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Study of defect generation processes in nano-scale devices and the deign methodology based on stochastic theory

Research Project

Project/Area Number 16K14405
Research Category

Grant-in-Aid for Challenging Exploratory Research

Allocation TypeMulti-year Fund
Research Field Composite materials/Surface and interface engineering
Research InstitutionKyoto University

Principal Investigator

Eriguchi Koji  京都大学, 工学研究科, 教授 (70419448)

Co-Investigator(Kenkyū-buntansha) 巽 和也  京都大学, 工学研究科, 准教授 (90372854)
Research Collaborator WEI ZHIQIANG  
Project Period (FY) 2016-04-01 – 2019-03-31
Project Status Completed (Fiscal Year 2018)
Budget Amount *help
¥3,510,000 (Direct Cost: ¥2,700,000、Indirect Cost: ¥810,000)
Fiscal Year 2018: ¥780,000 (Direct Cost: ¥600,000、Indirect Cost: ¥180,000)
Fiscal Year 2017: ¥1,300,000 (Direct Cost: ¥1,000,000、Indirect Cost: ¥300,000)
Fiscal Year 2016: ¥1,430,000 (Direct Cost: ¥1,100,000、Indirect Cost: ¥330,000)
Keywordsプラズマ処理 / 表面処理 / ナノ構造 / 確率過程 / 欠陥
Outline of Final Research Achievements

Detailed analysis based on the stochastic theory is essential for controlling the creation of defects in highly reliable devices. In this study, we focus on the defect creation process in Si substrates due to plasma exposure and the detailed behavior of oxygen vacancies in metal oxides under the electrical stress. The defect creation in Si substrates was found to obey the following two-step process, i.e., the progressive and saturation phases. In addition to a statistical formulation for the saturation phase, the stochastic effect was confirmed to be a key to the description of the defect creation in the progressive phase. An analytical formula based on stochastic differential equation was found to describe the cycle-to-cycle current trajectories under the electrical stress. The implementation of the stochastic theory discussed here is extremely important in designing of future highly reliable devices.

Academic Significance and Societal Importance of the Research Achievements

高信頼性機能材料中の原子レベルの欠陥形成過程は、これまで統計的ゆらぎ・バラツキに基づいたモデルで表現されていたが、本研究では、確率過程解析を実装した新しいモデル構築を目指した。種々の材料中の極微少量の局所欠陥構造の振る舞いを確率過程として捉え、確率解析により記述した。応用数学を有効活用した機能材料中の欠陥制御は新しい学術として幅広い工学分野への応用が期待される。

Report

(4 results)
  • 2018 Annual Research Report   Final Research Report ( PDF )
  • 2017 Research-status Report
  • 2016 Research-status Report
  • Research Products

    (28 results)

All 2019 2018 2017 2016 Other

All Journal Article (8 results) (of which Peer Reviewed: 8 results) Presentation (18 results) (of which Int'l Joint Research: 14 results,  Invited: 4 results) Remarks (2 results)

  • [Journal Article] Local flow and heat transfer characteristics of viscoelastic fluid in a serpentine channel2019

    • Author(s)
      K. Tatsumi, W. Nagasaka, R. Kimura, N. Shinotsuka, R. Kuriyama, K. Nakabe
    • Journal Title

      Int. J. Heat and Mass Transfer

      Volume: 138 Pages: 432-442

    • Related Report
      2018 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Optical and electrical characterization methods of plasma-induced damage in silicon nitride films2018

    • Author(s)
      Tomohiro Kuyama and Koji Eriguchi
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 57 Issue: 6S2 Pages: 06JD03-06JD03

    • DOI

      10.7567/jjap.57.06jd03

    • NAID

      210000149200

    • Related Report
      2018 Annual Research Report
    • Peer Reviewed
  • [Journal Article] First-principles predictions of electronic structure change in plasma-damaged materials2018

    • Author(s)
      Yuta Yoshikawa and Koji Eriguchi
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 57 Issue: 6S2 Pages: 06JD04-06JD04

    • DOI

      10.7567/jjap.57.06jd04

    • NAID

      210000149201

    • Related Report
      2018 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Incident ion dose evolution of damaged layer thickness in Si substrate exposed to Ar and He plasmas2018

    • Author(s)
      Takashi Hamano and Koji Eriguchi
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 57 Issue: 6S2 Pages: 06JD02-06JD02

    • DOI

      10.7567/jjap.57.06jd02

    • NAID

      210000149199

    • Related Report
      2018 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Analytic Modeling for Nanoscale Resistive Filament Variation in ReRAM With Stochastic Differential Equation2017

    • Author(s)
      Z. Wei and K. Eriguchi
    • Journal Title

      IEEE Transactions on Electron Devices

      Volume: 64 Issue: 5 Pages: 2201-2206

    • DOI

      10.1109/ted.2017.2681104

    • Related Report
      2017 Research-status Report
    • Peer Reviewed
  • [Journal Article] An evaluation method of the profile of plasma-induced defects based on capacitance-voltage measurement2017

    • Author(s)
      Yukimasa Okada, Kouichi Ono, and Koji Eriguchi
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 56 Issue: 6S2 Pages: 06HD04-06HD04

    • DOI

      10.7567/jjap.56.06hd04

    • NAID

      210000147963

    • Related Report
      2017 Research-status Report
    • Peer Reviewed
  • [Journal Article] Electrical characterization of carrier trapping behavior of defects created by plasma exposures2017

    • Author(s)
      Koji Eriguchi and Yukimasa Okada
    • Journal Title

      Journal of Physics D: Applied Physics

      Volume: 50 Issue: 26 Pages: 26LT01-26LT01

    • DOI

      10.1088/1361-6463/aa731a

    • Related Report
      2017 Research-status Report
    • Peer Reviewed
  • [Journal Article] Analysis and Measurement of Dielectrophoretic Manipulation of Particles and Lymphocytes Using Rail-type Electrodes2016

    • Author(s)
      K. Tatsumi, K. Kawano, H. Okui, H. Shintani, K. Nakabe
    • Journal Title

      Medical Engineering & Physics

      Volume: 38 Issue: 1 Pages: 24-32

    • DOI

      10.1016/j.medengphy.2015.05.005

    • Related Report
      2016 Research-status Report
    • Peer Reviewed
  • [Presentation] 過渡的プラズマダメージ形成過程を考慮したプロセスデザインの検討2019

    • Author(s)
      濱野誉,占部継一郎,江利口浩二
    • Organizer
      応用物理学会シリコンテクノロジー分科会 第215回研究集会
    • Related Report
      2018 Annual Research Report
    • Invited
  • [Presentation] First-principles study on electronic structure modifications of Si substrate with the Cl-terminated surface2018

    • Author(s)
      Y. Yoshikawa, K. Urabe, and K. Eriguchi
    • Organizer
      40th International Symposium on Dry Process: DPS2018
    • Related Report
      2018 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Comparative characterization of gas species dependence of transient behaviors in plasma-induced Si damage2018

    • Author(s)
      T. Hamano, K. Urabe, and K. Eriguchi
    • Organizer
      40th International Symposium on Dry Process: DPS2018
    • Related Report
      2018 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Effects of Microwave Annealing on the Recovery of Microscopic Defects in Silicon Nitride Films2018

    • Author(s)
      T. Kuyama, Y. Sato, K. Urabe, and K. Eriguchi
    • Organizer
      40th International Symposium on Dry Process: DPS2018
    • Related Report
      2018 Annual Research Report
    • Int'l Joint Research
  • [Presentation] プラズマプロセスにおける欠陥形成過程のモデリングと予測2018

    • Author(s)
      江利口浩二
    • Organizer
      第206回応用物理学会シリコンテクノロジー分科会研究会
    • Related Report
      2018 Annual Research Report
    • Invited
  • [Presentation] A comprehensive analysis of progressive behavior of plasma-induced damage formation in Si substrates2017

    • Author(s)
      T. Hamano and K. Eriguchi
    • Organizer
      39th International Symposium on Dry Process: DPS2017
    • Related Report
      2017 Research-status Report
    • Int'l Joint Research
  • [Presentation] Defect Generation in Si substrates during Plasma Processing2017

    • Author(s)
      K. Eriguchi
    • Organizer
      17th International Workshop on Junction Technology 2017
    • Related Report
      2017 Research-status Report
    • Int'l Joint Research / Invited
  • [Presentation] Model prediction of stochastic effects of plasma-induced damage in advanced electronic devices2017

    • Author(s)
      K. Eriguchi
    • Organizer
      6th International Conference on Semiconductor Technology for Ultra Large Scale Integrated Circuits and Thin Film Transistors
    • Related Report
      2017 Research-status Report
    • Int'l Joint Research / Invited
  • [Presentation] 誘電泳動力の時間空間制御によるマイクロ流路内流れでの粒子整列技術2017

    • Author(s)
      巽和也,川野光輝,榎坂武彦,栗山怜子,中部主敬
    • Organizer
      第64回理論応用力学講演会
    • Related Report
      2017 Research-status Report
  • [Presentation] Characterization technique of silicon nitride film damaged by plasma exposure”2017

    • Author(s)
      T. Kuyama and K. Eriguchi
    • Organizer
      39th International Symposium on Dry Process: DPS2017
    • Related Report
      2017 Research-status Report
    • Int'l Joint Research
  • [Presentation] Prediction of electronic structure change induced by plasma processing: A first-principles study2017

    • Author(s)
      Y. Yoshikawa and K. Eriguchi
    • Organizer
      39th International Symposium on Dry Process: DPS2017
    • Related Report
      2017 Research-status Report
    • Int'l Joint Research
  • [Presentation] 誘電泳動力によるマイクロ流路内流れにおける粒子の間隔と同期制御2017

    • Author(s)
      野間淳志,榎坂武彦,巽和也,栗山怜子,中部主敬
    • Organizer
      第30回バイオエンジニアリング講演会
    • Related Report
      2017 Research-status Report
  • [Presentation] True Random Number Generator using Current Difference based on a Fractional Stochastic Model in 40-nm Embedded ReRAM2016

    • Author(s)
      Z. Wei, Y. Katoh, S.Ogasahara, Y. Yoshimoto, K. Kawai, Y. Ikeda, K. Eriguchi, K.Ohmori,S. Yoneda
    • Organizer
      IEEE International Electron Device Meeting (IEDM) 2016
    • Place of Presentation
      San Francisco, CA, USA
    • Year and Date
      2016-12-03
    • Related Report
      2016 Research-status Report
    • Int'l Joint Research
  • [Presentation] A new damage evaluation scheme predicting the nature of defects-an advanced capacitance-voltage technique2016

    • Author(s)
      Yukimasa Okada, Kouichi Ono, Koji Eriguchi
    • Organizer
      38th International Symposium on Dry Process
    • Place of Presentation
      Sapporo, Hokkaido, Japan
    • Year and Date
      2016-11-21
    • Related Report
      2016 Research-status Report
    • Int'l Joint Research
  • [Presentation] An optical model for in-line analysis of plasma-induced interlayer dielectric damage2016

    • Author(s)
      Kentaro Nishida, Kouichi Ono, Koji Eriguchi
    • Organizer
      38th International Symposium on Dry Process
    • Place of Presentation
      Sapporo, Hokkaido, Japan
    • Year and Date
      2016-11-21
    • Related Report
      2016 Research-status Report
    • Int'l Joint Research
  • [Presentation] Effects of plasma exposure on leakage and reliability parameters of dielectric film: New measures of damage?2016

    • Author(s)
      Kengo Shinohara, Kentaro Nishida, Kouichi Ono, Koji Eriguchi
    • Organizer
      38th International Symposium on Dry Process
    • Place of Presentation
      Sapporo, Hokkaido, Japan
    • Year and Date
      2016-11-21
    • Related Report
      2016 Research-status Report
    • Int'l Joint Research
  • [Presentation] Defect profiling of plasma-damaged layer by surface-controlled photoreflectance spectroscopy2016

    • Author(s)
      Tomoya Higuchi, Yukimasa Okada, Kouichi Ono, Koji Eriguchi
    • Organizer
      38th International Symposium on Dry Process
    • Place of Presentation
      Sapporo, Hokkaido, Japan
    • Year and Date
      2016-11-21
    • Related Report
      2016 Research-status Report
    • Int'l Joint Research
  • [Presentation] Micro-scale Temperature Measurement Method Using Fluorescence Polarization2016

    • Author(s)
      K. Tatsumi, C-H. Hsu, A. Suzuki, K. Nakabe
    • Organizer
      Proc. 7th European Thermal-Science Conference (EUROTHERM2016)
    • Place of Presentation
      Krakow, Poland
    • Year and Date
      2016-06-19
    • Related Report
      2016 Research-status Report
    • Int'l Joint Research
  • [Remarks] 京都大学 航空宇宙工学専攻 推進工学分野 (江利口研)

    • URL

      http://www.propulsion.kuaero.kyoto-u.ac.jp/

    • Related Report
      2018 Annual Research Report 2017 Research-status Report
  • [Remarks] 京都大学大学院 工学研究科 航空宇宙工学専攻 航空宇宙基礎工学講座 推進工学分野

    • URL

      http://www.propulsion.kuaero.kyoto-u.ac.jp/Publications/International_conferences

    • Related Report
      2016 Research-status Report

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Published: 2016-04-21   Modified: 2020-03-30  

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