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Epitaxial growth of Lithium Niobate film for optical material in the future

Research Project

Project/Area Number 16560671
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeSingle-year Grants
Section一般
Research Field Reaction engineering/Process system
Research InstitutionTokai University

Principal Investigator

AKIYAMA Yasunobu  Tokai University, School of Engineering, Associate Professor, 工学部, 助教授 (10231846)

Project Period (FY) 2004 – 2005
Project Status Completed (Fiscal Year 2005)
Budget Amount *help
¥3,600,000 (Direct Cost: ¥3,600,000)
Fiscal Year 2005: ¥1,600,000 (Direct Cost: ¥1,600,000)
Fiscal Year 2004: ¥2,000,000 (Direct Cost: ¥2,000,000)
KeywordsCVD / Lithium Niobate / Polycrystal / Epitaxially growth / Film composition / Growth condituon / 組成 / ニオブ酸リチウム薄膜 / 複酸化物
Research Abstract

The film composition of polycrystalline Lithium Niobate (LiNbO_3) that was prepared on silicon substrate from Li (DPM) and Nb(OEt)_5 using a MOCVD method was analyzed by ICP-MS. At any growth temperature, the polycrystalline Lithium Niobate can grow in Li-rich conditions.
By feeding both precursors simultaneously, pure LiNbO_3 films were grown epitaxially on sapphire [006] with no polycrystal oxides under the Li-rich conditions (X_Gi=0.586 at 973K, and 0.515<X_Gi<0.638 at 1023K) compared to the stoichiometric composition (X_Si=0.5) where X_Gi=the mole concentration of lithium atoms/(mole concentration of lithium atoms+mole concentration of niobium atoms) in the feed gas and X_Si=the mole concentration of lithium atoms/(mole concentration of lithium atoms + mole concentration of niobium atoms) in the film. The compositions of the epitaxially grown LiNbO_3 film were analyzed accurately using ICP-MS. The X_Si of epitaxially grown LiNbO_3, which contains no polycrystal oxides by XRD analysis, ranged from 0.49 to 0.521. These compositions of LiNbO_3 grown epitaxially using MOCVD correspond to the compositions of the LiNbO_3 solid solution in the phase-diagram of Li-Nb composite oxide obtained for crystal growth from a molten solution. However, the epitaxially grown film, which composition is away from the stoichiometric composition, must contain a few polycrystal oxides and some crystal defects. Thus, the film (X_Si=0.5), which is epitaxially grown with good quality, must be grown under narrower operating condition than the window obtained by this study.

Report

(3 results)
  • 2005 Annual Research Report   Final Research Report Summary
  • 2004 Annual Research Report
  • Research Products

    (8 results)

All 2006 2005 Other

All Journal Article (8 results)

  • [Journal Article] 反応工学に基づく「化学気相成長法による成膜過程」の解析2006

    • Author(s)
      秋山 泰伸
    • Journal Title

      東海大学紀要 工学部 45巻・2号

      Pages: 115-120

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Epitaxial Growth of Lithium Niobate Film Using Metalorganic Chemical Vapor Deposition2006

    • Author(s)
      Yasunobu Akiyama, Katsuya Shitanaka, Hiroshi Murakami, Young -Sik Shin, Michihide Yoshida, Nobuyuki Imaishi
    • Journal Title

      Thin Solid Films (In press)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Analysis of Film Growth Process via Chemical Vapor Deposition based on Reaction Engineering2006

    • Author(s)
      Yasunobu Akiyama
    • Journal Title

      Proc.The School of Engineering of Tokai Univesity Vol.45, No.2

      Pages: 115-120

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] 反応工学に基づく「化学気相成長法による成膜過程」の解析2006

    • Author(s)
      秋山 泰伸
    • Journal Title

      東海大学紀要 工学部 (印刷中)

    • Related Report
      2005 Annual Research Report
  • [Journal Article] Epitaxial Growth of Lithium Niobate Film Using Metalorganic Chemical Vapor Deposition2006

    • Author(s)
      Y.Akiyama, K.Shitanaka, H.Murakami, Y.S.Shin, M.Yoshida, N.Imaishi
    • Journal Title

      Thin Solid Films (In press)

    • Related Report
      2005 Annual Research Report
  • [Journal Article] Epitaxial Lithium Niobate film growth by metalorganic Chemical Vapor Deposition2005

    • Author(s)
      Y.Akiyama, K.Shitanaka, H.Murakami, Y.S.Shin, M.Yoshida, N.Imaishi
    • Journal Title

      Proc. 27th International Symposium on Dry Process, Jeju, KOREA

      Pages: 237-238

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2005 Final Research Report Summary
  • [Journal Article] Epitaxial Lithium Niobate film growth by metalorganic Chemical Vapor Deposition2005

    • Author(s)
      Y.Akiyama, K.Shitanaka, H.Murakami, Y.S.Shin, M.Yoshida, N.Imaishi
    • Journal Title

      Proc.27th International Symposium on Dry Process, Jeju, KOREA

      Pages: 237-238

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2005 Annual Research Report 2005 Final Research Report Summary
  • [Journal Article] Epitaxial Growth of Lithium Niobate Film Using Metalorganic Chemical Vapor Deposition

    • Author(s)
      Yasunobu Akiyama, Katsuya Shitanaka, Hiroshi Murakami, Young-Sik Shin, Michihide Yoshida, Nobuyuki Imaishi
    • Journal Title

      Thin Solid Films (In press)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2005 Final Research Report Summary

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Published: 2004-04-01   Modified: 2016-04-21  

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