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Elucidation of fine polishing mechanism by measuring interfacial potential during chemical mechanical polishing

Research Project

Project/Area Number 16K06009
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeMulti-year Fund
Section一般
Research Field Production engineering/Processing studies
Research InstitutionShizuoka University

Principal Investigator

SUDA Seiichi  静岡大学, 工学部, 教授 (50226578)

Project Period (FY) 2016-04-01 – 2019-03-31
Project Status Completed (Fiscal Year 2018)
Budget Amount *help
¥4,680,000 (Direct Cost: ¥3,600,000、Indirect Cost: ¥1,080,000)
Fiscal Year 2018: ¥1,040,000 (Direct Cost: ¥800,000、Indirect Cost: ¥240,000)
Fiscal Year 2017: ¥1,040,000 (Direct Cost: ¥800,000、Indirect Cost: ¥240,000)
Fiscal Year 2016: ¥2,600,000 (Direct Cost: ¥2,000,000、Indirect Cost: ¥600,000)
Keywords化学機械研磨 / 電荷移動反応 / 水和層 / ガラス / 酸化セリウム / ネルンスト式 / セリア / せん断応力 / 水和自由エネルギー / 界面抵抗 / 電位計測 / サファイア / 超精密加工 / 酸化還元電位
Outline of Final Research Achievements

Ultra-fine planarization is an indispensable for developing highly integrated next-generation devices such as SiC power devices. We tried to elucidate chemical polishing mechanism of glasses by quantitatively estimating charge carrier behavior or charge transfer reactions during polishing. Specifically, change in electric potential during polishing was estimated with glasses. The change in potential represented the hydration layer formed on the surface of glasses by polishing. The potential change was coincided with hydrogen free energy of glass, and it also obeyed Nernst equation. We will develop electrochemical reaction kinetics by estimating temperature dependence of the potential change during polishing in order to elucidate chemical polishing or chemical mechanical polishing mechanism.

Academic Significance and Societal Importance of the Research Achievements

本研究は,精密工学分野,材料化学分野,電気化学分野を横断して,化学機械研磨,特に化学研磨メカニズムの本質を明らかにしようとしているところに特色がある。これらの主として3分野を横断的に解析することによって,新たな研磨材料に関する学術分野を創成しようとするところが本研究の学術的な特色である。本研究成果によって,化学研磨特性に関する学術的な体系化を実現するとともに,高度CMP材料に関する学術分野を創成する。これらの学術的進展により,今後ますます高度化及び多様化する研磨対象材(例えば複合材料など)に対しても,速やかな研磨材料開発が可能となるように,支援体制を構築することで工学の進展に貢献する。

Report

(4 results)
  • 2018 Annual Research Report   Final Research Report ( PDF )
  • 2017 Research-status Report
  • 2016 Research-status Report
  • Research Products

    (11 results)

All 2019 2018 2017 2016 Other

All Journal Article (1 results) (of which Peer Reviewed: 1 results,  Acknowledgement Compliant: 1 results) Presentation (8 results) (of which Int'l Joint Research: 4 results,  Invited: 1 results) Remarks (2 results)

  • [Journal Article] Change in Slurry/Glass Interfacial Resistance by Chemical Mechanical Polishing2017

    • Author(s)
      T. Sugimoto, S. Suda, K. Kawahara
    • Journal Title

      MRS Advances

      Volume: - Issue: 41 Pages: 2205-2210

    • DOI

      10.1557/adv.2017.335

    • Related Report
      2016 Research-status Report
    • Peer Reviewed / Acknowledgement Compliant
  • [Presentation] ガラスのCMPにおける水和自由エネルギーの評価2019

    • Author(s)
      福嵜遼,須田聖一
    • Organizer
      2019年度精密工学会春季大会
    • Related Report
      2018 Annual Research Report
  • [Presentation] Evaluation of hydration free energy of glass by electric potential change during chemical mechanical polishing2019

    • Author(s)
      S. Suda, R. Fukuzaki, K. Kawahara
    • Organizer
      43rd International Conference and Exposition on Advanced Ceramics and Composites
    • Related Report
      2018 Annual Research Report
    • Int'l Joint Research
  • [Presentation] La固溶セリアの表面電位変化による研磨過程におけるガラスの水和層生成評価2018

    • Author(s)
      須田聖一,福嵜遼,川原浩一
    • Organizer
      2018年度精密工学会秋季大会
    • Related Report
      2018 Annual Research Report
  • [Presentation] Quantitative estimation of hydration layer during chemical mechanical polishing of glass2018

    • Author(s)
      S. Suda, T. Sugimoto, S. Kawasaki
    • Organizer
      42nd International Conference and Exposition on Advanced Ceramics and Composites
    • Related Report
      2017 Research-status Report
    • Int'l Joint Research
  • [Presentation] ガラスの研磨時における電位変化の評価2018

    • Author(s)
      川﨑祥平,須田聖一
    • Organizer
      精密工学会春季大会
    • Related Report
      2017 Research-status Report
  • [Presentation] 界面導電性評価による化学研磨由来水和層の評価2017

    • Author(s)
      杉本拓,須田聖一,川原浩一
    • Organizer
      精密工学会春季大会
    • Place of Presentation
      慶応義塾大学(神奈川県横浜市)
    • Year and Date
      2017-03-13
    • Related Report
      2016 Research-status Report
  • [Presentation] Change in Slurry/Glass Interfacial Resistance by Chemical Mechanical Polishing2016

    • Author(s)
      T. Sugimoto, S. Suda, K. Kawahara
    • Organizer
      2016 MRS Fall Meeting
    • Place of Presentation
      米国,ボストン
    • Year and Date
      2016-11-28
    • Related Report
      2016 Research-status Report
    • Int'l Joint Research
  • [Presentation] Chemical mechanical polishing of glass2016

    • Author(s)
      S. Suda
    • Organizer
      CerSJ-GOMD Joint Symposium on Glass Science and Technologies
    • Place of Presentation
      京都大学(京都府京都市)
    • Year and Date
      2016-11-15
    • Related Report
      2016 Research-status Report
    • Int'l Joint Research / Invited
  • [Remarks] 研究室HP

    • URL

      http://sudalab.eng.shizuoka.ac.jp

    • Related Report
      2017 Research-status Report
  • [Remarks] 研究室HP

    • URL

      http://cheme.eng.shizuoka.ac.jp/~sudalab/

    • Related Report
      2016 Research-status Report

URL: 

Published: 2016-04-21   Modified: 2020-03-30  

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