Studies on electron optics correcting both chromatic and spherical aberrations with SYLC corrector

• Project/Area Number: 16K06261
• Research Category: Grant-in-Aid for Scientific Research (C)
• Allocation Type: Multi-year Fund
• Section: 一般
• Research Field: Electronic materials/Electric materials
• Research Institution: Osaka University
• Principal Investigator: Nishi Ryuji 大阪大学, 超高圧電子顕微鏡センター, 准教授 (40243183)
• Project Period (FY): 2016-04-01 – 2019-03-31
• Project Status: Completed (Fiscal Year 2018)
• Budget Amount: ¥4,420,000 (Direct Cost: ¥3,400,000、Indirect Cost: ¥1,020,000); Fiscal Year 2018: ¥1,040,000 (Direct Cost: ¥800,000、Indirect Cost: ¥240,000); Fiscal Year 2017: ¥1,560,000 (Direct Cost: ¥1,200,000、Indirect Cost: ¥360,000); Fiscal Year 2016: ¥1,820,000 (Direct Cost: ¥1,400,000、Indirect Cost: ¥420,000)
• Keywords: 高次球面収差補正 / 微分代数法 / 色収差補正 / SYLC / 微分代数 / 電子光学 / 収差補正 / 走査電子顕微鏡 / 多極子

Outline of Final Research Achievements

We proposed an aberration corrector with a new simple configuration to enable it to use for many scanning electron microscopes. Parallel linear line currents without magnetic materials are arranged in axial symmetry with respect to the center of the lens. We named it SYLC (Symmetric Line Currents) and showed that constructing an aberration corrector by using the SYLC, which can simultaneously suppress the blurs not only spherical aberration due to lens geometry but also chromatic aberration due to electron beam energy fluctuation.

Academic Significance and Societal Importance of the Research Achievements

電子顕微鏡の分解能を高める収差補正器として性能を高めるためには、その重要な特性量である非常に多くの種類の収差係数を求め、最適な構成を探索する。そのために微分代数という新しい数学的手法を用いたシミュレーションツールの開発を行い、SYLC収差補正器の特性を明らかにした。その結果シンプルな構成のSYLCを用いた収差補正器ができることを示した。コストを抑えた収差補正器へ展開が期待される。

Research Products

• [Journal Article] Spherical aberration correction with an in-lens N-fold symmetric line currents model (2018)
  • Author(s): Hoque Shahedul、Ito Hiroyuki、Nishi Ryuji
  • Journal Title: Ultramicroscopy Volume: 187 Pages: 135-143
  • DOI: 10.1016/j.ultramic.2018.02.002
  • Peer Reviewed
• [Journal Article] A Novel Method for Higher Order Aberration Correction in Electron Microscopes (2017)
  • Author(s): Shahedul Hoque, Hiroyuki Ito, Akio Takaoka, Ryuji Nishi
  • Journal Title: Proceedings of Microscopy & Microanalysis 2017 Volume: 23 Issue: S1 Pages: 472-473
  • DOI: 10.1017/s143192761700304x
• [Journal Article] Axial geometrical aberration correction up to 5th order with N -SYLC (2017)
  • Author(s): Hoque Shahedul、Ito Hiroyuki、Takaoka Akio、Nishi Ryuji
  • Journal Title: Ultramicroscopy Volume: 182 Pages: 68-80
  • DOI: 10.1016/j.ultramic.2017.06.014
  • Peer Reviewed
• [Presentation] Investigation of electromagnetic-SYLC for chromatic aberration correction (2018)
  • Author(s): R. Nishi, S. Hoque, H. Ito, and A.Takaoka
  • Organizer: Tenth International Conference on Charged Particle Optics (CPO-10)
  • Int'l Joint Research
• [Presentation] Spherical aberration correction with in-lens N-fold symmetric line currents (2018)
  • Author(s): S. Hoque, R. Nishi, H. Ito, and A.Takaoka
  • Organizer: Tenth International Conference on Charged Particle Optics (CPO-10)
  • Int'l Joint Research
• [Presentation] インレンズ型対称線電流球面収差補正器 (2018)
  • Author(s): ホックシャヘドゥル、西竜治、伊藤博之
  • Organizer: 日本顕微鏡学会第74回学術講演会
• [Presentation] 対称線電流(SYLC)によるインレンズ球面収差補正器と色収差補正の検討 (2018)
  • Author(s): 西竜治、ホックシャヘドゥル、伊藤博之、鷹岡昭夫
  • Organizer: 荷電粒子ビームの工業への応用第１３２委員会 第233回研究会
• [Presentation] A Novel Method for Higher Order Aberration Correction in Electron Microscopes (2017)
  • Author(s): Shahedul Hoque, Hiroyuki Ito, Akio Takaoka and Ryuji Nishi
  • Organizer: Microscopy & Microanalysis 2017 (M&M)
• [Presentation] N-SYLCモデル球面収差補正器の微分代数法による高次収差解析とパラメータ最適化 (2017)
  • Author(s): 西竜治、ホックシャヘドゥル、伊藤博之、鷹岡昭夫
  • Organizer: 日本顕微鏡学会第73回学術講演会
• [Presentation] 微分代数による収差解析法 (2017)
  • Author(s): 西竜治
  • Organizer: 日本顕微鏡学会第73回学術講演会
  • Invited
• [Presentation] A Novel N-SYLC Model for Correcting Higher Order Geometrical Aberrations (2017)
  • Author(s): Shahedu Hoque, Hiroyuki Ito, Ryuji Nishi, Akio Takaoka
  • Organizer: 日本顕微鏡学会第73回学術講演会
• [Presentation] 微分代数法による回転対称線電流を用いた球面収差補正器の特性解析 (2016)
  • Author(s): 西竜治、山名達也、ホックシャヘドゥル、伊藤博之、鷹岡昭夫
  • Organizer: 日本顕微鏡学会第72回学術講演会
  • Place of Presentation: 仙台国際センター
  • Year and Date: 2016-06-14
• [Presentation] 3回対称線電流（N3-SYLC）による3 次球面収差補正の研究 (2016)
  • Author(s): ホック シャヘドゥル，伊藤 博之，西 竜治，鷹岡昭夫，モンロー エリック
  • Organizer: 日本顕微鏡学会第72回学術講演会
  • Place of Presentation: 仙台国際センター
  • Year and Date: 2016-06-14