| Project/Area Number |
16K17519
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| Research Category |
Grant-in-Aid for Young Scientists (B)
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| Allocation Type | Multi-year Fund |
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| Research Field |
Thin film/Surface and interfacial physical properties
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| Research Institution | Kyoto University |
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Principal Investigator |
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| Project Period (FY) |
2016-04-01 – 2018-03-31
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| Project Status |
Completed (Fiscal Year 2017)
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| Budget Amount *help |
¥4,290,000 (Direct Cost: ¥3,300,000、Indirect Cost: ¥990,000)
Fiscal Year 2017: ¥1,950,000 (Direct Cost: ¥1,500,000、Indirect Cost: ¥450,000)
Fiscal Year 2016: ¥2,340,000 (Direct Cost: ¥1,800,000、Indirect Cost: ¥540,000)
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| Keywords | グラフェン / 原子層薄膜 / 光照射 / グラフェン誘導体 / 真空紫外光 / シリコン / 光還元 / 窒素 / 表面・界面物性 |
|---|
| Outline of Final Research Achievements |
Photoreduction of graphene oxide (GO) has been known to be attractive for synthesizing the graphene-derivatives with high-throughput. We have reported the vacuum ultraviolet light irradiation processes for synthesizing the reduced graphene oxide (rGO) under high vacuum. In this study, we tried to synthesize the heteroatom-doped rGO through the chemical reaction between precursor and GO, followed by the VUV light irradiation. The VUV irradiation to nitrogen doped GO sheets results in the pyridinic N formation, and in the decrease of the sheet thickness. These results indicates that the wavelength can control the photochemical modification of GO.
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