• Search Research Projects
  • Search Researchers
  • How to Use
  1. Back to previous page

Effect of structures of Mg-Si thin films on static and dynamic strength of Mg alloys

Research Project

Project/Area Number 17560063
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeSingle-year Grants
Section一般
Research Field Materials/Mechanics of materials
Research InstitutionOsaka University (2006)
The University of Tokyo (2005)

Principal Investigator

KONDOH Katsuyoshi  Osaka University, Joining and Welding Research Institute, Professor, 接合科学研究所, 教授 (50345138)

Co-Investigator(Kenkyū-buntansha) KAWABATA Kenshi  Osaka University, Joining and Welding Research Institute, Specially Appointed Instructor, 接合科学研究所, 特任助手(常勤) (50432422)
芹川 正  東京大学, 先端科学技術研究センター, 科学技術振興特任教員(特任研究員) (10345168)
住田 雅樹  東京大学, 先端科学技術研究センター, 科学技術振興特任教員(特任助手) (50376662)
Project Period (FY) 2005 – 2006
Project Status Completed (Fiscal Year 2006)
Budget Amount *help
¥3,500,000 (Direct Cost: ¥3,500,000)
Fiscal Year 2006: ¥900,000 (Direct Cost: ¥900,000)
Fiscal Year 2005: ¥2,600,000 (Direct Cost: ¥2,600,000)
KeywordsMg-Si sputtered thin film / tensile strength / amorphous / hydrogen gas / thermal damage / マグネシウム合金 / マグネシウムシリサイド / 薄膜 / スパッタ法 / 界面 / ヤング率 / ヘルツ応力 / 粒成長
Research Abstract

RF sputtering process to prepare Mg-Si thin films on the surface of magnesium alloys has been established because Mg2Si intermetallic compounds reveal superior corrosion resistance to the conventional stainless steels. In particular, the effect of crystal structure of the films on the static and dynamic mechanical properties of Mg-Si coated magnesium alloys was evaluated. Two kind of sputtering targets were employed; elementally Mg-Si composed target and Mg2Si sintered one. The former easily accelerate to produce amorphous structure films under the conventional sputtering conditions. In employing AZ31 alloy and AZ91 alloy disks as the base material of elementally composed targets, AZ91 alloy, including much amount of aluminum element, assists the formation of amorphous sputtered films. There is no remarkable difference of tensile strength when using amorphous and crystal structured Mg-Si films, and no microstructure change, in particular grain growth, at the interface of the magnesium base alloy and the film. Pin-on-disk type wear test results show the stable friction coefficient in using amorphous structure film because of higher hardness of the film than that of the crystal one. They also indicated high enough bonding strength between the film and magnesium matrix.

Report

(3 results)
  • 2006 Annual Research Report   Final Research Report Summary
  • 2005 Annual Research Report
  • Research Products

    (6 results)

All 2006

All Journal Article (6 results)

  • [Journal Article] Depositions and Microstructure of Mg-Si Thin Film by Ion Beam Sputtering2006

    • Author(s)
      近藤勝義
    • Journal Title

      Surface and Coatings Technology 200

      Pages: 4233-4239

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2006 Annual Research Report 2006 Final Research Report Summary
  • [Journal Article] スパッタMg-Si膜形成におよぼす基板電圧印加効果2006

    • Author(s)
      川端健詞
    • Journal Title

      応用物理学関係連合講演会講演概要集(第2分冊)

      Pages: 677-677

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2006 Annual Research Report 2006 Final Research Report Summary
  • [Journal Article] 複合ターゲットを用いたスパッタ法によるMg-Si膜の堆積機構2006

    • Author(s)
      近藤勝義
    • Journal Title

      応用物理学関係連合講演会講演概要集(第2分冊)

      Pages: 677-677

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2006 Annual Research Report 2006 Final Research Report Summary
  • [Journal Article] Depositions and Microstructure of Mg-Si Thin Film by Ion Beam Sputtering.2006

    • Author(s)
      Katsuyoshi KONDOH
    • Journal Title

      Surface and Coatings Technology 200

      Pages: 4233-4239

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2006 Final Research Report Summary
  • [Journal Article] Effect of substrate voltage on formation of Mg-Si sputtered film2006

    • Author(s)
      Kenshi KAWABATA
    • Journal Title

      Proceefding of the JSPS Annual Meeting 2

      Pages: 677-677

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2006 Final Research Report Summary
  • [Journal Article] Deposition mechanism of Mg-Si sputtered film in using elementally composed Mg/Si target2006

    • Author(s)
      Katsuyoshi KONDOH
    • Journal Title

      Proceefding of the JSPS Annual Meeting 2

      Pages: 677-677

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2006 Final Research Report Summary

URL: 

Published: 2005-04-01   Modified: 2016-04-21  

Information User Guide FAQ News Terms of Use Attribution of KAKENHI

Powered by NII kakenhi