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Application to Nanotube Making Process of Neutral Loop Discharge Plasma Technique

Research Project

Project/Area Number 16560248
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeSingle-year Grants
Section一般
Research Field 電力工学・電気機器工学
Research InstitutionUniversity of Miyazaki

Principal Investigator

OTSUBO Masahisa  University of Miyazaki, Faculty of Engineering, Professor, 工学部, 教授 (90041011)

Co-Investigator(Kenkyū-buntansha) HONDA Chikahisa  University of Miyazaki, Faculty of Engineering, Professor, 工学部, 教授 (20037881)
SUNG Youl Moon  University of Miyazaki, Faculty of Engineering, Associate Professor, 工学部, 助教授 (50304837)
Project Period (FY) 2004 – 2005
Project Status Completed (Fiscal Year 2005)
Budget Amount *help
¥3,300,000 (Direct Cost: ¥3,300,000)
Fiscal Year 2005: ¥800,000 (Direct Cost: ¥800,000)
Fiscal Year 2004: ¥2,500,000 (Direct Cost: ¥2,500,000)
KeywordsNeutral loop discharge plasma / Carbon nanotube / Plasma-enhanced CVD / 磁気中性線放電プラズマ / カーボンナノチューブ(CNTs) / ヌル磁場 / プラズマ動的制御 / ナノテクノロジー / プラズマプロセス / NLD
Research Abstract

Recently, the big diameter making of the wafer is rapidly advanced with the ultrafine processing technology of 0.1μm in the minimum in recent semiconductor manufacturing process line width in the process of the semiconductor. Then, the plasma, source by which a uniform process in a large area can be done is requested. Then, the NLD (Neutral Loop Discharge) plasma was proposed. Because the NLD plasma can dynamically control impossible plasma in past plasma, a highly effective process can be done. However, it is a current state of being limited from the structure only to the etching field now. We have aimed to pioneer the NLD plasma to a new field by applying a peculiar concept of the NLD plasma to the CNT (Carbon Nanotubes) making.
In the actual experiment, we did the CNT making experiment by the Plasma Enhanced Chemical Vapor Deposition (PECVD) law which uses the DC electrical discharge, ICP and NLD plasma. As a result, CNT made by the experiment which used the NLD plasma became the thinnest. Moreover, CNT was able to be generated from other experiment methods with low-pressure power.

Report

(3 results)
  • 2005 Annual Research Report   Final Research Report Summary
  • 2004 Annual Research Report
  • Research Products

    (7 results)

All 2005 2004

All Journal Article (7 results)

  • [Journal Article] CVD application of a Neutral Loop Discharge Plasma for Carbon Nanotubes Synthesis2005

    • Author(s)
      J.H.Yang
    • Journal Title

      18th SYMPOSIUM ON PLASMA SCIENCE FOR MATERIALS

      Pages: 65-65

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2005 Annual Research Report 2005 Final Research Report Summary
  • [Journal Article] CVD Application of NLD Plasma Production Technology for CNTs Fabrication2005

    • Author(s)
      J.H.Yang
    • Journal Title

      2005 Korea-Japan Joint Symposium on Electrical Discharge and High Voltage Engineering

      Pages: 233-236

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2005 Annual Research Report 2005 Final Research Report Summary
  • [Journal Article] CVD application of a Neutral Loop Discharge Plasma for Carbon Nanotubes Synthesis2005

    • Author(s)
      J.H.Yang
    • Journal Title

      18th SYMPOSIUM ON PLASMA SCIENCE FOR MATERIALS 65

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] ヌル磁場放電プラズマにおける新しいスパッタ装置の開発2004

    • Author(s)
      敦田 悟, J.H.Yang, 川尻 晋平, 成 烈文, 本田 親久, 大坪 昌久
    • Journal Title

      宮崎大学工学部紀要 33

      Pages: 243-248

    • Related Report
      2004 Annual Research Report
  • [Journal Article] A Novel Sputter System with full target erosion2004

    • Author(s)
      Y.M.Sung, S.Atsuta, J.H.Yang, M.Otsubo, C.Honda
    • Journal Title

      電気学会論文誌A 124・7

      Pages: 565-570

    • Related Report
      2004 Annual Research Report
  • [Journal Article] An RF-PECVD System for Carbon Nanotubes (CNTs) Fabrication2004

    • Author(s)
      Y.Kawano, S.Kawashiri, Y.M.Sung, M.Otsubo, C.Honda
    • Journal Title

      Proc. 12th Asian Conf. on Electrical Discharge (ACED), Chenzhen、China

      Pages: 110-113

    • Related Report
      2004 Annual Research Report
  • [Journal Article] Magnetic Null Plasma Source for Thin Film Fabrication2004

    • Author(s)
      Y.M.Sung, S.Kawashiri, J.H.Yang, M.Otsubo, C.Honda
    • Journal Title

      Joint International Plasma Symposium of 7th APCPST and 16th SPSM, Fukuoka, Japan

      Pages: 444-444

    • Related Report
      2004 Annual Research Report

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Published: 2004-04-01   Modified: 2016-04-21  

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