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Development of Photosensitive Polybenzoxazole for Next Generation Protecting Layer

Research Project

Project/Area Number 18350059
Research Category

Grant-in-Aid for Scientific Research (B)

Allocation TypeSingle-year Grants
Section一般
Research Field Polymer chemistry
Research InstitutionTokyo Institute of Technology

Principal Investigator

UEDA Mitsuru  Tokyo Institute of Technology, Dept. of Organic&Polymeric Materials, Professor (20007199)

Co-Investigator(Kenkyū-buntansha) SHIBASAKI Yuji  Iwate University, Dept. Applied Chemistry, Associate Professor (90323790)
Project Period (FY) 2006 – 2007
Project Status Completed (Fiscal Year 2007)
Budget Amount *help
¥14,260,000 (Direct Cost: ¥13,300,000、Indirect Cost: ¥960,000)
Fiscal Year 2007: ¥4,160,000 (Direct Cost: ¥3,200,000、Indirect Cost: ¥960,000)
Fiscal Year 2006: ¥10,100,000 (Direct Cost: ¥10,100,000)
KeywordsPhotosensitive polymer / Polybenzoxazole / Photoacid genrator / Chemical Amplification / Dissolution inhibitor / Direct esterification / Thermal acid generator / Low temperature cyclization / 感光性ポリマー / 活性エステル / 溶解抑制剤 / 直接エステル化 / 耐熱性ポリマー
Research Abstract

1. We developed the facile synthesis of active p-nitropheny diester from aromatic dicarboxylic acid and p-nitrophenol catalyzed by p-toluenesulfonic acid, and poly(o-hydroxy amide) PHA with high molecular weights could be obtained by polycondensation of active diester and bis(o-aminophenol). This process will provide a potentially efficient and versatile route for the synthesis of PHA.
2. We developed a positive-type photosensitive polybenzoxazole (PSPBO) based on a poly(o-hydroxy amide) (PHA), dissolution inhibitor (DI), 9,9-bis(4-tert-butoxycarbonyloxyphenyl)fluorene (t-BocBHF), and the photoacid generator (PAG) (5-propylsulfonyloxyimino-5H-thiophene-2-ylidene) -(2-methylphenyl)acetonitrile (PTMA). The t-BocBHF was easily prepared by reaction of 9,9-bis(4-hydroxyphenyl)fluorene with di-tert-butyl dicarbonate. The dissolution behavior of this PSPBO system was studied in relation to PTMA and t-BocBHF loadings, and post exposure baking (PEB) temperature. The PSPBO consisting of PHA (77 w … More t%), t-BocBHF (20 wt%), and PTMA (3 wt%) exhibited a sensitivity of 34 mJ/cm2 and contrast of 5.8 when exposed to 365-nm light (i-line) and developed with the aqueous alkaline developer, 2.38 wt% tetramethylammonium hydroxide solution (TMAHaq) / 5 wt% iso-propanol (iPrOH). A clear positive image with 8-pm features was produced by contact-printing and converted into the poly(benzoxazole) pattern upon heating at 3500C for 1 h.
3. We developed a positive-type photosensitive polybenzoxazole (PSPBO) based on a poly(o-hydroxy amide) (PHA), a dissolution inhibitor (DI) 9,9-bis(4-tert-butoxycarbonyloxyphenyl)fluorene (t-BocBHF), a thermoacid generator (TAG) isopropyl p-toluenesufonate (ITS), and a photoacid generator (PAG) (5-propylsulfonyloxyimino-5H-thiophene-2-ylidene)-(2-methylphenyl)acetonitrile (PTMA) has been developed. ITS was easily prepared by reaction of p-toluenesulfonyl chloride with isopropyl alcohol. The dissolution behavior of the PSPBO system was studied in relation to PTMA loadings, and post exposure baking (PEB) temperature and time. The PSPBO consisting of PHA (73 wt%), t-BocBHF (18 wt%), ITS (7.5 wt%), and PTMA (1.5 wt%) exhibited a sensitivity of 33 mJ/cm2 and a contrast of 5.1 when exposed to 365-nm light (i-line) and developed with an aqueous alkaline developer, 2.38 wt% tetramethylammonium hydroxide solution (TMAHaq) / 2.5 wt% iso-propanol (/PrOH). A clear positive image with 3-pm features was produced by contact-printing and converted into a poly(benzoxazole) (PBO) pattern upon heating at 250 ℃ for 20 min. Thus, the ITS is effective as a TAG for improving the sensitivity and low temperature cyclization of PHA into the PBO as well to meet practical requirement in the industry. Less

Report

(3 results)
  • 2007 Annual Research Report   Final Research Report Summary
  • 2006 Annual Research Report
  • Research Products

    (24 results)

All 2008 2007 2006

All Journal Article (15 results) (of which Peer Reviewed: 5 results) Presentation (9 results)

  • [Journal Article] Recent Progress of Photosensitive Polyimides2008

    • Author(s)
      K. Fukukawa, M. Ueda
    • Journal Title

      Polym. J., 40

      Pages: 281-296

    • NAID

      10021116871

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2007 Final Research Report Summary
    • Peer Reviewed
  • [Journal Article] Recent Progress of Photosensitive Polyimides2008

    • Author(s)
      K., Fukukawa, M., Ueda
    • Journal Title

      Polym. J 40

    • NAID

      10021116871

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2007 Final Research Report Summary
  • [Journal Article] Photosensitive Poly(benzoxazole)Based on Poly(ο-hydroxy amide), Dissolution In hibitor, Thermoacid Generator, and Photoacid Generator2007

    • Author(s)
      T. Ogura, M. Ueda
    • Journal Title

      Polym. J. 39

      Pages: 245-251

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2007 Final Research Report Summary
    • Peer Reviewed
  • [Journal Article] 次世代感光性耐熱高分子:感光性ポリイミド・ポリベンズオキサゾールの概要と展望2007

    • Author(s)
      小倉知士, 上田充
    • Journal Title

      Polyfile 44

      Pages: 32-36

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2007 Final Research Report Summary
  • [Journal Article] Photosensitive Polybenzoxazole Based on A Poly(ο-hydroxy amide), A Dissolution Inhibitor, and A Photoacid Generator2007

    • Author(s)
      T. Ogura, M. Ueda
    • Journal Title

      J. Polym. Sci. Part-A, Polym. Chem., 45

      Pages: 661-668

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2007 Final Research Report Summary
    • Peer Reviewed
  • [Journal Article] Facile Synthesis of Semiaromatic Poly(amic acid)s from trans-1, 4-Cyclohexanediamine and Aromatic Tetracarboxylic Dianhydrides2007

    • Author(s)
      T Ogura, M. Ueda
    • Journal Title

      Macromolecules, 40

      Pages: 3527-29

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2007 Final Research Report Summary
    • Peer Reviewed
  • [Journal Article] Next Generation Photosentive Polyimides/polybenzoxazole2007

    • Author(s)
      T., Ogura, M., Ueda
    • Journal Title

      Polyfile 44

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2007 Final Research Report Summary
  • [Journal Article] Photosensitive Polybenzoxazole Based on A Poly(o-hydroxy amide), A Dissolution Inhibitor, and A Photoacid Generator2007

    • Author(s)
      T., Ogura, M., Ueda
    • Journal Title

      J. Polym. Sci. Part-A, Polym. Chem 45

      Pages: 661-668

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2007 Final Research Report Summary
  • [Journal Article] Photosensitive Poly(benzoxazole) Based on Poly(o-hydroxy amide), Dissolution Inhibitor, Thermoacid Generator, and Photoacid Generator2007

    • Author(s)
      T., Ogura, K., Yamaguchi, Y., Shibasaki, M., Ueda
    • Journal Title

      Polym. J 39

      Pages: 245-251

    • NAID

      10018868790

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2007 Final Research Report Summary
  • [Journal Article] Facile Synthesis of Serniaromatic Poly(amic acid)s from trRns-1,4-Cyclohexanediamine and Aromatic Tetracarboxylic Dianhydrides2007

    • Author(s)
      T., Ogura, M., Ueda
    • Journal Title

      Macromolecules 40

      Pages: 3527-3529

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2007 Final Research Report Summary
  • [Journal Article] Photosensitive Poly (benzoxazole) Based on Poly (ο-hydroxy amide), Dissolution Inhibitor, Thermoacid Generator, and Photoacid Generator2007

    • Author(s)
      T. Ogura, M. Ueda
    • Journal Title

      Polym. J. 39

      Pages: 245-251

    • Related Report
      2007 Annual Research Report
    • Peer Reviewed
  • [Journal Article] 次世代感光性耐熱高分子:感光性ポリイミド・ポリベンズオキサゾールの概要と展望2007

    • Author(s)
      小倉知士 上田充
    • Journal Title

      Polyfile 44

      Pages: 32-36

    • Related Report
      2007 Annual Research Report
  • [Journal Article] Photosensitive Polybenzoxazole Based on A Ply(o-hydroxy amide), A Dissolutior Inhibitor, and A Photoacid Generator2007

    • Author(s)
      T.Ogura, M.Ueda
    • Journal Title

      J. Polym. Sci. Part-A, Polym. Chem., 45

      Pages: 661-668

    • Related Report
      2006 Annual Research Report
  • [Journal Article] Direct Synthesis of Active Diester from Dicarboxylic Acid and p-nitrophenol and Synthesis of Poly(o-hydroxyamide)2006

    • Author(s)
      T.Ogura, M.Ueda
    • Journal Title

      Macromolecules,39,3980-3981(2006) 39

      Pages: 3980-3981

    • Related Report
      2006 Annual Research Report
  • [Journal Article] Three Components Positive Type Photosensitive Poly(b enzoxazole) Based on Poly(o-hydroxy amide), a Dissolution Inhibitor, and a Photoacid Generator2006

    • Author(s)
      T.Ogura, M.Ueda
    • Journal Title

      J. Photopolym. Sci. & Technol., 19

      Pages: 291-292

    • NAID

      130004464502

    • Related Report
      2006 Annual Research Report
  • [Presentation] A Negative-type Photosensitive Polymer based on Poly(phenylene ether)A Cross-linking Agent, and A Photoacid Generator2007

    • Author(s)
      K. Mizoguchi, M. Ueda
    • Organizer
      高分子学会討論会
    • Place of Presentation
      名古屋
    • Year and Date
      2007-09-19
    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2007 Final Research Report Summary
  • [Presentation] A Negative-type Photosensitive Polymer based on Poly(phenylene ether) A Cross-linking Agent, and A Photoacid Generator2007

    • Author(s)
      K., Mizoguchi, M., Ueda
    • Organizer
      56th Symposium on Macromolecules of SPSJ
    • Year and Date
      2007-09-19
    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2007 Final Research Report Summary
  • [Presentation] Development of Negative-type Photosensitive Semi-alicyclic Polyimide2007

    • Author(s)
      K. Mizoguchi, Y. Shibasaki, M. Ueda
    • Organizer
      フォトポリマーコンフェレンス
    • Place of Presentation
      千葉
    • Year and Date
      2007-06-28
    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2007 Final Research Report Summary
  • [Presentation] A Negative-type Photosensitive Polymer Based on Poly(2, 6-dimethyl-1, 4-phenylene Ether), a Cross-linker and a Photoacid Generator2007

    • Author(s)
      K. Mizoguchi, K. Tsuchiya, Y. Shibasaki, M. Ueda
    • Organizer
      フォトポリマーコンフェレンス
    • Place of Presentation
      千葉
    • Year and Date
      2007-06-28
    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2007 Final Research Report Summary
  • [Presentation] Development of Negative-type Photosensitive Semi-alicyclic Polyimide Using a Photobase Generator2007

    • Author(s)
      K., Mizoguchi, Y., Shibasaki, M., Ueda
    • Organizer
      23th International Conference of Photopolymer Science and Technology
    • Year and Date
      2007-06-28
    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2007 Final Research Report Summary
  • [Presentation] A Negative-type Photosensitive Polymer Based on Poly(2,6-dimethyl -1,4-phenylene Ether), a Cross-linker and a Photoacid Generator2007

    • Author(s)
      K., Mizoguchi, K., Tsuchiya, Y., Shibasaki, M., Ueda
    • Organizer
      23th International Conference of Photopolymer Science and Technology
    • Year and Date
      2007-06-28
    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2007 Final Research Report Summary
  • [Presentation] Facile Synthesis of Semiaromatic Poly(amic acid)s from trans-1, 4-Cyclohexanediamine and Aromatic Tetracarboxylic Dianhydrides2007

    • Author(s)
      T. Ogura, M. Ueda
    • Organizer
      高分子学年次大会
    • Place of Presentation
      京都
    • Year and Date
      2007-05-29
    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2007 Final Research Report Summary
  • [Presentation] Facile Synthesis of Semiaromatic Poly(amic acid)s from trans-1.4-Cyclohexanediarnine and Aromatic Tetraeorboxylic Dianhydrides2007

    • Author(s)
      T., Ogura, M., Ueda
    • Organizer
      56th annual meeting of SPSJ
    • Year and Date
      2007-05-29
    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2007 Final Research Report Summary
  • [Presentation] 簡便な半脂環式ポリアミック酸の合成2007

    • Author(s)
      小倉知士 上田充
    • Organizer
      高分子学会
    • Place of Presentation
      京都
    • Year and Date
      2007-05-29
    • Related Report
      2007 Annual Research Report

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Published: 2006-04-01   Modified: 2016-04-21  

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