Budget Amount *help |
¥534,430,000 (Direct Cost: ¥411,100,000、Indirect Cost: ¥123,330,000)
Fiscal Year 2010: ¥46,020,000 (Direct Cost: ¥35,400,000、Indirect Cost: ¥10,620,000)
Fiscal Year 2009: ¥43,810,000 (Direct Cost: ¥33,700,000、Indirect Cost: ¥10,110,000)
Fiscal Year 2008: ¥153,140,000 (Direct Cost: ¥117,800,000、Indirect Cost: ¥35,340,000)
Fiscal Year 2007: ¥163,930,000 (Direct Cost: ¥126,100,000、Indirect Cost: ¥37,830,000)
Fiscal Year 2006: ¥127,530,000 (Direct Cost: ¥98,100,000、Indirect Cost: ¥29,430,000)
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Research Abstract |
A selective growth method for semiconductor nanowires by using electron beam lithography and metal organic vapor phase epitaxy has been established. The crystal structure and optical properties of GaAs and InP nanowires grown were characterized by electron microscopy and photoluminescence. Transistors, light emitting diodes and solar cells using heterostructure/p-n junction nanowires were fabricated to investigate the device characteristics, which showed promise for application to future nano-electronics.
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