cu(EDMDD)_2 by electron impact2004

    • Author(s)
      Kosuke Takenaka, Manabu Takeshita, Kazunori Koga, Masaharu Shiratani, Yukio Watanabe
    • Journal Title

      Proceedings of International COR Forum on Plasma Science and Technology

      Pages: 171-172

    • Related Report
      2004 Annual Research Report
  • [Journal Article] Effects of solvent on properties of Cu films prepared by HAPCVD using Cu (EDMDD)_22004

    • Author(s)
      Kosuke Takenaka, Takao Kaji, Kazunori Koga, Masaharu Shiratani, Yukio Watanabe
    • Journal Title

      Proceedings of 26th International Symposium on Dry Process

      Pages: 347-352

    • Related Report
      2004 Annual Research Report

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Published: 2004-04-01   Modified: 2016-04-21  

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