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Femtosecond Pulse Radiolysis Study on Nanoscale Time Space Reaction Process

Research Project

Project/Area Number 17106014
Research Category

Grant-in-Aid for Scientific Research (S)

Allocation TypeSingle-year Grants
Research Field Nuclear engineering
Research InstitutionOsaka University

Principal Investigator

TAGAWA Seiichi  Osaka University, 産業科学研究所, 教授 (80011203)

Co-Investigator(Kenkyū-buntansha) KOZAWA Takahiro  大阪大学, 産業科学研究所, 准教授 (20251374)
SEKI Shuhei  大阪大学, 工学研究科, 准教授 (30273709)
SAEKI Akinori  大阪大学, 産業科学研究所, 助教 (10362625)
OKAMOTO Kazumasa  大阪大学, 産業科学研究所, 特任助教 (10437353)
YAMAMOTO Hiroki  大阪大学, 産業科学研究所, 特任助教 (00516958)
Project Period (FY) 2005 – 2008
Project Status Completed (Fiscal Year 2008)
Budget Amount *help
¥109,330,000 (Direct Cost: ¥84,100,000、Indirect Cost: ¥25,230,000)
Fiscal Year 2008: ¥27,170,000 (Direct Cost: ¥20,900,000、Indirect Cost: ¥6,270,000)
Fiscal Year 2007: ¥25,480,000 (Direct Cost: ¥19,600,000、Indirect Cost: ¥5,880,000)
Fiscal Year 2006: ¥25,610,000 (Direct Cost: ¥19,700,000、Indirect Cost: ¥5,910,000)
Fiscal Year 2005: ¥31,070,000 (Direct Cost: ¥23,900,000、Indirect Cost: ¥7,170,000)
Keywordsフェムト秒パルスラジオリシス / ナノ時空間反応 / 量子ビーム / ナノテクノロジー / フェムト秒パルスジオリシス / シミュレーション / 化学増幅レジスト / 高分子科学 / 熱化過程 / ナノ空間
Research Abstract

本研究は量子ビームがナノ空間に誘起する化学反応を、エネルギー付与過程から中間活性種の初期空間分布と空間分布の時間変化を含め解明することにより、将来、ナノ空間に誘起される現象を、次世代リソグラフィやナノリソグラフィにおいて使いこなすための基礎過程を確立することを目的とした研究である

Report

(6 results)
  • 2008 Annual Research Report   Final Research Report ( PDF )
  • 2007 Annual Research Report
  • 2006 Annual Research Report
  • 2005 Annual Research Report
  • Products Report
  • Research Products

    (91 results)

All 2009 2008 2007 2006 2005

All Journal Article (58 results) (of which Peer Reviewed: 46 results) Presentation (33 results)

  • [Journal Article] Formation of Intramolecular Poly(4-hydroxystyrene) Dimer Radical Cation2008

    • Author(s)
      K. Okamoto, T. Kozawa, K. Natsuda, S. Seki, and S. Tagawa
    • Journal Title

      J. Phys. Chem B 112

      Pages: 9275-9280

    • Related Report
      2008 Final Research Report
    • Peer Reviewed
  • [Journal Article] Difference between Acid Generation Mechanisms in Poly(hydroxystyrene)- and Polyacrylate-Based Chemically Amplified Resists upon Exposure to Extreme Ultraviolet Radiation2008

    • Author(s)
      R. Hirose, T. Kozawa, S. Tagawa, D. Shimizu, T. Kai, T. Shimokawa
    • Journal Title

      Jpn. J. Appl. Phys. 47

      Pages: 7125-7127

    • NAID

      40016294928

    • Related Report
      2008 Annual Research Report
    • Peer Reviewed
  • [Journal Article] X-ray reflectivity study on depth profile of acid generator distribution in chemically amplified resists2008

    • Author(s)
      T. Fukuyama, T. Kozawa, S. Tagawa, R. Takasu, H. Yukawa, M. Sato, J. Onodera, I. Hirosawa, T. Koganesawa, K. Horie
    • Journal Title

      Appl. Phys. Express 1

      Pages: 65004-65004

    • NAID

      10025081173

    • Related Report
      2008 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Enhancement of Acid Production in Chemically Amplified Resist for Extreme Ultraviolet Lithography2008

    • Author(s)
      H. Yamamoto, T. Kozawa, S. Tagawa, H. Yukawa, M. Sato, J. Onodera
    • Journal Title

      Appl. Phys. Express 1

      Pages: 47001-47001

    • NAID

      10025080127

    • Related Report
      2008 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Dependence of Acid Generation Efficiency on Molecular Structures of Acid Generators upon Exposure to Extreme Ultraviolet Radiation2008

    • Author(s)
      R. Hirose, T. Kozawa, S. Tagawa, T. Kai, T. Shimokawa
    • Journal Title

      Appl. Phys. Express

      Volume: 1 Pages: 27004-27004

    • NAID

      10025079296

    • Related Report
      Products Report
    • Peer Reviewed
  • [Journal Article] Difference in Reaction Schemes in Photolysis of Triphenylsulfonium Salts between 248 nm and Dry/Wet 193 nm Resists2008

    • Author(s)
      Y. Matsui, H. Sugawara, S. Seki, T. Kozawa, S. Tagawa, T. Itani
    • Journal Title

      Appl. Phys. Express

      Volume: 1 Pages: 36001-36001

    • NAID

      10025079690

    • Related Report
      Products Report
    • Peer Reviewed
  • [Journal Article] Resolution degradation caused by multispur effect in chemically amplified extreme ultraviolet resists2008

    • Author(s)
      T. Kozawa, S. Tagawa, M. Shell
    • Journal Title

      J. Appl. Phys.

      Volume: 103 Pages: 84306-84306

    • Related Report
      Products Report
    • Peer Reviewed
  • [Journal Article] Feasibility Study of Chemically Amplified Extreme Ultraviolet Resists for 22 nm Fabrication2008

    • Author(s)
      T. Kozawa, S. Tagawa, J. J. Santillan, M. Toriumi, T. Itani
    • Journal Title

      Jpn. J. Appl. Phys.

      Volume: 47 Pages: 4465-4468

    • NAID

      40016110961

    • Related Report
      Products Report
    • Peer Reviewed
  • [Journal Article] Effects of Rate Constant for Deprotection on Latent Image Formation in Chemically Amplified Extreme Ultraviolet Resists2008

    • Author(s)
      T. Kozawa, S. Tagawa, J. J. Santillan, M. Toriumi, T. Itani
    • Journal Title

      Jpn. J. Appl. Phys.

      Volume: 47 Pages: 4926-4931

    • Related Report
      Products Report
    • Peer Reviewed
  • [Journal Article] Study of the Reaction of Acid Generators with Epithermal and Thermalized Electrons2008

    • Author(s)
      K. Natsuda, T. Kozawa, A. Saeki, S. Tagawa, T. Kai, T. Shimokawa
    • Journal Title

      Jpn. J. Appl. Phys.

      Volume: 47 Pages: 4932-4935

    • Related Report
      Products Report
    • Peer Reviewed
  • [Journal Article] Latent image formation in chemically amplified extreme ultraviolet resists with low activation energy for deprotection reaction2008

    • Author(s)
      T. Kozawa, S. Tagawa J. J. Santillan, T. Itani
    • Journal Title

      J. Vac. Sci. Technol. B

      Volume: 26 Pages: 2257-2260

    • Related Report
      Products Report
    • Peer Reviewed
  • [Journal Article] Stroboscopic picosecond pulse radiolysis using near-ultraviolet-enhanced femtosecond continuum generated by CaF22007

    • Author(s)
      A. Saeki, T. Kozawa, K. Okamoto, and S. Tagawa
    • Journal Title

      Jpn. J. Appl. Phys 46

      Pages: 407-411

    • Related Report
      2008 Final Research Report
    • Peer Reviewed
  • [Journal Article] Subpicosecond pulse radiolysis in liquid methyl-substituted benzene derivatives, Radiat2007

    • Author(s)
      K. Okamoto, T. Kozawa, A. Saeki, Y. Yoshida, and S. Tagawa
    • Journal Title

      Phys. Chem 76

      Pages: 818-826

    • Related Report
      2008 Final Research Report
    • Peer Reviewed
  • [Journal Article] Reactivity between Biphenyl and Precursor of Solvated Electrons in Tetrahydrofuran Measured by Picosecond Pulse Radiolysis in Near-ultraviolet, Visible, and Infrared2007

    • Author(s)
      A. Saeki, T. Kozawa, Y. Ohnishi, and S. Tagawa
    • Journal Title

      Reactivity between Biphenyl and Precursor of Solvated Electrons in Tetrahydrofuran Measured by Picosecond Pulse Radiolysis in Near-ultraviolet, Visible, and Infrared A 111

      Pages: 1229-1235

    • Related Report
      2008 Final Research Report
    • Peer Reviewed
  • [Journal Article] Stroboscopic picosecond pulse radiolysis using near-ultraviolet-enhanced femtosecond continuum generated by CaF_22007

    • Author(s)
      A. Saeki, T. Kozawa, K. Okamoto, and S. Tagawa,
    • Journal Title

      Jpn. J. Appl. Phys. 46

      Pages: 407-411

    • NAID

      10018705573

    • Related Report
      2007 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Subpicosecond pulse radiolysis in liquid methyl-substituted benzene derivatives2007

    • Author(s)
      K. Okamoto, T. Kozawa, A. Saeki, Y. Yoshida, and S. Tagawa
    • Journal Title

      Radiat. Phys. Chem. 76

      Pages: 818-826

    • Related Report
      2007 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Reactivity between Biphenyl and Precursor of Solvated Electrons in Tetrahydrofuran Measured by Picosecond Pulse Radiolysis in Near-ultraviolet, Visible, and Infrared2007

    • Author(s)
      A. Saeki, T. Kozawa, Y. Ohnishi, and S. Tagawa
    • Journal Title

      J. Phys. Chem. A 111

      Pages: 1229-1235

    • Related Report
      2007 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Single-Component Chemically Amplified Resist Based on Dehalogenation of Polymer2007

    • Author(s)
      H. Yamamoto, T. Kozawa, S. Tagawa, K. Ohmori, M. Sato, and H. Komano,
    • Journal Title

      Jpn. J. Appl. Phys. 46

    • NAID

      40015511976

    • Related Report
      2007 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Sensitization Distance and Acid Generation Efficiency in a Model System of Chemically Amplified Electron Beam Resist with Methacrylate Backbone Polymer2007

    • Author(s)
      T. Kozawa, S. Tagawa, T. Kai, and T. Shimokawa
    • Journal Title

      J. Photopolym. Sci. Technol. 20

      Pages: 577-583

    • NAID

      130004464589

    • Related Report
      2007 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Effect of Acid Diffusion and Polymer Structure on Line Edge Roughness2007

    • Author(s)
      H. Yamamoto, T. Kozawa, A. Saeki, K. Okamoto, S. Tagawa, K. Ohmori, M. Sato, and H. Komano,
    • Journal Title

      Jpn. J. Appl. Phys. 46

      Pages: 6187-6190

    • Related Report
      2007 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Dependence of Absorption Coefficient and Acid Generation Efficiency on Acid Generator Concentration in Chemically Amplified Resist for Extreme Ultraviolet Lithography2007

    • Author(s)
      R. Hirose, T. Kozawa, S. Tagawa, T. Kai, T. Shimokawa
    • Journal Title

      Jpn. J. Appl. Phys.

      Volume: 46

    • NAID

      40015671035

    • Related Report
      Products Report
    • Peer Reviewed
  • [Journal Article] Study of Acid-Base Equilibrium in Chemically Amplified Resist2007

    • Author(s)
      K. Natsuda, T. Kozawa, K. Okamoto, S. Tagawa
    • Journal Title

      Jpn. J. Appl. Phys.

      Volume: 46 Pages: 7285-7289

    • NAID

      40015705098

    • Related Report
      Products Report
    • Peer Reviewed
  • [Journal Article] Theoretical Study on Relationship between Acid Generation Efficiency and Acid Generator Concentration in Chemically Amplified Extreme Ultraviolet Resists2007

    • Author(s)
      T. Kozawa, S. Tagawa, M. Shell
    • Journal Title

      Jpn. J. Appl. Phys.

      Volume: 46

    • NAID

      210000063809

    • Related Report
      Products Report
    • Peer Reviewed
  • [Journal Article] Point Spread Function for the Calculation of Acid Distribution in Chemically Amplified Resists Used for Electron-Beam Lithography2007

    • Author(s)
      T. Kozawa, S. Tagawa
    • Journal Title

      Jpn. J. Appl. Phys.

      Volume: 46

    • NAID

      210000063830

    • Related Report
      Products Report
    • Peer Reviewed
  • [Journal Article] Image contrast slope and line edge roughness of chemically amplified resists for postoptical lithography2007

    • Author(s)
      T. Kozawa, S. Tagawa, J. J. Santillan, M. Toriumi, T. Itani
    • Journal Title

      J. Vac. Sci. Technol. B

      Volume: 25 Pages: 2295-2300

    • Related Report
      Products Report
    • Peer Reviewed
  • [Journal Article] Acid distribution in chemically amplified extreme ultraviolet resist2007

    • Author(s)
      T. Kozawa, S. Tagawa, H. B. Cao, H. Deng, M. J. Leeson
    • Journal Title

      J. Vac. Sci. Technol. B

      Volume: 25 Pages: 2481-2485

    • Related Report
      Products Report
    • Peer Reviewed
  • [Journal Article] Polymer structure dependence of acid generation in chemically amplified extreme ultraviolet resists2007

    • Author(s)
      H. Yamamoto, T. Kozawa, S. Tagawa, H. B. Cao, H. Deng, M. J. Leeson
    • Journal Title

      Jpn. J. Appl. Phys.

      Volume: 46

    • NAID

      10018868104

    • Related Report
      Products Report
    • Peer Reviewed
  • [Journal Article] Protonation sites in chemically amplified resists for electron beam lithography Jpn2006

    • Author(s)
      K. Natsuda, T. Kozawa, K. Okamoto and S. Tagawa
    • Journal Title

      J. Appl. Phys 45

    • Related Report
      2008 Final Research Report
    • Peer Reviewed
  • [Journal Article] Resolution blur of latent acid image and acid generation efficiency of chemically amplified resists for electron beam lithography2006

    • Author(s)
      T. Kozawa and S. Tagawa
    • Journal Title

      J. Appl. Phys 99

      Pages: 54509-54509

    • Related Report
      2008 Final Research Report
    • Peer Reviewed
  • [Journal Article] Picosecond pulse radiolysis using femtosecond white light with a high S/N spectrum acquisition system in one beam shot, Nucl2006

    • Author(s)
      A. Saeki, T. Kozawa, and S. Tagawa
    • Journal Title

      Instrum. Meth A 556

      Pages: 391-396

    • Related Report
      2008 Final Research Report
    • Peer Reviewed
  • [Journal Article] Resolution blur of latent acid image and acid generation efficiency of chemically amplified resists for electron beam lithography2006

    • Author(s)
      T.Kozawa, S.Tagawa
    • Journal Title

      J. Appl. Phys. 99

      Pages: 54509-54509

    • Related Report
      2006 Annual Research Report
  • [Journal Article] Picosecond pulse radiolysis using femtosecond white light with a high S/N spectrum acquisition system in one beam shot2006

    • Author(s)
      A.Saeki, T.Kozawa, S.Tagawa
    • Journal Title

      Nucl. Instrum. Meth. A 556

      Pages: 391-396

    • Related Report
      2006 Annual Research Report
  • [Journal Article] Protonation sites in chemically amplified resists for electron beam lithography2006

    • Author(s)
      K.Natsuda, T.Kozawa, K.Okamoto, S.Tagawa
    • Journal Title

      Jpn. J. Appl. Phys. 45

    • NAID

      10018460952

    • Related Report
      2006 Annual Research Report
  • [Journal Article] Effects of Low Energy Electrons on Pattern Formation in Chemically Amplified Resist2006

    • Author(s)
      T.Kozawa, H.Yamamoto, A.Saeki, S.Tagawa
    • Journal Title

      J. Photopolym. Sci. Technol. 19

      Pages: 361-366

    • NAID

      130004833103

    • Related Report
      2006 Annual Research Report
  • [Journal Article] Pulse radiolysis of polystyrene in cyclohexane -Effect of carbon tetrachloride on kinetic dynamics of dimer radical cation-2006

    • Author(s)
      K.Okamoto, T.Kozawa, M.Miki, Y.Yoshida, S.Tagawa
    • Journal Title

      Chem. Phys. Lett. 426

      Pages: 306-310

    • Related Report
      2006 Annual Research Report
  • [Journal Article] Dependence of Acid Yield on Chemically Amplified Electron Beam Resist Thickness2006

    • Author(s)
      T.Shigaki, K.Okamoto, T.Kozawa, H.Yamamoto, S.Tagawa
    • Journal Title

      Jpn. J. Appl. Phys. 45

      Pages: 5445-5449

    • NAID

      10017998648

    • Related Report
      2006 Annual Research Report
  • [Journal Article] Analysis of Acid Yield Generated in Chemically Amplified Electron Beam Resist2006

    • Author(s)
      T. Kozawa, T. Shigaki, K. Okamoto, A. Saeki, S. Tagawa, T. Kai, T. Shimokawa
    • Journal Title

      J. Vac. Sci. Technol. B

      Volume: 24 Pages: 3055-3060

    • Related Report
      Products Report
    • Peer Reviewed
  • [Journal Article] Acid generation efficiency in a model system of chemically amplified extreme ultraviolet resist2006

    • Author(s)
      T. Kozawa, S. Tagawa, H. Oizumi, I. Nishiyama
    • Journal Title

      J. Vac. Sci. Technol. B

      Volume: 24

    • Related Report
      Products Report
    • Peer Reviewed
  • [Journal Article] Correlation between proton dynamics and line edge roughness in chemically amplified resist for post-optical lithography2006

    • Author(s)
      A. Saeki, T. Kozawa, S. Tagawa, H. B. Cao
    • Journal Title

      J. Vac. Sci. Technol. B

      Volume: 24 Pages: 3066-3072

    • Related Report
      Products Report
    • Peer Reviewed
  • [Journal Article] Acid Generation Mechanism of Poly (4-hydroxystyrene) -Based Chemically Amplified Resists for Post-Optical Lithography : Acid Yield and Deprotonation Behavior of Poly (4-hydroxystyrene) and Poly (4-methoxystyrene)2006

    • Author(s)
      A. Nakano, T. Kozawa, K. Okamoto, S. Tagawa, T. Kai, T. Shimokawa
    • Journal Title

      Jpn. J. Appl. Phys.

      Volume: 45 Pages: 6866-6871

    • NAID

      10018245439

    • Related Report
      Products Report
    • Peer Reviewed
  • [Journal Article] Relationship between Acid Generator Concentration and Acid Yield in Chemically Amplified Electron Beam Resist2006

    • Author(s)
      T. Shigaki, K. Okamoto, T. Kozawa, H. Yamamoto, S. Tagawa, T. Kai, T. Shimokawa
    • Journal Title

      Jpn. J. Appl. Phys.

      Volume: 45 Pages: 5735-5737

    • NAID

      10017999650

    • Related Report
      Products Report
    • Peer Reviewed
  • [Journal Article] Reaction mechanism of fluorinated chemically amplified resists2006

    • Author(s)
      H. Yamamoto, T. Kozawa, K. Okamoto, A. Saeki, S. Tagawa, T. Ando, M. Sato, H. Komano
    • Journal Title

      J. Vac. Sci. Technol. B

      Volume: 24 Pages: 1833-1836

    • Related Report
      Products Report
    • Peer Reviewed
  • [Journal Article] Pulse radiolysis based on a femtosecond electron beam and a femtosecond laser light with double-pulse injection technique2006

    • Author(s)
      J. Yang, T. Kondoh, T. Kozawa, Y. Yoshida, S. Tagawa
    • Journal Title

      Radiat. Phys. Chem.

      Volume: 75 Pages: 1034-1040

    • Related Report
      Products Report
    • Peer Reviewed
  • [Journal Article] Line edge roughness of a latent image in post-optical lithography2006

    • Author(s)
      A. Saeki, T. Kozawa, S. Tagawa, H. B. Cao
    • Journal Title

      Nanotechnology

      Volume: 17 Pages: 1543-1546

    • Related Report
      Products Report
    • Peer Reviewed
  • [Journal Article] Reactivity of Acid Generators for Chemically Amplified Resists with Low-Energy Electrons2006

    • Author(s)
      A. Nakano, T. Kozawa, S. Tagawa, T. Szreder, J. F. Wishart, T. Kai, T. Shimokawa
    • Journal Title

      Jpn. J. Appl. Phys.

      Volume: 45

    • NAID

      10018159212

    • Related Report
      Products Report
    • Peer Reviewed
  • [Journal Article] Femtosecond single electron bunch generation by rotating longitudinal bunch phase space in magnetic field2006

    • Author(s)
      J. Yang, T. Kondoh, K. Kan, T. Kozawa, Y. Yoshida, S. Tagawa
    • Journal Title

      Nucl. Instrum. Meth. A

      Volume: 556 Pages: 52-56

    • Related Report
      Products Report
    • Peer Reviewed
  • [Journal Article] Proton and anion distribution and line edge roughness of chemically amplified electron beam resist2005

    • Author(s)
      T. Kozawa, H. Yamamoto, A. Saeki, and S. Tagawa
    • Journal Title

      J. Vac. Sci. Technol B23

      Pages: 2716-2720

    • Related Report
      2008 Final Research Report
    • Peer Reviewed
  • [Journal Article] Proton and anion distribution and line edge roughness of chemically amplified electron beam resist2005

    • Author(s)
      T.Kozawa, H., Yamamoto, A.Saeki, S.Tagawa
    • Journal Title

      J.Vac.Sci.Technol. B23

      Pages: 2716-2720

    • Related Report
      2005 Annual Research Report
  • [Journal Article] Resist Thickness Effect on Acid Concentration Generated in Poly(4-hydroxystyrene) Film upon Exposure to 75 keV Electron Beam2005

    • Author(s)
      T.Shigaki, K.Okamoto, T.Kozawa, H.Yamamoto, S.Tagawa
    • Journal Title

      Jpn.J.Appl.Phys. 44

    • NAID

      10016856520

    • Related Report
      2005 Annual Research Report
  • [Journal Article] Synchronization of femtosecond UV-IR laser with electron beam for pulse radiolysis studies2005

    • Author(s)
      A.Saeki, T.Kozawa, S.Tagawa et al.
    • Journal Title

      Nucl.Instrum.Meth. A546

      Pages: 627-633

    • Related Report
      2005 Annual Research Report
  • [Journal Article] Effects of Dielectric Constant on Acid Generation in Chemically Amplified Resists for Post-Optical Lithography2005

    • Author(s)
      T.Kozawa, K.Okamoto, A.Saeki, S.Tagawa
    • Journal Title

      Jpn.J.Appl.Phys. 44

      Pages: 3908-3912

    • NAID

      10016441312

    • Related Report
      2005 Annual Research Report
  • [Journal Article] Multi spur effect on decay kinetics of geminate ion recombination using Monte Carlo technique2005

    • Author(s)
      A.Saeki, T.Kozawa, Y.Yoshida, S.Tagawa
    • Journal Title

      Nucl.Instrum.Meth. B234

      Pages: 285-290

    • Related Report
      2005 Annual Research Report
  • [Journal Article] Nanopatterning of polyfluorene derivative using electron-beam lithography2005

    • Author(s)
      Y.Doi, A.Saeki, T.Kozawa, S.Tagawa et al.
    • Journal Title

      J.Vac.Sci.Technol. B23

      Pages: 2051-2055

    • Related Report
      2005 Annual Research Report
  • [Journal Article] Reaction Mechanisms of Brominated Chemically Amplified Resists2005

    • Author(s)
      H. Yamamoto, T. Kozawa, A. Nakano, S. Tagawa, T. Ando, M. Sato, H. Komano
    • Journal Title

      Jpn. J. Appl. Phys.

      Volume: 44

    • NAID

      10016590890

    • Related Report
      Products Report
    • Peer Reviewed
  • [Journal Article] Requirements for Laser-Induced Desorption/Ionization on Submicrometer Structures2005

    • Author(s)
      S. Okuno, R. Arakawa, K. Okamoto, Y. Matsui, S. Seki, T. Kozawa, S. Tagawa, Y. Wada
    • Journal Title

      Anal. Chem.

      Volume: 77 Pages: 5364-5369

    • Related Report
      Products Report
    • Peer Reviewed
  • [Journal Article] Study on acid generation from polymer2005

    • Author(s)
      H. Yamamoto, T. Kozawa, A. Nakano, K. Okamoto, S. Tagawa, T. Ando, M. Sato, H. Komano
    • Journal Title

      J. Vac. Sci. Technol. B

      Volume: 23 Pages: 2728-2732

    • Related Report
      Products Report
    • Peer Reviewed
  • [Journal Article] Dependence of Acid Yield on Acid Generator in Chemically Amplified Resist for Post-Optical Lithography2005

    • Author(s)
      A. Nakano, K. Okamoto, Y. Yamamoto, T. Kozawa, S. Tagawa, T. Kai, H. Nemoto
    • Journal Title

      Jpn. J. Appl. Phys.

      Volume: 44 Pages: 5832-5835

    • NAID

      10016678348

    • Related Report
      Products Report
    • Peer Reviewed
  • [Journal Article] Potential Cause of Inhomogeneous Acid Distribution in Chemically Amplified Resists for Post Optical Lithography2005

    • Author(s)
      H. Yamamoto, T. Kozawa, A. Nakano, K. Okamoto, S. Tagawa, T. Ando, M. Sato, H. Komano
    • Journal Title

      Jpn. J. Appl. Phys.

      Volume: 44 Pages: 5836-5838

    • NAID

      10016678367

    • Related Report
      Products Report
    • Peer Reviewed
  • [Presentation] Sensitization mechanisms of chemically amplified resists and resist design for 22 nm node2009

    • Author(s)
      T. Kozawa and S. Tagawa
    • Organizer
      2009 International Workshop on EUV Lithography
    • Place of Presentation
      Oahu, Hawaii, USA
    • Related Report
      2008 Final Research Report
  • [Presentation] Effect of acid generator structure on its depth distribution in chemically amplified resist films2008

    • Author(s)
      T. Fukuyama, T. Kozawa, K. Okamoto, S. Tagawa, M. Irie, T. Mimura, T. Iwai, J. Onodera, I. Hirosawa, T. Koganesawa, K. Horie
    • Organizer
      21st International Microprocesses and Nanotechnology Conference
    • Place of Presentation
      Fukuoka, Japan
    • Year and Date
      2008-10-28
    • Related Report
      2008 Annual Research Report
  • [Presentation] Study on acid generation of acid generators in chemically amplified resists for electron beam2008

    • Author(s)
      K. Natsuda, T. Kozawa, K. Okamoto, and S. Tagawa
    • Organizer
      International Workshop on Molecular Information and Dynamics 2008
    • Place of Presentation
      Taipei, Taiwan
    • Related Report
      2008 Final Research Report
  • [Presentation] Dynamics of Radical Cation of Poly(4-Hydroxystyrene)and its Copolymer2008

    • Author(s)
      K. Okamoto, M. Tanaka, T. Kozawa, S. Tagawa
    • Organizer
      21st International Microprocesses and Nanotechnology Conference
    • Place of Presentation
      Fukuoka, Japan
    • Related Report
      2008 Final Research Report
  • [Presentation] Horie, Effect of acid generator structure on its depth distribution in chemically amplified resist films2008

    • Author(s)
      T. Fukuyama, T. Kozawa, K. Okamoto, S. Tagawa, M. Irie, T. Mimura, T. Iwai, J. Onodera, I. Hirosawa, T. Koganesawa, and K
    • Organizer
      21st International Microprocesses and Nanotechnology Conference
    • Place of Presentation
      Fukuoka, Japan
    • Related Report
      2008 Final Research Report
  • [Presentation] Study on Reactivity of Halogenated Resist Polymer with Low-Energy Electrons2008

    • Author(s)
      H. Yamamoto, T. Kozawa, A. Saeki, S. Tagawa, T. Mimura, H. Yukawa, and J. Onodera
    • Organizer
      21st International Microprocesses and Nanotechnology Conference
    • Place of Presentation
      Fukuoka, Japan
    • Related Report
      2008 Final Research Report
  • [Presentation] Effect of molecular structures of acid generators on acid generation in chemically amplified resists upon exposure to 75 keV electron beam2008

    • Author(s)
      K. Natsuda, T. Kozawa, K. Okamoto, and S. Tagawa
    • Organizer
      21st International Microprocesses and Nanotechnology Conference
    • Place of Presentation
      Fukuoka, Japan
    • Related Report
      2008 Final Research Report
  • [Presentation] Dynamics of Radical Cations of Resist Model Compounds2008

    • Author(s)
      K. Okamoto, M. Tanaka, T. Kozawa, S. Tagawa
    • Organizer
      2nd Asia-Pacific Symposium on Radiation Chemistry
    • Place of Presentation
      Waseda University
    • Related Report
      2008 Final Research Report
  • [Presentation] Dependence of Acid Generation Efficiency on Molecular Structure and Concentration of Acid Generator in Chemically Amplified EUV Resist, SPIE Advanced Lithography2008

    • Author(s)
      R. Hirose, T. Kozawa, S. Tagawa, T. Kai, and T. Shimokawa
    • Organizer
      San Jose
    • Place of Presentation
      California, USA
    • Related Report
      2008 Final Research Report
  • [Presentation] Acid-base equilibrium in chemically amplified resist, SPIE Advanced Lithography2008

    • Author(s)
      K. Natsuda, T. Kozawa, K. Okamoto, and S. Tagawa
    • Organizer
      San Jose
    • Place of Presentation
      California, USA
    • Related Report
      2008 Final Research Report
  • [Presentation] Pico-and subpico-second pulse radiolysis based on L-band linac with femtosecond white light continuum2007

    • Author(s)
      A. Saeki, T. Kozawa, and S. Tagawa (invited)
    • Organizer
      The 7th International Symposium on Advanced Science Research
    • Place of Presentation
      Tokai, Ibaraki, Japan
    • Year and Date
      2007-12-01
    • Related Report
      2007 Annual Research Report
  • [Presentation] Nanoscale Distribution of Intermediates in Resist Materials for Next Generation Lithography2007

    • Author(s)
      T. Kozawa, and S. Tagawa
    • Organizer
      ASR Symposium
    • Place of Presentation
      Ibaraki, Japan
    • Year and Date
      2007-11-06 – 2007-11-09
    • Related Report
      Products Report
  • [Presentation] Dependence of Absorption Coefficient and Acid Generation Efficiency on Acid Generator Concentration in Chemically Amplified EUV Resist2007

    • Author(s)
      R. Hirose, T. Kozawa, S. Tagawa, T. Kai and T. Shimokawa
    • Organizer
      Microprocess and Nanotechnology Conference
    • Place of Presentation
      Kyoto, Japan
    • Year and Date
      2007-11-05 – 2007-11-08
    • Related Report
      Products Report
  • [Presentation] Effect of Fluorine Atom on Acid Generation in Chemically Amplified EUV Resist2007

    • Author(s)
      H. Yamamoto, T. Kozawa, S. Tagawa, H. Yukawa, M. Sato, J. Onodera
    • Organizer
      Microprocess and Nanotechnology Conference
    • Place of Presentation
      Kyoto, Japan
    • Year and Date
      2007-11-05 – 2007-11-08
    • Related Report
      Products Report
  • [Presentation] Study on the Reaction of Acid Generators with Epithermal Electrons2007

    • Author(s)
      K. Natsuda, T. Kozawa, A. Saeki, S. Tagawa, T. Kai, T. Shimokawa
    • Organizer
      Microprocess and Nanotechnology Conference
    • Place of Presentation
      Kyoto, Japan
    • Year and Date
      2007-11-05 – 2007-11-08
    • Related Report
      Products Report
  • [Presentation] Effects of rate constant for deprotection reaction on latent image formation in chemically amplified EUV resists2007

    • Author(s)
      T. Kozawa, S. Tagawa, J. J. Santillan, M. Toriumi, and T. Itani
    • Organizer
      Microprocess and Nanotechnology Conference
    • Place of Presentation
      Kyoto, Japan
    • Year and Date
      2007-11-05 – 2007-11-08
    • Related Report
      Products Report
  • [Presentation] Depth profile of acid generator distribution in chemically amplified resists2007

    • Author(s)
      T. Fukuyama, T. Kozawa, S. Tagawa, R. Takasu, H. Yukawa, M. Sato, J. Onodera, I. Hirosawa, T. Koganesawa, K. Horie
    • Organizer
      Microprocess and Nanotechnology Conference
    • Place of Presentation
      Kyoto, Japan
    • Year and Date
      2007-11-05 – 2007-11-08
    • Related Report
      Products Report
  • [Presentation] Effect of Fluorine Atom on Acid Generation in Chemically Amplified EUV Resist2007

    • Author(s)
      H. Yamamoto, T. Kozawa, S. Tagawa H. Yukawa, M. Sato, H. Komano
    • Organizer
      2007 International EUVL Symposium
    • Place of Presentation
      Sapporo, Japan
    • Year and Date
      2007-10-28 – 2007-10-31
    • Related Report
      Products Report
  • [Presentation] Effects of activation energy for deprotection reaction on latent image contrast2007

    • Author(s)
      T. Kozawa, A. Saeki, S. Tagawa, J. J. Santillan, M. Toriumi, T. Itani
    • Organizer
      2007 International EUVL Symposium
    • Place of Presentation
      Sapporo, Japan
    • Year and Date
      2007-10-28 – 2007-10-31
    • Related Report
      Products Report
  • [Presentation] Pulse radiolysis of polystyrene and derivatives2007

    • Author(s)
      K. Okamoto, M. Tanaka, T. Kozawa, S. Seki, S. Tagawa
    • Organizer
      13th International Congress of Radiation Research
    • Place of Presentation
      San Francisco, California, USA
    • Year and Date
      2007-07-07 – 2007-07-13
    • Related Report
      Products Report
  • [Presentation] High precision measurement of higher diffraction-order contamination in monochromatized soft X-ray by using a compact transmission-grating spectrometer2007

    • Author(s)
      K. Fukui, T. Sakai, T. Hatsui, N. Kosugi, Y. Hamamura, K. Okamoto, Y. Matsui, T. Kozawa, S. Seki, S. Tagawa
    • Organizer
      International Conference on Vacuum Ultraviolet Radiation Physics 15th
    • Place of Presentation
      Berlin, Germany
    • Year and Date
      2007-06-29 – 2007-07-03
    • Related Report
      Products Report
  • [Presentation] Development and performance of quasi-free standing transmission-grating for soft X-ray emission spectrometer2007

    • Author(s)
      T. Hatsui, K. Okamoto, Y. Matsui, T. Kozawa, S. Seki, S. Tagawa, Y. Hamamura, N. Kosugi
    • Organizer
      International Conference on Vacuum Ultraviolet Radiation Physics 15th
    • Place of Presentation
      Berlin, Germany
    • Year and Date
      2007-06-29 – 2007-07-03
    • Related Report
      Products Report
  • [Presentation] Study on dynamics of radical ions of polystyrenes by pulse radiolysis2007

    • Author(s)
      K. Okamoto, M. Tanaka, S. Seki, T. Kozawa, S. Tagawa
    • Organizer
      13th International Congress of Radiation Research
    • Place of Presentation
      San Francisco, California, USA
    • Year and Date
      2007-06-07 – 2007-06-13
    • Related Report
      Products Report
  • [Presentation] Acid distribution in chemically amplified extreme ultraviolet resist2007

    • Author(s)
      T. Kozawa, S. Tagawa, H. B. Cao, H. Deng, M. J. Leeson
    • Organizer
      The fifty-first international conference on electron, ion, and photon beam technology and nanofabrication (51st EIPBN)
    • Place of Presentation
      Denver, Colorado, USA
    • Year and Date
      2007-05-29 – 2007-06-01
    • Related Report
      Products Report
  • [Presentation] Image Contrast Slope and Line Edge Roughness of Chemically Amplified Resists for Post-Optical Lithography2007

    • Author(s)
      T. Kozawa, S. Tagawa, J. J. Santillan, M. Toriumi, T. Itani
    • Organizer
      The fifty-first international conference on electron, ion, and photon beam technology and nanofabrication (51st EIPBN)
    • Place of Presentation
      Denver, Colorado, USA
    • Year and Date
      2007-05-29 – 2007-06-01
    • Related Report
      Products Report
  • [Presentation] Single-Component Chemically Amplified Resist Based on Dehalogenation of Polymer2007

    • Author(s)
      H. Yamamoto, T. Kozawa, S. Tagawa, K. Ohmori, M. Sato, H. Komano
    • Organizer
      SPIE Advanced Microlithography
    • Place of Presentation
      San Jose, California, USA
    • Year and Date
      2007-02-25 – 2007-03-02
    • Related Report
      Products Report
  • [Presentation] Study on photochemical analysis system for EUV lithography2007

    • Author(s)
      A. Sekiguchi, Y. Kono, M. Kadoi, Y. Minami, T. Kozawa, S. Tagawa, D. Gustafson, P. Plackborow
    • Organizer
      SPIE Advanced Microlithography
    • Place of Presentation
      San Jose, California, USA
    • Year and Date
      2007-02-25 – 2007-03-02
    • Related Report
      Products Report
  • [Presentation] Effect of Acid Diffusion and Polymer Structure on Line Edge Roughness2006

    • Author(s)
      H. Yamamoto, T. Kozawa, A. Saeki, K. Okamoto, S. Tagawa, K. Ohmori, M. Sato, H. Komano
    • Organizer
      Int. Microprocesses and Nanotechnology Conf.
    • Place of Presentation
      Kamakura, Japan
    • Year and Date
      2006-10-25 – 2006-10-27
    • Related Report
      Products Report
  • [Presentation] Proton Dynamics and Amines in Chemically Amplified Resist2006

    • Author(s)
      K. Natsuda, T. Kozawa, K. Okamoto, S. Tagawa
    • Organizer
      Int. Microprocesses and Nanotechnology Conf.
    • Place of Presentation
      Kamakura, Japan
    • Year and Date
      2006-10-25 – 2006-10-27
    • Related Report
      Products Report
  • [Presentation] Line edge roughness in chemically amplified resist of electron beam lithography2006

    • Author(s)
      A. Saeki, T. Kozawa, S. Tagawa and H. B. Cao
    • Organizer
      50th EIPBN
    • Place of Presentation
      Baltimore, Maryland, USA
    • Year and Date
      2006-05-30 – 2006-06-02
    • Related Report
      Products Report
  • [Presentation] Analysis of Acid Yield Generated in Chemically Amplified Electron Beam Resist2006

    • Author(s)
      T. Kozawa, T. Shigaki, K. Okamoto, A. Saeki and S. Tagawa
    • Organizer
      50th EIPBN
    • Place of Presentation
      Baltimore, Maryland, USA
    • Year and Date
      2006-05-30 – 2006-06-02
    • Related Report
      Products Report
  • [Presentation] Difference between initial distributions of proton and counter anion in chemically amplified electron-beam resist2006

    • Author(s)
      T. Kozawa, H. Yamamoto, A. Saeki and S. Tagawa
    • Organizer
      31st Int. Symp. Microlithography
    • Place of Presentation
      San Jose, California, USA
    • Year and Date
      2006-02-19 – 2006-02-24
    • Related Report
      Products Report
  • [Presentation] The reaction mechanism of poly[4-hydroxystyrene-co-4-(1, 1, 1, 3, 3, 3-hexafluoro-2- hydroxypropyl)-styrene]2006

    • Author(s)
      H. Yamamoto, T. Kozawa, K. Okamoto, S. Tagawa, T. Ando, M. Sato, H. Komano
    • Organizer
      31st Int. Symp. Microlithography
    • Place of Presentation
      San Jose, California, USA
    • Year and Date
      2006-02-19 – 2006-02-24
    • Related Report
      Products Report

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Published: 2005-04-01   Modified: 2016-09-09  

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