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Preparation of functional hard coating materials by high density pulsed plasma ion implantation

Research Project

Project/Area Number 17K06298
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeMulti-year Fund
Section一般
Research Field Power engineering/Power conversion/Electric machinery
Research InstitutionNagoya Institute of Technology

Principal Investigator

KIMURA Takashi  名古屋工業大学, 工学(系)研究科(研究院), 准教授 (60225042)

Project Period (FY) 2017-04-01 – 2020-03-31
Project Status Completed (Fiscal Year 2019)
Budget Amount *help
¥4,810,000 (Direct Cost: ¥3,700,000、Indirect Cost: ¥1,110,000)
Fiscal Year 2019: ¥1,170,000 (Direct Cost: ¥900,000、Indirect Cost: ¥270,000)
Fiscal Year 2018: ¥1,430,000 (Direct Cost: ¥1,100,000、Indirect Cost: ¥330,000)
Fiscal Year 2017: ¥2,210,000 (Direct Cost: ¥1,700,000、Indirect Cost: ¥510,000)
Keywordsプラズマ材料プロセス / 薄膜作製 / イオン注入 / パルスプラズマ / ハードコーティング / スパッタ / プラズマイオンプロセス / ダイヤモンドライクカ―ボン / 導電性 / シリコンド-プ / ハイパワーパルススパッタプラズマ / ペニング放電 / ダイヤモンドライクカ-ボン / 窒素ドープ / 対向タ-ゲット方式 / プラズマイオン注入 / 窒素イオン / ハイパワ-パルススパッタ / ハードコーティング材料
Outline of Final Research Achievements

Ion material process including ion implantation is significant on preparation of functional hard coating materials. Firstly, electrically conductive diamond-like carbon (DLC) films were prepared via plasma-based nitrogen ion implantation. It was examined that the electrical resistivity of the film markedly decreased with the increase in the implantation time. Then, the multi-process of DLC film deposition and subsequent nitrogen ion irradiation was performed. The prepared films had a resistivity of 30 mΩcm. Silicon-doped DLC films were also prepared by a reactive high-power impulse magnetron sputtering combined with a plasma-based ion implantation system. The resistivity of the films markedly increased from 3 to 380 Ωcm with the increase in the Si content.
Moreover, TiSiN and TiCN films were also prepared by high-power pulsed sputtering system. TiSiN film had a peak hardness of 43 GPa and the hardness of TiCN film reached 33 GPa.

Academic Significance and Societal Importance of the Research Achievements

本研究で扱ったハードコーティング材料 (ダイヤモンドライクカーボン、金属窒化物)は自動車部品や各種機械部品の保護、医療分野ではステント保護など様々な分野で応用が進められている。また、機能性を付加することでさらなる用途の拡大が期待できる。材料の特性改善や機能性付加には、イオン注入、イオン照射などのイオンプロセスが重要な役割を果たしており、更なる材料作製技術の向上が種々の産業で期待されている。

Report

(4 results)
  • 2019 Annual Research Report   Final Research Report ( PDF )
  • 2018 Research-status Report
  • 2017 Research-status Report
  • Research Products

    (10 results)

All 2020 2019 2018 2017

All Journal Article (4 results) (of which Peer Reviewed: 4 results) Presentation (6 results) (of which Int'l Joint Research: 6 results)

  • [Journal Article] Preparation of silicon-doped diamond-like carbon films with electrical conductivity by reactive high-power impulse magnetron sputtering combined with a plasma-based ion implantation system2020

    • Author(s)
      Y. Shibata, T. Kimura, S. Nakao, K. Azuma
    • Journal Title

      Diamond and Related Materials

      Volume: 101 Pages: 107635-107635

    • DOI

      10.1016/j.diamond.2019.107635

    • Related Report
      2019 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Plasma based nitrogen ion implantation to hydrogenated diamond-like carbon films2018

    • Author(s)
      T. Kimura、H. Yanai、S. Nakao、K. Azuma
    • Journal Title

      Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

      Volume: 433 Pages: 87-92

    • DOI

      10.1016/j.nimb.2018.08.009

    • Related Report
      2018 Research-status Report
    • Peer Reviewed
  • [Journal Article] Preparation of titanium carbon nitride films by reactive high power pulsed sputtering Penning discharges2018

    • Author(s)
      T. Kimura, R. Yoshida, K. Azuma, S. Nakao
    • Journal Title

      Vacuum

      Volume: 157 Pages: 192-201

    • DOI

      10.1016/j.vacuum.2018.08.043

    • Related Report
      2018 Research-status Report
    • Peer Reviewed
  • [Journal Article] Preparation of TiN films by reactive high-power pulsed sputtering Penning discharges2018

    • Author(s)
      T. Kimura, R. Yoshida, K.Azuma, S. Nakao
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 57 Issue: 6S2 Pages: 06JE02-06JE02

    • DOI

      10.7567/jjap.57.06je02

    • NAID

      210000149203

    • Related Report
      2018 Research-status Report
    • Peer Reviewed
  • [Presentation] Deposition of Si-doped DLC films by reactive HiPIMS combined with PBII system2019

    • Author(s)
      T. Kimura, Y. Shibata, S. Nakao, K. Azuma
    • Organizer
      The 15th international symposium on sputtering & plasma processes
    • Related Report
      2019 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Properties of TiSiN films prepared by high power pulsed sputtering Penning discharge2019

    • Author(s)
      T. Kimura, R. Yoshida, K. Azuma
    • Organizer
      12th Asian-European international conference on plasma surface engineering
    • Related Report
      2019 Annual Research Report
    • Int'l Joint Research
  • [Presentation] Deposition and ion irradiation multi-process coating of diamond-like carbon films using bipolar type plasma-based ion implantation2018

    • Author(s)
      S. Nakao, H. Yanai, T.Kimura, K. Azuma
    • Organizer
      40th International Symposium on Dry Process
    • Related Report
      2018 Research-status Report
    • Int'l Joint Research
  • [Presentation] Preparation of TiSiN films by reactive high power pulsed sputter Penning discharges2018

    • Author(s)
      R. Yoshida、T. Kimura
    • Organizer
      40th International Symposium on Dry Process
    • Related Report
      2018 Research-status Report
    • Int'l Joint Research
  • [Presentation] Plasma Based Nitrogen Ion Implantation to Hydrogenated Diamond-like Carbon Films2017

    • Author(s)
      T. Kimura, H.Yanai, S. Nakao, and K. Azuma
    • Organizer
      11th Asian-European International Conference on Plasma Surface Engineering
    • Related Report
      2017 Research-status Report
    • Int'l Joint Research
  • [Presentation] Preparation of TiN films by reactive high power pulsed sputter Penning discharges2017

    • Author(s)
      T. Mishima, T. Kimura, R. Yoshida, K. Azuma, and S. Nakao
    • Organizer
      39th International Symposium on Dry Process
    • Related Report
      2017 Research-status Report
    • Int'l Joint Research

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Published: 2017-04-28   Modified: 2021-02-19  

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