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Development of Simulator for High Efficient Chemical Mechanical Polishing of Hard-to-Process Materials by Computational Method

Research Project

Project/Area Number 17K06110
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeMulti-year Fund
Section一般
Research Field Design engineering/Machine functional elements/Tribology
Research InstitutionTohoku University

Principal Investigator

Ozawa Nobuki  東北大学, 金属材料研究所, 助教 (60437366)

Project Period (FY) 2017-04-01 – 2020-03-31
Project Status Completed (Fiscal Year 2019)
Budget Amount *help
¥4,160,000 (Direct Cost: ¥3,200,000、Indirect Cost: ¥960,000)
Fiscal Year 2019: ¥780,000 (Direct Cost: ¥600,000、Indirect Cost: ¥180,000)
Fiscal Year 2018: ¥1,560,000 (Direct Cost: ¥1,200,000、Indirect Cost: ¥360,000)
Fiscal Year 2017: ¥1,820,000 (Direct Cost: ¥1,400,000、Indirect Cost: ¥420,000)
Keywords分子動力学法 / 化学機械研磨 / 難加工材料 / ナノバブル / マルチフィジックス現象 / シミュレーション / 反応力場 / 計算科学 / 第一原理計算 / メカノケミカル反応 / 量子化学
Outline of Final Research Achievements

A nano-bubble is recently utilezed for highly efficient chemical mechanical polishing (CMP) of hard-to-process materials such as SiC and AlN substrates. Collapse of nano bubble by shock wave in solvent generates a jet flow at a nano scale, which oxidizes the substrtes to be easily polished during CMP. In this study, the oxidation dynamics of the Si(001) and AlN(0001) substrates induced by nano bubble collapse was investigated by reactive molecuar dynamics simulstion, which is possible to deal chemical reactions. It is revealed that the impact of the jet flows enhances the oxidation of the substrates by water molecules. Moreover, it is suggested that there is the proper value of size and the number of a nano bubble, which satisfies amount of the oxidation and homogeneity of the oxide layer for a highly planarized substrate after polishing.

Academic Significance and Societal Importance of the Research Achievements

パワー半導体素子材料の成長基板に用いられるAlN及びSiC基板は高硬度と高い化学安定性を有する難加工材料であり、少ない欠陥且つ高効率に研磨する手法の開発が強く求められている。研磨には化学機械研磨という手法が用いられており、スラリーにナノバブルを導入することで、研磨速度及び平坦度が向上することが実験的に報告されている。そこで、さらなる化学機械研磨の高効率化には、ナノバブルが研磨速度を向上させるメカニズムを解明する必要がある。本研究では、さらなる難加工材料の加工速度と高品質化に貢献するため、化学反応を取り扱い可能な反応分子動力学法に基づき、ナノバブルが研磨速度を向上させるメカニズムを検討した。

Report

(4 results)
  • 2019 Annual Research Report   Final Research Report ( PDF )
  • 2018 Research-status Report
  • 2017 Research-status Report
  • Research Products

    (16 results)

All 2019 2018 2017

All Presentation (16 results) (of which Int'l Joint Research: 8 results,  Invited: 1 results)

  • [Presentation] 複数のナノバブルを用いたAlN基板の 化学機械研磨における大規模分子動力学 シミュレーション2019

    • Author(s)
      木村颯太, 王楊, 宮崎成正, 大谷優介, 尾澤伸樹, 久保百司
    • Organizer
      精密工学会2019年度秋季大会
    • Related Report
      2019 Annual Research Report
  • [Presentation] Nanobubble Collapse Simulation for Efficient Chemical Mechanical Polishing of Aluminum Nitride by Molecular2019

    • Author(s)
      Sota Kimura, Narumasa Miyazaki, Yusuke Ootani, Nobuki Ozawa, Momoji Kubo
    • Organizer
      Tribochemistry
    • Related Report
      2019 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Chemical Mechanical Polishing Process with Nanobubbles of Nitride Semiconductor Substrate: Molecular2019

    • Author(s)
      Sota Kimura, Narumasa Miyazaki, Yusuke Ootani, Nobuki Ozawa, Momoji Kubo
    • Organizer
      ITC2019
    • Related Report
      2019 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Large-scale Molecular Dynamics Simulations on Chemical Mechanical Polishing Process of AlN Substrate with Nanobubbles2019

    • Author(s)
      Sota Kimura, Wang Yang, Narumasa Miyazaki, Yusuke Ootani, Nobuki Ozawa, Momoji Kubo
    • Organizer
      WINDS2019
    • Related Report
      2019 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Molecular Dynamics Simulations on Chemical Mechanical Polishing Process of Nitride Substrate with Nanobubble2019

    • Author(s)
      Souta Kimura, Narumasa Miyazaki, Yusuke Ootani, Nobuki Ozawa, Momoji Kubo
    • Organizer
      ICACC19
    • Related Report
      2018 Research-status Report
    • Int'l Joint Research
  • [Presentation] 反応力場分子動力学シミュレーションによる窒化物半導体基板のナノバブルを用いた化学機械研磨プロセスの検討2019

    • Author(s)
      木村颯太, 宮崎成正, 大谷優介, 尾澤伸樹, 久保百司
    • Organizer
      2019年度精密工学会春季大会学術講演会
    • Related Report
      2018 Research-status Report
  • [Presentation] 化学機械研磨プロセスにおけるマルチフィジックス現象の計算科学シミュレーションによる解明2018

    • Author(s)
      尾澤伸樹, 久保百司
    • Organizer
      第28回 格子欠陥フォーラム
    • Related Report
      2018 Research-status Report
    • Invited
  • [Presentation] 計算科学手法を用いた窒化物半導体基板の化学機械研磨プロセスの検討2018

    • Author(s)
      木村颯太, 青山義昌, 宮崎成正, 大谷優介, 尾澤伸樹, 久保百司
    • Organizer
      トライボロジー会議2018秋
    • Related Report
      2018 Research-status Report
  • [Presentation] Effects of Shockwave-Induced Nanobubble Collapse on Precision Polishing : Molecular Dynamics Study2018

    • Author(s)
      Yoshimasa Aoyama, Jingxiang Xu, Yusuke Ootani, Nobuki Ozawa, Momoji Kubo
    • Organizer
      the 9th Multiscale Materials Modeling
    • Related Report
      2018 Research-status Report
    • Int'l Joint Research
  • [Presentation] Molecular Dynamics Investigation for Chemical Effects of Nanobubble Collapse on Precision Polishing2018

    • Author(s)
      Yoshimasa Aoyama, Jingxiang Xu, Yusuke Ootani, Nobuki Ozawa, Momoji Kubo
    • Organizer
      Pacsurf2018
    • Related Report
      2018 Research-status Report
    • Int'l Joint Research
  • [Presentation] Effects of Nanobubble Collapse on Precision Polishing : Molecular Dynamics Study2018

    • Author(s)
      Yoshimasa Aoyama, Jingxiang Xu, Yusuke Ootani, Nobuki Ozawa, Momoji Kubo
    • Organizer
      42nd International Conference and Expo on Advanced Ceramics and Composites
    • Related Report
      2017 Research-status Report
    • Int'l Joint Research
  • [Presentation] ナノバブル圧壊時に生じるジェット流が半導体基板研磨に及ぼす影響の分子動力学シミュレーション2018

    • Author(s)
      青山義昌,許競翔,大谷優介,尾澤伸樹,久保百司
    • Organizer
      2018年度精密工学会春季大会
    • Related Report
      2017 Research-status Report
  • [Presentation] 計算科学シミュレーションによる化学機械研磨プロセスにおけるマルチフィジックス現象の解明2017

    • Author(s)
      尾澤伸樹, 河口健太郎, 久保百司
    • Organizer
      精密工学会2017年度秋季大会
    • Related Report
      2017 Research-status Report
  • [Presentation] ステップを有するGaN基板モデルを用いた化学機械研磨プロセスの計算化学的検討2017

    • Author(s)
      五十嵐拓也, 大谷優介, 尾澤伸樹, 久保百司
    • Organizer
      精密工学会2017年度秋季大会
    • Related Report
      2017 Research-status Report
  • [Presentation] ナノバブルが半導体基板の精密研磨に与える影響:ナノバブル圧壊プロセスの分子動力学シミュレーション2017

    • Author(s)
      青山義昌,許競翔,大谷優介,尾澤伸樹,久保百司
    • Organizer
      トライボロジー会議2017秋
    • Related Report
      2017 Research-status Report
  • [Presentation] Computational Analysis of Chemical Mechanical Polishing Process for GaN Substrate with Step Structure2017

    • Author(s)
      Takuya Igarashi, Jingxiang Xu, Yusuke Ootani, Nobuki Ozawa, Momoji Kubo
    • Organizer
      WINDS17
    • Related Report
      2017 Research-status Report
    • Int'l Joint Research

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Published: 2017-04-28   Modified: 2021-02-19  

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