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Patterning technique for nanoparticles using a focused electron beam

Research Project

Project/Area Number 16K04903
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeMulti-year Fund
Section一般
Research Field Nanomaterials engineering
Research InstitutionShibaura Institute of Technology

Principal Investigator

Shimojo Masayuki  芝浦工業大学, 工学部, 教授 (00242313)

Co-Investigator(Renkei-kenkyūsha) Kajikawa Kotaro  東京工業大学, 工学院 電気電子系, 教授 (10214305)
Project Period (FY) 2016-04-01 – 2019-03-31
Project Status Completed (Fiscal Year 2018)
Budget Amount *help
¥4,810,000 (Direct Cost: ¥3,700,000、Indirect Cost: ¥1,110,000)
Fiscal Year 2018: ¥1,300,000 (Direct Cost: ¥1,000,000、Indirect Cost: ¥300,000)
Fiscal Year 2017: ¥1,690,000 (Direct Cost: ¥1,300,000、Indirect Cost: ¥390,000)
Fiscal Year 2016: ¥1,820,000 (Direct Cost: ¥1,400,000、Indirect Cost: ¥420,000)
Keywordsナノ粒子 / パターニング / 電子線 / 金ナノ粒子 / 固定 / 配列 / プラズモン
Outline of Final Research Achievements

The conditions of electron irradiation were investigated to fix nanoparticles on a substrate. By simulating the motion of electrons incident on a Au particle and the substrate by the Monte Carlo method, it is suggested that the range in which the particles are fixed is determined by the range in which the electrons are scattered in the substrate. As the scattering range greatly depends on the accelerating voltage of the electrons, it is effective to lower the accelerating voltage in order to produce a fine pattern.
In addition to metal nanoparticles, it is also found that even inorganic nanoparticles can be fixed in the same manner. We have succeeded in producing a fine and complex pattern of inorganic nanoparticles, which have an electrochromic property. It is found that the electron dose is important, in order not to break the electrochromic function of the inorganic nanoparticles.

Academic Significance and Societal Importance of the Research Achievements

現在の半導体集積回路において内部の基板に回路等のパターンを作製するにはリソグラフィー法が使われている。この方法では、基板上に薄膜を作製した後、レジストの塗布、マスクを用いてパターンの露光、現像、エッチング、さらにレジストの除去という多数の工程が必要である。本研究では、ナノ粒子を基板上に並べた後、所望の形状に電子線を照射、洗浄するたけで、目的のパターンを作製することができる。これにより、パターン作製に要する工程を減らすことができる可能性があり、簡便にプラズモン共鳴やエレクトロクロミズム現象を利用するパターンを作製することができる。

Report

(4 results)
  • 2018 Annual Research Report   Final Research Report ( PDF )
  • 2017 Research-status Report
  • 2016 Research-status Report
  • Research Products

    (13 results)

All 2019 2018 2017 2016

All Journal Article (2 results) (of which Peer Reviewed: 2 results,  Open Access: 2 results) Presentation (11 results) (of which Int'l Joint Research: 2 results,  Invited: 1 results)

  • [Journal Article] Maskless micropatterning of electrochromic nanoparticles using a focused electron beam2019

    • Author(s)
      Y. Katori, Y. Suzaka, M. Shimojo
    • Journal Title

      J. Vac. Sci. Technol. B

      Volume: 37 Issue: 3 Pages: 031204-031204

    • DOI

      10.1116/1.5080754

    • Related Report
      2018 Annual Research Report
    • Peer Reviewed / Open Access
  • [Journal Article] Fixation mechanisms of nanoparticles on substrates by electron beam irradiation2017

    • Author(s)
      D. Morioka, T. Nose, T. Chikuta, K. Mitsuishi and M. Shimojo
    • Journal Title

      Beilstein J. Nanotechnol.

      Volume: 8 Pages: 1523-1529

    • DOI

      10.3762/bjnano.8.153

    • Related Report
      2017 Research-status Report
    • Peer Reviewed / Open Access
  • [Presentation] 電子線照射を利用した機能性ナノ粒子のマスクレスパターニング2019

    • Author(s)
      香取友樹、高鹿雄介、野中悠太郎、下条雅幸
    • Organizer
      第43回日本顕微鏡学会関東支部講演会
    • Related Report
      2018 Annual Research Report
  • [Presentation] Micro-patterning of electrochromic Prussian Blue particles using focused electron beam irradiation2018

    • Author(s)
      Y. Katori, Y. Suzaka and M. Shimojo
    • Organizer
      7th International Workshop on Focused Electron Beam Induced Processing (FEBIP 2018)
    • Related Report
      2018 Annual Research Report
    • Int'l Joint Research
  • [Presentation] 電子線照射を利用したプルシアンブルー粒子のパターニングにおける照射電荷量の検討2018

    • Author(s)
      香取友樹、須坂祐輔、下条雅幸
    • Organizer
      日本金属学会 2018年秋期(第163回)講演大会
    • Related Report
      2018 Annual Research Report
  • [Presentation] 電子線照射を利用したプルシアンブルー粒子のパターニング方法の開発2018

    • Author(s)
      香取友樹、須坂祐輔、下条雅幸
    • Organizer
      第74回日本顕微鏡学会学術講演会
    • Related Report
      2018 Annual Research Report
  • [Presentation] 収束電子ビームを用いたナノ構造作製2018

    • Author(s)
      下条雅幸
    • Organizer
      表面技術協会第137回講演大会
    • Related Report
      2017 Research-status Report
    • Invited
  • [Presentation] 電子線照射を利用したプルシアンブルー粒子のパターニング方法の開発2018

    • Author(s)
      香取友樹、須坂祐輔、下条雅幸
    • Organizer
      表面技術協会第137回講演大会
    • Related Report
      2017 Research-status Report
  • [Presentation] Si板上へのAgナノ粒子の固定方法の開発2017

    • Author(s)
      築田大輝、下条雅幸
    • Organizer
      日本金属学会2017年秋期(第161回)講演大会
    • Related Report
      2017 Research-status Report
  • [Presentation] 電子照射を用いたAuナノ粒子の固定における基板の材質の検討2017

    • Author(s)
      築田大輝、能勢智裕、森岡大地、三石和貴、下条雅幸
    • Organizer
      日本顕微鏡学会第73回学術講演会
    • Related Report
      2017 Research-status Report
  • [Presentation] Si板上へのSiO2ナノ粒子の固定方法の開発2016

    • Author(s)
      築田大輝、乘木貴宏、下条雅幸
    • Organizer
      日本金属学会2016年秋期講演大会
    • Place of Presentation
      大阪
    • Year and Date
      2016-09-21
    • Related Report
      2016 Research-status Report
  • [Presentation] Fixing mechanism of gold nanoparticles using focused electron beam irradiation2016

    • Author(s)
      D. Morioka, T. Noriki, M. Shimojo and K. Mitsuishi
    • Organizer
      6th Workshop on Focused Electron Beam Induced Processing (FEBIP 2016)
    • Place of Presentation
      Vienna, Austria
    • Year and Date
      2016-07-06
    • Related Report
      2016 Research-status Report
    • Int'l Joint Research
  • [Presentation] 電子照射を用いた金ナノ粒子パターニングにおける粒子固定メカニズムの検討2016

    • Author(s)
      森岡大地、乘木貴宏、下条雅幸
    • Organizer
      日本顕微鏡学会第72回学術講演会
    • Place of Presentation
      仙台
    • Year and Date
      2016-06-14
    • Related Report
      2016 Research-status Report

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Published: 2016-04-21   Modified: 2020-03-30  

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