Low-Cost and Low-Power LSI design Methodology optimized for Electron Beam Direct Writing Technique with Merged Memory Circuit
| Project/Area Number |
16560317
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| Research Category |
Grant-in-Aid for Scientific Research (C)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Electron device/Electronic equipment
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| Research Institution | Ritsumeikan University |
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Principal Investigator |
FUJINO Takeshi Ritsumeikan University, Dept. of VLSI System Design, Professor, 理工学部, 教授 (60367993)
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| Co-Investigator(Kenkyū-buntansha) |
YOSHIKAWA Masaya Ritsumeikan University, Dept. of VLSI System Design, Lecturer, 理工学部, 講師 (50373098)
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| Project Period (FY) |
2004 – 2005
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| Project Status |
Completed (Fiscal Year 2005)
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| Budget Amount *help |
¥2,900,000 (Direct Cost: ¥2,900,000)
Fiscal Year 2005: ¥1,700,000 (Direct Cost: ¥1,700,000)
Fiscal Year 2004: ¥1,200,000 (Direct Cost: ¥1,200,000)
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| Keywords | Electron Beam Direct Writing / Programmable Logic / Look Up Table / Standard Cell / Character Projection / プログラマブルロジック / 電子ビーム直接描写 |
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| Research Abstract |
Integrated electronic system composed of microprocessors and large memories can be realized as a single chip owing to the progress of micro-fabrication technology of VLSI. These "System On a Chip" are key parts which realize small, low-power, and high-performance system such as mobile phones and digital still cameras.
Initial development cost of "System On a Chip" become expensive due to the mask cost. The mask cost for the latest "System On a Chip" becomes more than 1 million dollars. This cost is a critical issue for small-production volume LSI, and the most of the chip cost depends upon the mask cost for "System On a Chip" whose whole-life production volume is less than 10 thousand. Therefore, the new technologies reducing mask cost must be developed for the low-cost "System On a Chip".
We adopted EB direct-writing technique as a lithography tool. EB direct-writing is the mask-less technique, then it is free from mask-cost. However, the throughput of EB direct-writing is much lower than that of photo-lithography. Even for the small-volume LSI production, EB direct-writing time have to be shortened. Character-projection EB direct-writing technique is applied in order to increase the throughput.
Three key technologies are developed in this study. First, proximity-effect-correction technique using character projection lithography is developed for high-patterning accuracy. Secondly, we proposed novel "Character-build standard cell" design methodology, which realize high throughput EB direct writing. Lastly, via-programmable logic architecture which is' suitable for EB direct-writing is examined. Using these three studies mentioned above, we promote the low-cost technology for small-production volume "System On a Chip".
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Report
(3 results)
Research Products
(20 results)
