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Fabrication of light element interstitial perpendicularly magnetized films on silicon substrates

Research Project

Project/Area Number 17K14651
Research Category

Grant-in-Aid for Young Scientists (B)

Allocation TypeMulti-year Fund
Research Field Electronic materials/Electric materials
Research InstitutionTohoku University

Principal Investigator

Ito Keita  東北大学, 金属材料研究所, 助教 (70791763)

Project Period (FY) 2017-04-01 – 2020-03-31
Project Status Completed (Fiscal Year 2019)
Budget Amount *help
¥4,290,000 (Direct Cost: ¥3,300,000、Indirect Cost: ¥990,000)
Fiscal Year 2019: ¥1,300,000 (Direct Cost: ¥1,000,000、Indirect Cost: ¥300,000)
Fiscal Year 2018: ¥1,300,000 (Direct Cost: ¥1,000,000、Indirect Cost: ¥300,000)
Fiscal Year 2017: ¥1,690,000 (Direct Cost: ¥1,300,000、Indirect Cost: ¥390,000)
Keywords垂直磁化膜 / スピントロニクス / 軽元素 / 分子線エピタキシー / 第一原理計算 / スピントロ二クス / シリコン基板
Outline of Final Research Achievements

Fabrication of a novel light element interstitial perpendicularly magnetized ferromagnetic metal films without rare elements are conducted. As a result of fabricating CoxMn4-xN films and evaluating the magnetic properties, the magnetic anisotropy and saturation magnetization can be controlled by the Co/Mn ratio. It becomes perpendicularly magnetized films at x≦0.8 and a saturation magnetization near x=0.8 is almost zero. As a result of characterization by x-ray magnetic circular dichroism measurements, it is revealed that Co atoms preferentially occupy the corner sites of the anti-perovskite lattice and have spin magnetic moments opposite to those of the corner Mn atoms. This is the origin of the magnetization compensation near x=0.8, and it can be said that this material is suitable for spintronics applications. Deployment on silicon substrates has become a future issue.

Academic Significance and Societal Importance of the Research Achievements

本研究では、貴金属やレアアース等の希少元素を用いない新奇軽元素侵入型垂直磁化強磁性体金属薄膜の創製に成功した。CoxMn4-xNの格子定数は半導体産業で用いられているSi(001)基板の格子定数に近いことから、本成果は希少元素を含まない強磁性体を使用した高機能スピントロニクスデバイスの実現と、既存のLSI技術とスピントロニクス技術の融合への一歩とであり、産業的意義のある成果と考える。

Report

(4 results)
  • 2019 Annual Research Report   Final Research Report ( PDF )
  • 2018 Research-status Report
  • 2017 Research-status Report
  • Research Products

    (19 results)

All 2020 2019 2018 2017 Other

All Journal Article (4 results) (of which Peer Reviewed: 4 results,  Open Access: 2 results) Presentation (13 results) (of which Int'l Joint Research: 2 results) Remarks (2 results)

  • [Journal Article] Manipulation of saturation magnetization and perpendicular magnetic anisotropy in epitaxial CoxMn4-xN films with ferrimagnetic compensation2020

    • Author(s)
      Ito Keita、Yasutomi Yoko、Zhu Siyuan、Nurmamat Munisa、Tahara Masaki、Toko Kaoru、Akiyama Ryota、Takeda Yukiharu、Saitoh Yuji、Oguchi Tamio、Kimura Akio、Suemasu Takashi
    • Journal Title

      Physical Review B

      Volume: 101 Issue: 10

    • DOI

      10.1103/physrevb.101.104401

    • Related Report
      2019 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Fabrication of <i>L</i>1<sub>0</sub>-FeNi films by denitriding FeNiN films2019

    • Author(s)
      K. Ito, M. Hayashida, M. Mizuguchi, T. Suemasu, H. Yanagihara, K. Takanashi
    • Journal Title

      Journal of the Magnetics Society of Japan

      Volume: 43 Issue: 4 Pages: 79-83

    • DOI

      10.3379/msjmag.1907R002

    • NAID

      130007672950

    • ISSN
      1882-2924, 1882-2932
    • Year and Date
      2019-07-01
    • Related Report
      2019 Annual Research Report
    • Peer Reviewed / Open Access
  • [Journal Article] Preferred site occupation of 3d atoms in NixFe4-xN (x=1 and 3) films revealed by x-ray absorption spectroscopy and magnetic circular dichroism2018

    • Author(s)
      F. Takata, K. Ito, Y. Takeda, Y. Saitoh, K. Takanashi, A. Kimura, T. Suemasu
    • Journal Title

      Physical Review Materials

      Volume: 2 Issue: 2

    • DOI

      10.1103/physrevmaterials.2.024407

    • NAID

      120007134069

    • Related Report
      2017 Research-status Report
    • Peer Reviewed
  • [Journal Article] Fabrication of ordered Fe-Ni nitride films with equiatomic Fe/Ni ratio2018

    • Author(s)
      F. Takata, K. Ito, T. Suemasu
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 57 Issue: 5 Pages: 058004-058004

    • DOI

      10.7567/jjap.57.058004

    • NAID

      120007134348

    • Related Report
      2017 Research-status Report
    • Peer Reviewed / Open Access
  • [Presentation] Fabrication of L10-FeNi films with high degree of order by denitriding FeNiN films2020

    • Author(s)
      K. Ito, M. Hayashida, T. Koganezawa, T. Nishio, S. Goto, H. Kura, M. Mizuguchi, H. Yanagihara, K. Takanashi
    • Organizer
      第67回応用物理学会春季学術講演会
    • Related Report
      2019 Annual Research Report
  • [Presentation] 脱窒素法による高規則度L10-FeNi薄膜の作製2020

    • Author(s)
      伊藤啓太, 林田誠弘, 小金澤智之, 西尾隆宏, 後藤翔, 藏裕彰, 水口将輝, 柳原英人, 高梨弘毅
    • Organizer
      日本金属学会2020年春季講演大会
    • Related Report
      2019 Annual Research Report
  • [Presentation] Fabrication of L10-FeNi films by nitrogen topotactic extraction from FeNiN films2019

    • Author(s)
      K. Ito, M. Hayashida, M. Mizuguchi, H. Yanagihara, K. Takanashi
    • Organizer
      第80回応用物理学会秋季学術講演会
    • Related Report
      2019 Annual Research Report
  • [Presentation] H2プラズマを用いたin-situ脱窒素法によるL10-FeNi薄膜の作製2019

    • Author(s)
      林田誠弘, 伊藤啓太, 水口将輝, 柳原英人, 高梨弘毅
    • Organizer
      第43回日本磁気学会学術講演会
    • Related Report
      2019 Annual Research Report
  • [Presentation] Growth of Fe4N/Cu/Fe4N tri-layer structure for current-perpendicular-to-plane giant magnetoresistance devices2019

    • Author(s)
      伊藤啓太, 窪田崇秀, 高梨弘毅
    • Organizer
      第66回応用物理学会春季学術講演会
    • Related Report
      2018 Research-status Report
  • [Presentation] FeNiN薄膜の作製と脱窒素法によるL10-FeNi相の形成2019

    • Author(s)
      林田誠弘, 伊藤啓太, 水口将輝, 柳原英人, 高梨弘毅
    • Organizer
      日本金属学会2019年春季講演大会
    • Related Report
      2018 Research-status Report
  • [Presentation] Growth of FeNiN films toward formation of L10-ordered FeNi films by nitrogen topotactic extraction2018

    • Author(s)
      K. Ito, M. Mizuguchi, F. Takata, T. Suemasu, H. Yanagihara, K. Takanashi
    • Organizer
      21st International Conference on Magnetism
    • Related Report
      2018 Research-status Report
    • Int'l Joint Research
  • [Presentation] FeNiN薄膜からの脱窒素によるL10-FeNi薄膜の形成2018

    • Author(s)
      伊藤啓太, 林田誠弘, 水口将輝, 末益崇, 柳原英人, 高梨弘毅
    • Organizer
      第42回日本磁気学会学術講演会
    • Related Report
      2018 Research-status Report
  • [Presentation] 脱窒素法によるL10-FeNi薄膜の作製2018

    • Author(s)
      伊藤啓太, 林田誠弘, 水口将輝, 末益崇, 柳原英人, 高梨弘毅
    • Organizer
      日本金属学会2018年秋季講演大会
    • Related Report
      2018 Research-status Report
  • [Presentation] 高規則度L10-FeNi薄膜の作製に向けたFeNiN薄膜の作製2018

    • Author(s)
      伊藤啓太、高梨弘毅
    • Organizer
      第65回応用物理学会春季学術講演会
    • Related Report
      2017 Research-status Report
  • [Presentation] XMCD測定によるNixFe4-xN(x = 1, 3)薄膜中の3d元素の優先占有サイトの評価2017

    • Author(s)
      高田郁弥、伊藤啓太、都甲薫、竹田幸治、斎藤祐児、高梨弘毅、木村昭夫、末益崇
    • Organizer
      第78回応用物理学会秋季学術講演会
    • Related Report
      2017 Research-status Report
  • [Presentation] L10-FeNi規則合金への窒素添加効果2017

    • Author(s)
      伊藤啓太、高梨弘毅
    • Organizer
      第78回応用物理学会秋季学術講演会
    • Related Report
      2017 Research-status Report
  • [Presentation] Nitrogen insertion to L10-ordered FeNi alloys2017

    • Author(s)
      伊藤啓太、高梨弘毅
    • Organizer
      Junjiro Kanamori Memorial International Symposium
    • Related Report
      2017 Research-status Report
    • Int'l Joint Research
  • [Remarks] Publons

    • URL

      https://publons.com/researcher/2297357/keita-ito/

    • Related Report
      2019 Annual Research Report 2018 Research-status Report
  • [Remarks] RESEARCHER ID

    • URL

      http://www.researcherid.com/rid/D-3805-2016

    • Related Report
      2017 Research-status Report

URL: 

Published: 2017-04-28   Modified: 2021-02-19  

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