Wide range radical production by atmospheric pressure microwave plasma with molecular gas and applications
| Project/Area Number |
16H03893
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| Research Category |
Grant-in-Aid for Scientific Research (B)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Plasma electronics
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| Research Institution | Nagoya University |
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Principal Investigator |
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| Co-Investigator(Kenkyū-buntansha) |
鈴木 陽香 名古屋大学, 工学研究科, 助教 (80779356)
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| Research Collaborator |
Tamura Yuto
Yamamoto Masaki
Inomata Yaoki
Koike Yusuke
Baba Hiroki
Ishikawa Shota
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| Project Period (FY) |
2016-04-01 – 2019-03-31
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| Project Status |
Completed (Fiscal Year 2018)
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| Budget Amount *help |
¥17,290,000 (Direct Cost: ¥13,300,000、Indirect Cost: ¥3,990,000)
Fiscal Year 2018: ¥2,470,000 (Direct Cost: ¥1,900,000、Indirect Cost: ¥570,000)
Fiscal Year 2017: ¥2,470,000 (Direct Cost: ¥1,900,000、Indirect Cost: ¥570,000)
Fiscal Year 2016: ¥12,350,000 (Direct Cost: ¥9,500,000、Indirect Cost: ¥2,850,000)
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| Keywords | 大気圧プラズマ / マイクロ波プラズマ / プラズマ加工 / プラズマCVD / 廃棄物処理 |
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| Outline of Final Research Achievements |
Microwave plasmas have been used in various industrial areas. In this study, meter-length microwave atmospheric pressure plasma inside meter-length slot was studied, especially fosucing on the discharge using molecular gases. Through this study, 50cm pure N2 plasma was successfully produced. This result strongly suggests application of this plasma source for various surface modification in large area.
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| Academic Significance and Societal Importance of the Research Achievements |
本研究は、従来より非常に困難であった大面積大気圧プラズマ処理技術を実現するものであり、本研究の成果により、高密度マイクロ波プラズマを用いて分子ガスプラズマ処理の実現を可能とする道筋が描かれた。この成果は今後の様々な電子デバイス製造プロセス分野などでの製造プロセスに革新をもたらす重要な成果と考えている。
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Report
(4 results)
Research Products
(68 results)
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[Presentation] Film quality improvement in slot-type microwave plasma CVD of SiO22017
Author(s)
Masaki Yamamoto, Shota Ishikawa, Haruka Suzuki, and Hirotaka Toyoda
Organizer
9th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials/10th International Conference on Plasma-Nano Technology & Science
Place of Presentation
中部大学（愛知県・春日井市）
Year and Date
2017-03-04
Related Report
Int'l Joint Research
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[Presentation] Long-scale N2 line plasma production under atmospheric pressure2017
Author(s)
Haruka Suzuki, Yuto Tamura, Yaoki Inomata, Hitoshi Itoh, Makoto Sekine, Masaru Hori, and Hirotaka Toyoda
Organizer
9th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials/10th International Conference on Plasma-Nano Technology & Science
Place of Presentation
中部大学（愛知県・春日井市）
Year and Date
2017-03-02
Related Report
Int'l Joint Research
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