Development of an electrochemical advanced oxidation process using cuprous ion/hypohalogenous acid (Cu+/HOX) reaction system

• Project/Area Number: 17K00603
• Research Category: Grant-in-Aid for Scientific Research (C)
• Allocation Type: Multi-year Fund
• Section: 一般
• Research Field: Environmental engineering and reduction of environmental burden
• Research Institution: Ryukoku University
• Principal Investigator: Kishimoto Naoyuki 龍谷大学, 理工学部, 教授 (00293895)
• Project Period (FY): 2017-04-01 – 2020-03-31
• Project Status: Completed (Fiscal Year 2019)
• Budget Amount: ¥4,810,000 (Direct Cost: ¥3,700,000、Indirect Cost: ¥1,110,000); Fiscal Year 2019: ¥1,170,000 (Direct Cost: ¥900,000、Indirect Cost: ¥270,000); Fiscal Year 2018: ¥1,300,000 (Direct Cost: ¥1,000,000、Indirect Cost: ¥300,000); Fiscal Year 2017: ¥2,340,000 (Direct Cost: ¥1,800,000、Indirect Cost: ¥540,000)
• Keywords: 促進酸化処理 / Fenton型反応 / 水酸基ラジカル / 電解処理 / 遊離塩素 / 電解促進酸化 / 電解フェントン型反応 / 銅 / 次亜塩素酸 / 排水処理

Outline of Final Research Achievements

An electrochemical Fenton-type process using Cu(I)/HOCl system was proposed as an advanced oxidation process in this research.
It was demonstrated that the reaction of Cu(I) with HOCl can generate hydroxyl radical through the similar manner to Fenton reaction. Then, an electrochemical Fenton-type process with a cathodic onsite generation of Cu(I) and an anodic onsite generation of HOCl was established using an electrolytic tank and an electrochemical flow cell. An introduction of intermittent electrolysis to the process could utilize metallic copper deposited on the cathode for the source of Cu(I).

Academic Significance and Societal Importance of the Research Achievements

本研究は，親水性難分解性有害物質の処理に有効な新規促進酸化処理法として，Cu(I)/HOCl反応系を用いる電解Fenton型処理法を提案するものである。本研究において，従来知られていなかったCu(I)/HOCl Fenton型反応による水酸基ラジカル生成が起こることが実証された点は特に学術的に意義深いものである。一方，HOClなどの危険薬剤を外部投入することなく促進酸化処理が可能な手法を提示したこと，および銅のリサイクルも含めたプロセスの持続可能性を示したことは本プロセスの実用に向けた重要な知見であるといえる。

Research Products

• [Journal Article] Efficacy of an electrochemical flow cell introduced into the electrochemical Fenton-type process using a Cu(I)/HOCl system (2019)
  • Author(s): Kishimoto Naoyuki、Ito Saki、Kato Masaaki、Otsu Hideo
  • Journal Title: Water Science and Technology Volume: 80 Issue: 1 Pages: 184-190
  • DOI: 10.2166/wst.2019.267
  • Peer Reviewed
• [Journal Article] Technical Feasibility of Electrochemical Fenton-Type Process Using Cu(I)/HOCl System (2018)
  • Author(s): Saki ITO, Takehiro UKAWA, Naoyuki KISHIMOTO, Masaaki KATO, Hideo OTSU
  • Journal Title: Journal of Water and Environment Technology Volume: 16 Issue: 2 Pages: 73-82
  • DOI: 10.2965/jwet.17-023
  • NAID: 130006685615
  • ISSN: 1348-2165
  • Peer Reviewed / Open Access
• [Presentation] Cu(I)/HOCl反応系を用いた電解Fenton型プロセスにおける初期銅濃度の影響 (2019)
  • Author(s): 伊藤早紀，岸本直之，加藤昌明，大津秀緒
  • Organizer: 第53回日本水環境学会年会
• [Presentation] 電解フローセルを用いたCu+/HOCl反応系電解Fenton型プロセスの開発 (2018)
  • Author(s): 伊藤早紀，岸本直之
  • Organizer: 第52回日本水環境学会年会
• [Presentation] Technical feasibility of electrochemical Fenton-type process using Cu(I)/HOCl system (2017)
  • Author(s): Saki ITO, Takehiro UKAWA, Naoyuki KISHIMOTO, Masaaki KATO and Hideo OTSU
  • Organizer: Water and Environment Technology Conference 2018
  • Int'l Joint Research