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Investigation of CMP Mechanism of GaN Wafer and Development of High-Efficiency & High-Quality CMP Machine using Fixed Abrasive Tape

Research Project

Project/Area Number 16H02305
Research Category

Grant-in-Aid for Scientific Research (A)

Allocation TypeSingle-year Grants
Section一般
Research Field Production engineering/Processing studies
Research InstitutionTohoku University

Principal Investigator

Kuriyagawa Tsunemoto  東北大学, 医工学研究科, 教授 (90170092)

Co-Investigator(Kenkyū-buntansha) 嶋田 慶太  東北大学, 工学研究科, 助教 (30633383)
久保 百司  東北大学, 金属材料研究所, 教授 (90241538)
今野 豊彦  東北大学, 金属材料研究所, 教授 (90260447)
水谷 正義  東北大学, 工学研究科, 准教授 (50398640)
Project Period (FY) 2016-04-01 – 2019-03-31
Project Status Completed (Fiscal Year 2018)
Budget Amount *help
¥45,110,000 (Direct Cost: ¥34,700,000、Indirect Cost: ¥10,410,000)
Fiscal Year 2018: ¥7,540,000 (Direct Cost: ¥5,800,000、Indirect Cost: ¥1,740,000)
Fiscal Year 2017: ¥9,100,000 (Direct Cost: ¥7,000,000、Indirect Cost: ¥2,100,000)
Fiscal Year 2016: ¥28,470,000 (Direct Cost: ¥21,900,000、Indirect Cost: ¥6,570,000)
KeywordsGaN / CMP / ナノバブル / 分子動力学シミュレーション / テープ研磨加工 / 紫外線援用加工 / OHラジカル / サブサーフェースダメージ / 窒化ガリウム / テープ研磨 / ナノダイヤモンド / 量子分子動力学シミュレーション / 紫外線援用 / 化学機械研磨 / テープ研削
Outline of Final Research Achievements

The reaction dynamics of the Ga atom separation from the GaN substrate surface were visualized with quantum molecular dynamics simulation. The calculation results revealed that hydroxyl-terminated nanodiamond (ND) abrasive grains easily extract the Ga atoms of the GaN substrate in chemical mechanical polishing (CMP) process and exhibit high chemical reaction activity. The calculation also clarified that OH radical assistance actively helps the surface Ga atoms detach of the GaN substrate. Based on these findings, we developed an ND-containing CMP tape and a prototype of the tape CMP processing capable of generating hydroxyl radicals via ultrasonic-assisted implosion of ultrafine bubbles. The results of polishing experiments of the GaN substrates with these inventions showed that the processing rate increased about 2.7 times compared with the case of using purified water without deterioration of the surface roughness and increase of the damaged layer.

Academic Significance and Societal Importance of the Research Achievements

本研究は、化学的に安定なGaN基板の表面から効率的にGa原子を分離させるためにはどのようにしたら良いかを量子分子動力学シミュレーションで可視化し、その知見に基づき作用砥粒や加工環境を決定しようとする独創的、かつ本質的な試みである。また従来のCMP加工は遊離砥粒加工法であるため必然的にバッチ加工となり、高能率化の点で不利である。そこで本研究では、この最終遊離砥粒研磨加工を固定砥粒化したCMPテープにより置き換え、高能率加工を実現しようとするものである。さらに磨耗したCMPテープは次々と送り出すことにより常に新生面での加工が可能となるため、工具管理も容易になる。本成果は工学的、工業的意義が大きい。

Report

(4 results)
  • 2018 Annual Research Report   Final Research Report ( PDF )
  • 2017 Annual Research Report
  • 2016 Annual Research Report
  • Research Products

    (14 results)

All 2019 2017 2016

All Journal Article (1 results) (of which Peer Reviewed: 1 results) Presentation (13 results) (of which Int'l Joint Research: 7 results)

  • [Journal Article] GaNのスクラッチ加工におけるクラック発生機構の研究2017

    • Author(s)
      鷹巣 良史, 嶋田 慶太, 水谷 正義, 厨川 常元
    • Journal Title

      砥粒加工学会

      Volume: 61 Pages: 392-397

    • Related Report
      2017 Annual Research Report
    • Peer Reviewed
  • [Presentation] 反応力場分子動力学シミュレーションによる窒化物半導体基板のナノバブルを用いた化学機械研磨プロセスの検討2019

    • Author(s)
      木村颯太
    • Organizer
      2019年度精密工学会春季大会学術講演会
    • Related Report
      2018 Annual Research Report
  • [Presentation] Molecular Dynamics Simulations on Chemical Mechanical Polishing Process of Nitride Substrate with Nanobubble2019

    • Author(s)
      Souta Kimura
    • Organizer
      ICACC19
    • Related Report
      2018 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Molecular Dynamics Investigation for Chemical Effects of Nanobubble Collapse on Precision Polishing2019

    • Author(s)
      Yoshimasa Aoyama
    • Organizer
      Pacsurf2018
    • Related Report
      2018 Annual Research Report
    • Int'l Joint Research
  • [Presentation] 計算科学手法を用いた窒化物半導体基板の化学機械研磨プロセスの検討2019

    • Author(s)
      木村颯太
    • Organizer
      トライボロジー会議2018秋
    • Related Report
      2018 Annual Research Report
  • [Presentation] Effects of Shockwave-Induced Nanobubble Collapse on Precision Polishing : Molecular Dynamics Study2019

    • Author(s)
      Yoshimasa Aoyama
    • Organizer
      9th Multiscale Materials Modeling
    • Related Report
      2018 Annual Research Report
    • Int'l Joint Research
  • [Presentation] ステップを有するGaN基板モデルを用いた化学機械研磨プロセスの計算化学的検討2017

    • Author(s)
      五十嵐拓也
    • Organizer
      精密工学会2017年度春季大会
    • Related Report
      2017 Annual Research Report
  • [Presentation] 計算科学シミュレーションによる化学機械研磨プロセスにおけるマルチフィジックス現象の解明2017

    • Author(s)
      尾澤伸樹
    • Organizer
      精密工学会2017年度春季大会
    • Related Report
      2017 Annual Research Report
  • [Presentation] Computational Analysis of Chemical Mechanical Polishing Process for GaN Substrate with Step Structure2017

    • Author(s)
      Takuya Igarashi
    • Organizer
      WINDS17
    • Related Report
      2017 Annual Research Report
    • Int'l Joint Research
  • [Presentation] First-principles Calculations of High Efficiency Abrasive Grain for GaN Chemical Mechanical Polishing2017

    • Author(s)
      Takuya Igarashi
    • Organizer
      41st International Conference and Expo on Advanced Ceramics and Composites
    • Related Report
      2016 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Polishing Simulation of Gallium Nitride Substrate Assisted by Chemical Reactions with Hydroxyl Radicals2017

    • Author(s)
      Kentaro Kawaguchi
    • Organizer
      41st International Conference and Expo on Advanced Ceramics and Composites
    • Related Report
      2016 Annual Research Report
    • Int'l Joint Research
  • [Presentation] 計算科学手法を用いた GaN CMP における砥粒-基板間の化学反応機構の検討2017

    • Author(s)
      五十嵐拓
    • Organizer
      精密工学会2017年度春季大会
    • Related Report
      2016 Annual Research Report
  • [Presentation] 計算科学手法を用いたGaN CMPにおいて高い化学反応活性を有する研磨砥粒の検討2016

    • Author(s)
      五十嵐拓
    • Organizer
      2016年度精密工学会秋季大会学術講演会
    • Related Report
      2016 Annual Research Report
  • [Presentation] Study of crack generation process in scratching of gallium nitride(GaN)2016

    • Author(s)
      Yoshifumi TAKASU
    • Organizer
      The 4th International Symposium on Micro/Nano Mechanical Machining and Manufacturing
    • Related Report
      2016 Annual Research Report
    • Int'l Joint Research

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Published: 2016-04-21   Modified: 2021-02-19  

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