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Development of Rare-metal-free Ga-Sn-O electron devices with defect evaluation

Research Project

Project/Area Number 16K06733
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeMulti-year Fund
Section一般
Research Field Inorganic materials/Physical properties
Research InstitutionRyukoku University

Principal Investigator

Matsuda Tokiyoshi  龍谷大学, 公私立大学の部局等, 研究員 (30389209)

Co-Investigator(Kenkyū-buntansha) 木村 睦  龍谷大学, 理工学部, 教授 (60368032)
Project Period (FY) 2016-04-01 – 2020-03-31
Project Status Completed (Fiscal Year 2019)
Budget Amount *help
¥4,940,000 (Direct Cost: ¥3,800,000、Indirect Cost: ¥1,140,000)
Fiscal Year 2018: ¥650,000 (Direct Cost: ¥500,000、Indirect Cost: ¥150,000)
Fiscal Year 2017: ¥2,080,000 (Direct Cost: ¥1,600,000、Indirect Cost: ¥480,000)
Fiscal Year 2016: ¥2,210,000 (Direct Cost: ¥1,700,000、Indirect Cost: ¥510,000)
Keywords酸化物半導体 / 薄膜トランジスタ / レアメタル / 熱電素子 / フレキシブルデバイス / アモルファス酸化物半導体 / 酸化ガリウムスズ / 電圧ストレス試験 / 低温TFT / ミストCVD / 抵抗変化型メモリー / ニューラルネットワーク / 格子欠陥 / 光照射電圧ストレス試験 / 機能性セラミックス材料 / 酸素空孔 / 薄膜デバイス
Outline of Final Research Achievements

Rare-metal-free Ga-Sn-O (GTO) devices were developed for thin-film transistor (TFT), thermoelectric device, and ReRAM. High-performance and stable GTO TFTs were demonstrated for the first time without the use of rare metals such as In for next generation devices of displays and flexible electronics. A high field effect mobility of 25.6 cm2/Vs was achieved, because the orbital structure of Sn was similar to that of In. The stability of the GTO TFTs was examined under bias, temperature, and light illumination conditions. The electrical behavior of the GTO TFTs was more stable than that of In-Ga-Zn-O (IGZO) TFTs, which was attributed to the elimination of weak Zn-O bonds.
GTO film would be the hopeful material for active layer of novel oxide devices.

Academic Significance and Societal Importance of the Research Achievements

本研究で得られたGTO TFTは各種ストレス耐性を含む電気的特性が良好であり,他の酸化物半導体TFTでも課題となるNBIS試験に対して安定性が高かった。
これらの要因は,Sn4+の電子構造がIn3+と同じ状態を取ること,また二価のアモルファスSnOはp型伝導を示し,四価のSnO2はn型伝導を示すため,特性シフトの原因となる余剰電子あるいはホールを局所的な構造を乱すことなく,価数の変化を行うことによって補償する働きすることにより安定性を向上させることに寄与しているためであると考えられ,学術的に今後広がりをもたらすものであると考える。
したがって,学術的にも社会的にも意義深い成果が得られたと考える。

Report

(5 results)
  • 2019 Annual Research Report   Final Research Report ( PDF )
  • 2018 Research-status Report
  • 2017 Research-status Report
  • 2016 Research-status Report
  • Research Products

    (34 results)

All 2020 2019 2018 2017 2016 Other

All Journal Article (10 results) (of which Peer Reviewed: 10 results,  Open Access: 5 results,  Acknowledgement Compliant: 2 results) Presentation (17 results) (of which Int'l Joint Research: 9 results,  Invited: 7 results) Remarks (7 results)

  • [Journal Article] Memristor property of an amorphous Sn?Ga?O thin-film device deposited using mist chemical-vapor-deposition method2020

    • Author(s)
      Takishita Yuta、Kobayashi Masaki、Hattori Kazuki、Matsuda Tokiyoshi、Sugisaki Sumio、Nakashima Yasuhiko、Kimura Mutsumi
    • Journal Title

      AIP Advances

      Volume: 10 Issue: 3 Pages: 035112-035112

    • DOI

      10.1063/1.5143294

    • Related Report
      2019 Annual Research Report
    • Peer Reviewed / Open Access
  • [Journal Article] Memristive Characteristic of an Amorphous Ga-Sn-O Thin-Film Device with Double Layers of Different Oxygen Density2019

    • Author(s)
      Kurasaki、Tanaka、Sugisaki、Matsuda、Koretomo、Magari、Furuta、Kimura
    • Journal Title

      Materials

      Volume: 12 Issue: 19 Pages: 3236-3236

    • DOI

      10.3390/ma12193236

    • Related Report
      2019 Annual Research Report
    • Peer Reviewed / Open Access
  • [Journal Article] レアメタルフリーGa-Sn-O材料の薄膜トランジスタへの応用2019

    • Author(s)
      松田 時宜, 梅田 鉄馬, 加藤 雄太, 西本 大貴, 杉崎 澄生, 古田 守, 木村 睦
    • Journal Title

      電子情報通信学会論文誌 C

      Volume: J102-C Pages: 305-311

    • Related Report
      2019 Annual Research Report
    • Peer Reviewed / Open Access
  • [Journal Article] Memristive characteristic of an amorphous Ga-Sn-O thin-film device2019

    • Author(s)
      Sugisaki Sumio、Matsuda Tokiyoshi、Uenuma Mutsunori、Nabatame Toshihide、Nakashima Yasuhiko、Imai Takahito、Magari Yusaku、Koretomo Daichi、Furuta Mamoru、Kimura Mutsumi
    • Journal Title

      Scientific Reports

      Volume: 9 Issue: 1 Pages: 2757-2757

    • DOI

      10.1038/s41598-019-39549-9

    • Related Report
      2019 Annual Research Report 2018 Research-status Report
    • Peer Reviewed / Open Access
  • [Journal Article] Neuromorphic System with Crosspoint-Type Amorphous Ga-Sn-O Thin-Film Devices as Self-Plastic Synapse Elements2019

    • Author(s)
      Kimura Mutsumi、Umeda Kenta、Ikushima Keisuke、Hori Toshimasa、Tanaka Ryo、Shimura Junpei、Kondo Atsushi、Tsuno Takumi、Sugisaki Sumio、Kurasaki Ayata、Hashimoto Kaito、Matsuda Tokiyoshi、Kameda Tomoya、Nakashima Yasuhiko
    • Journal Title

      ECS Transactions

      Volume: 90 Issue: 1 Pages: 157-166

    • DOI

      10.1149/09001.0157ecst

    • Related Report
      2019 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Research and Applications of Amorphous Metal-Oxide Semiconductor Devices - In-Ga-Zn-O and Ga-Sn-O Thin-Film Devices -2018

    • Author(s)
      M. Kimura, T. Kamiya, T. Matsuda, K. Umeda, A. Fukawa, and Y. Nakashima
    • Journal Title

      SID Symposium Digest of Technical Papers

      Volume: 49 Issue: S1 Pages: 512-515

    • DOI

      10.1002/sdtp.12768

    • Related Report
      2018 Research-status Report
    • Peer Reviewed
  • [Journal Article] Room-temperature fabrication of a Ga-Sn-O thin-film transistor2017

    • Author(s)
      Matsuda Tokiyoshi、Takagi Ryo、Umeda Kenta、Kimura Mutsumi
    • Journal Title

      Solid-State Electronics

      Volume: 134 Pages: 19-21

    • DOI

      10.1016/j.sse.2017.05.006

    • Related Report
      2017 Research-status Report
    • Peer Reviewed
  • [Journal Article] Thermoelectric effects of amorphous Ga-Sn-O thin film2017

    • Author(s)
      Matsuda Tokiyoshi、Uenuma Mutsunori、Kimura Mutsumi
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 56 Issue: 7 Pages: 070309-070309

    • DOI

      10.7567/jjap.56.070309

    • NAID

      210000147983

    • Related Report
      2017 Research-status Report
    • Peer Reviewed
  • [Journal Article] Rare-metal-free high-performance Ga-Sn-O thin film transisitor2017

    • Author(s)
      Tokiyoshi Matsuda, Kenta Umeda, Yuta Kato, Daiki Nishimoto, Mamoru Furuta, and Mutsumi Kimura,
    • Journal Title

      Scientific Reports

      Volume: 7 Issue: 1 Pages: 44326-44326

    • DOI

      10.1038/srep44326

    • Related Report
      2016 Research-status Report
    • Peer Reviewed / Open Access / Acknowledgement Compliant
  • [Journal Article] Thermoelectric effect of Ga-Sn-O thin films2017

    • Author(s)
      Tokiyoshi Matsuda, Mutsunori Uenuma, Mutsumi Kimura
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 印刷中

    • Related Report
      2016 Research-status Report
    • Peer Reviewed / Acknowledgement Compliant
  • [Presentation] Development of two-layered ReRAM using Ga-Sn-O thin film2019

    • Author(s)
      A Kurasaki, S Sugiski, R Tanaka, T Matsuda, M Kimura
    • Organizer
      AM-FPD, 2019
    • Related Report
      2019 Annual Research Report
  • [Presentation] Ga-Sn-O thin film thermoelectric conversion devise fabricated by Mist CVD method2019

    • Author(s)
      T Aramaki, T Matsuda, K Umeda, M Uenuma, M Kimura
    • Organizer
      AM-FPD, 2019
    • Related Report
      2019 Annual Research Report
  • [Presentation] Room Temperature Fabrication of Variable Resistive Memory Using Ga-Sn-O Thin Film2018

    • Author(s)
      S. Sugisaki, A. Kurasaki, R. Tanaka, T. Matsuda, and M. Kimura
    • Organizer
      2018 25th International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD)
    • Related Report
      2018 Research-status Report
    • Int'l Joint Research
  • [Presentation] Characteristic Analysis of Ga-Sn-O TFT Subjected to UV Annealing Treatment2018

    • Author(s)
      K. Tanino, R. Takagi, M. Kimura, and T. Matsuda
    • Organizer
      2018 IEEE International Meeting for Future of Electron Devices, Kansai (IMFEDK)
    • Related Report
      2018 Research-status Report
    • Int'l Joint Research
  • [Presentation] Thermoelectric Conversion Devise Using Ga-Sn-O Thin Film Prepared by Mist CVD Method2018

    • Author(s)
      T. Aramaki, R. Nomura, T. Matsuda, M. Kimura, K. Umeda, M. Uenuma, and Y. Uraoka
    • Organizer
      2018 IEEE International Meeting for Future of Electron Devices, Kansai (IMFEDK)
    • Related Report
      2018 Research-status Report
    • Int'l Joint Research
  • [Presentation] Evaluation of GTO Film Deposited Using mist CVD Method2018

    • Author(s)
      Y. Takishita, R. Okamoto, M. Kimura, and T. Matsuda
    • Organizer
      2018 IEEE International Meeting for Future of Electron Devices, Kansai (IMFEDK)
    • Related Report
      2018 Research-status Report
    • Int'l Joint Research
  • [Presentation] Rare-metal-free high-performance Ga-Sn-O thin film transistor2017

    • Author(s)
      Tokiyoshi Matsuda, Kenta Umeda, Yuta Kato, Daiki Nishimoto, Mamoru Furuta, and Mutsumi Kimura
    • Organizer
      9th World Congress on Materials Science and Engineering
    • Place of Presentation
      Rome, Italia
    • Year and Date
      2017-06-12
    • Related Report
      2016 Research-status Report
    • Int'l Joint Research / Invited
  • [Presentation] Rare-metal-free high-performance Ga-Sn-O thin film transistor2017

    • Author(s)
      T. Matsuda, K. Umeda, M. Kimura
    • Organizer
      9th World Congress of Materials Science and Engineering, June 12-14, 2017 Rome, Italy (June 14, Wed., 11:35-11:50, 2017)
    • Related Report
      2017 Research-status Report
    • Int'l Joint Research / Invited
  • [Presentation] 高性能レアメタルフリーGa-Sn-O薄膜トランジスタ2017

    • Author(s)
      梅田 鉄馬、松田 時宜、木村 睦
    • Organizer
      応用物理学会 第64回春季学術講演会
    • Place of Presentation
      パシフィコ横浜
    • Related Report
      2016 Research-status Report
  • [Presentation] 酸化物半導体の研究開発と電子デバイスへの新規応用2017

    • Author(s)
      木村 睦、松田 時宜
    • Organizer
      第2回 NEDIA DAY 関西
    • Place of Presentation
      龍谷大学アバンティ響都ホール校友会館
    • Related Report
      2016 Research-status Report
    • Invited
  • [Presentation] レアメタルフリー酸化物半導体薄膜トランジスタ2017

    • Author(s)
      木村 睦、松田 時宜
    • Organizer
      JST新技術説明会
    • Place of Presentation
      機械振興会館
    • Related Report
      2016 Research-status Report
    • Invited
  • [Presentation] ミストCVD法で作製したGaSnO薄膜の特性評価2016

    • Author(s)
      福嶋 大貴, 弓削 政博, 木村 睦, 松田 時宜
    • Organizer
      電子情報通信学会 SDM EID
    • Place of Presentation
      奈良先端科学技術大学院大学
    • Related Report
      2016 Research-status Report
  • [Presentation] 新規レアメタルフリーAOS-TFTの研究開発2016

    • Author(s)
      梅田 鉄馬, 加藤 雄太, 西本 大樹, 松田 時宜, 木村 睦
    • Organizer
      電子情報通信学会 SDM EID
    • Place of Presentation
      奈良先端科学技術大学院大学
    • Related Report
      2016 Research-status Report
  • [Presentation] Evaluation of Defects in Oxide Semiconductors using Electron Spin Resonance (ESR)2016

    • Author(s)
      Tokiyoshi Matsuda, and Mutsumi Kimura
    • Organizer
      2016 International Symposium for Advanced Materials Research (ISAMR 2016) Sun Moon Lake, Taiwan, August 13, 10:40-11:10, No. 3, p. 14.
    • Place of Presentation
      Sun Moon Lake, Taiwan
    • Related Report
      2016 Research-status Report
    • Int'l Joint Research / Invited
  • [Presentation] Characteristic Evaluation of Ga-Sn-O Thin Films fabricated using RF Magnetron Sputtering2016

    • Author(s)
      Kenta Umeda, Yuta Kato, Daiki Nishimoto, Tokiyoshi Matsuda, and Mutsumi, Kimura
    • Organizer
      2016 IEEE International Meeting for Future of Electron Devices, Kansai (IMFEDK), (2016)
    • Place of Presentation
      龍谷大学アバンティ響都ホール校友会館
    • Related Report
      2016 Research-status Report
  • [Presentation] Evaluation and Development of New Oxide Semiconductor2016

    • Author(s)
      Tokiyoshi Matsuda and Mutsumi Kimura
    • Organizer
      Energy Materials and Nanotechnology (EMN Prague)
    • Place of Presentation
      Prague, Czech
    • Related Report
      2016 Research-status Report
    • Int'l Joint Research / Invited
  • [Presentation] Relationships between the Defects and Electrical Properties of Oxide Semiconductor2016

    • Author(s)
      Tokiyoshi Matsuda and Mutsumi Kimura
    • Organizer
      Emerging Technologies Communications Microsystems Optoelectronics Sensors
    • Place of Presentation
      Montreal, Canada
    • Related Report
      2016 Research-status Report
    • Int'l Joint Research / Invited
  • [Remarks] 松田 時宜 - 研究者 - researchmap

    • URL

      https://researchmap.jp/toki/

    • Related Report
      2019 Annual Research Report 2018 Research-status Report
  • [Remarks] Tokiyoshi Matsuda

    • URL

      https://scholar.google.co.jp/citations?hl=ja&user=u9xAI7MAAAAJ&view_op=list_works&sortby=pubdate

    • Related Report
      2019 Annual Research Report
  • [Remarks] Tokiyoshi Matsuda

    • URL

      https://scholar.google.co.jp/citations?user=u9xAI7MAAAAJ&hl=ja

    • Related Report
      2018 Research-status Report
  • [Remarks]

    • URL

      http://researchmap.jp/toki

    • Related Report
      2017 Research-status Report
  • [Remarks] 松田 時宜 - 研究者 - researchmap

    • URL

      http://researchmap.jp/toki/

    • Related Report
      2016 Research-status Report
  • [Remarks] Tokiyoshi Matsuda - Google Scholar Citations

    • URL

      https://scholar.google.co.jp/citations?user=u9xAI7MAAAAJ&hl=ja

    • Related Report
      2016 Research-status Report
  • [Remarks] Tokiyoshi Matsuda on Researchgate

    • URL

      https://www.researchgate.net/profile/Tokiyoshi_Matsuda

    • Related Report
      2016 Research-status Report

URL: 

Published: 2016-04-21   Modified: 2021-02-19  

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