Study of the Formation of Single-Crystal Silicon Thin-Film Using Nanoimprint Seeding

• Project/Area Number: 18360025
• Research Category: Grant-in-Aid for Scientific Research (B)
• Allocation Type: Single-year Grants
• Section: 一般
• Research Field: Thin film/Surface and interfacial physical properties
• Research Institution: Kyushu University
• Principal Investigator: ASANO Tanemasa Kyushu University, 大学院・システム情報科学研究院, 教授 (50126306)
• Co-Investigator(Kenkyū-buntansha): TAIZO Sadoh 九州大学, 大学院・システム情報科学研究院, 准教授 (20274491) ; ATSUSHI Kenjo 九州大学, 大学院・システム情報科学研究院, 助教 (20037899) ; MASANOBU Miyao 九州大学, 大学院・システム情報科学研究院, 教授 (60315132)
• Project Period (FY): 2006 – 2008
• Project Status: Completed (Fiscal Year 2008)
• Budget Amount: ¥16,580,000 (Direct Cost: ¥15,500,000、Indirect Cost: ¥1,080,000); Fiscal Year 2008: ¥2,080,000 (Direct Cost: ¥1,600,000、Indirect Cost: ¥480,000); Fiscal Year 2007: ¥2,600,000 (Direct Cost: ¥2,000,000、Indirect Cost: ¥600,000); Fiscal Year 2006: ¥11,900,000 (Direct Cost: ¥11,900,000)
• Keywords: 薄膜トランジスタ / ナノインプリント / 金属誘起固相結晶化 / レーザーアニール / シリコン薄膜 / 多結晶シリコン / システムオンパネル

Research Abstract

ナノインプリント技術を応用して非晶質シリコン薄膜表面の極微領域に転写した金属の触媒作用による固相結晶化過程の促進、金属誘起固相結晶化過程に優先配向性を利用して結晶核を所望の位置に配列して発生させ、その結晶核をレーザー照射で大結晶へと拡大成長させ技術を開発した。これにより、従来の方法では不可能であった、結晶方位を揃えた擬似単結晶シリコン薄膜をガラス基板上に形成する新しい技術を開発した。

Research Products

• [Journal Article] Silicon Crystal Nanowires Produced by Metal-Induced Lateral Crystallization (2009)
  • Author(s): G. Nakagawa and T. Asano
  • Journal Title: Jpn.J.Appl.Phys. Vol.48(掲載予定)
  • NAID: 210000066927
  • Peer Reviewed
• [Journal Article] Self-Heating of Laterally Grown Polycrystalline Silicon Thin-Film Transistor (2009)
  • Author(s): K. Watanabe and T. Asano
  • Journal Title: Jpn.J.Appl.Phys. Vol.48
  • NAID: 210000066424
  • Peer Reviewed
• [Journal Article] Investigation on Characteristic Variation of Polycrystalline Silicon Thin-Film Transistor Using Laterally Grown Film (2009)
  • Author(s): K. Akiyama, K. Watanabe, and T. Asano
  • Journal Title: Jpn.J.Appl.Phys Vol.48
  • NAID: 210000066433
  • Peer Reviewed
• [Journal Article] Investigation on Characteristic Variation of Polycrystalline Silicon Thin-Film Transistor Using Laterally Grown Film (2009)
  • Author(s): K. Akiyama, K. Watanabe, T. Asano
  • Journal Title: Jpn. J. Appl. Phys. 48
  • NAID: 210000066433
  • Peer Reviewed
• [Journal Article] Self-Heating of Laterally Grown Polycrystalline Silicon Thin-Film Transistor (2009)
  • Author(s): K. Watanabe, T. Asano
  • Journal Title: Jpn. J. Appl. Phys. 48
  • NAID: 210000066424
  • Peer Reviewed
• [Journal Article] Silicon Crystal Nano-Wires Produced by Metal-Induced Lateral Crystallization (2009)
  • Author(s): G. Nakagawa, T, Asano
  • Journal Title: Jpn. J. Appl. Phys. 48(To bepublished)
  • Peer Reviewed
• [Journal Article] Droplet Ejection Behavior in Electrostatic Inkjet Driving (2008)
  • Author(s): Y. Ishida, K. Sogabe, S. Kai, and T. Asano
  • Journal Title: Jpn.J.Appl.Phys. Vol.47 No.6 Pages: 5281-5286
  • Peer Reviewed
• [Journal Article] Oriented Growth of Location-Controlled Si Crystal Grains by Ni Nano-Imprint and Excimer Laser Annealing (2008)
  • Author(s): G. Nakagawa and T. Asano
  • Journal Title: Jpn.J.Appl.Phys Vol.47 No.4 Pages: 3036-3040
  • Peer Reviewed
• [Journal Article] Silicon Crystal Nano-Wires Produced by Metal-Induced Lateral Crystallization (2008)
  • Author(s): G. Nakagawa and T. Asano
  • Journal Title: Dig. Papers, The 21th Int. Microprocesses and Nanotechnology Conference Pages: 546-547
  • Peer Reviewed
• [Journal Article] Fabrication of a-Si Nano-Wires using UV Nano-Imprint Lithography and Its Crystallization Characteristics (2008)
  • Author(s): G. Nakagawa and T. Asano
  • Journal Title: Proc. 7th Int. Conf. on Nanoimprint and Nanoprint Technology Pages: 76-77
  • Peer Reviewed
• [Journal Article] Investigation on Characteristic Variation of Polycrystalline-Si Thin-Film Transistor Having Stripe Channels (2008)
  • Author(s): K. Akiyama, K. Watanabe and T. Asano
  • Journal Title: Dig. Tech. Papers, The 15th Int. Workshop on Active-Matrix Flatpanel Displays and Devices Pages: 259-262
  • NAID: 110006792709
  • Peer Reviewed
• [Journal Article] Self-Heating of Laterally Grown Polycrystalline Si TFT (2008)
  • Author(s): K. Watanabe and T. Asano
  • Journal Title: Dig. Tech. Papers, The 15th Int. Workshop on Active-Matrix Flatpanel Displays and Devices Pages: 165-168
  • Peer Reviewed
• [Journal Article] ストライプ型チャネルを持つ多結晶シリコン薄膜トランジスタの特性ばらつききの評価 (2008)
  • Author(s): 秋山浩司, 渡邊一徳, 浅野種正
  • Journal Title: 信学技報 Vol.108 No.1 Pages: 23-26
• [Journal Article] Discussion on the Characteristic Variation of Laterally Grown Poly-Si TFT (2008)
  • Author(s): K. Watanabe, K. Akiyama, G. Nakagawa, T. Kudo and T. Asano
  • Journal Title: Proc.4th International TFT Conference Pages: 77-80
  • Peer Reviewed
• [Journal Article] Oriented Growth of Location-Controlled Si Crystal Grains by Ni Nano-Imprint and Excimer Laser Annealing (2008)
  • Author(s): G. Nakagawa, T. Asano
  • Journal Title: Jpn. J. Appl. Phys. 47 Pages: 3036-3040
  • Peer Reviewed
• [Journal Article] Droplet Ejection Behavior in Electrostatic Inkjet Driving (2008)
  • Author(s): Y. Ishida, K. Sogabe, S. Kai, T. Asano
  • Journal Title: Jpn. J. Appl. Phys. 47 Pages: 5281-5286
  • Peer Reviewed
• [Journal Article] Investigation on Characteristic Variation of Polycrystalline-Si Thin Film Transistor Having Stripe Channels (2008)
  • Author(s): K. Akiyama, K. Watanabe, T. Asano
  • Journal Title: Dig. Tech. Papers, The 15th Int. Workshop on Active-Matrix Flatpanel Displays and Devices Pages: 259-262
  • NAID: 110006792709
  • Peer Reviewed
• [Journal Article] Self-Heating of Laterally-Grown Poly-Si Thin-Film Transisotor (2008)
  • Author(s): K. Watanabe, T. Asano
  • Journal Title: Dig. Tech. Papers, The 15h Int. Workshop on Active-Matrix Flatpanel Displays and Devices Pages: 159-162
  • Peer Reviewed
• [Journal Article] Fabrication of a-Si Nano-Wires using UV Nano-Imprint Lithography and Its Crystallization Characteristics (2008)
  • Author(s): G. Nakagawa, T. Asano
  • Journal Title: Proc. 7th Int. Conf. on Nanoimprint and Nanoprint Technology Pages: 76-77
  • Peer Reviewed
• [Journal Article] Silicon Crystal Nano-Wires Produced by Metal-Induced Lateral Crystallization (2008)
  • Author(s): G. Nakagawa, T. Asano
  • Journal Title: Dig. Papers, 21st Int'l Conf. Microprocesses and Nanotechnology Conference Pages: 546-547
  • Peer Reviewed
• [Journal Article] Discusson on the characterlstic variation of laterally grown poly-Si TFT (2008)
  • Author(s): K.Watanabe, K. Akiyama, G.Nakagawa, T.Asano and T.Kudo
  • Journal Title: Proc.4th Int. TFT Conference Pages: 77-80
• [Journal Article] Metal-Induced Crystallization of Si for Nano-Structure Formation(Invited) (2008)
  • Author(s): T.Asano
  • Journal Title: Collected Abs. 2008 RCIQE International Seminor on Advance Semiconductor Materials an Devices Pages: 10-11
• [Journal Article] Nickel Metal Induced Lateral Crystallization of Patterned Amorphous Silicon Thin Film (2007)
  • Author(s): G. Nakagawa and T. Asano
  • Journal Title: Materials Science Forum Vols.561-565 Pages: 1149-1152
  • Peer Reviewed
• [Journal Article] Inkjet Printing of Nickel Nanosized Particles for Metal-Induced Nanosized Particles for Metal-Induced (2007)
  • Author(s): Y. Ishida, G. Nakagawa, and T. Asano
  • Journal Title: Jpn.J.Appl.Phys. Vol.46 No.9B Pages: 6437-6443
  • Peer Reviewed
• [Journal Article] Inkjet-Printed Metal-Colloid-Induced Crystallization of Amorphous Amorphous Silicon (2007)
  • Author(s): Y. Ishida, G. Nakagawa, and T. Asano
  • Journal Title: Jpn.J.Appl.Phys. Vol.46No.3B Pages: 1263-1267
  • Peer Reviewed
• [Journal Article] Low-Temperature Source/Drain Contact Formation Using Silicidation Induced Activation of Implanted Impurities (2007)
  • Author(s): T. Asano, M. Esaki and G. Nakagawa
  • Journal Title: Ext. Abstr, The 5th Int. Symp. on Control of Semiconductor Interfaces Pages: 199-200
  • Peer Reviewed
• [Journal Article] Droplet Ejection Behavior in Electrostatic Inkjet Driving (2007)
  • Author(s): Y. Ishida, K. Sogabe, S. Kai and T. Asano
  • Journal Title: Dig. Papers, The 20th Int. Microprocesses and Nanotechnology Conference Pages: 384-385
  • Peer Reviewed
• [Journal Article] Oriented Growth of Location-Controlled Si Crystal Grains Using Ni Nano-Imprint and Excimer Laser Annealing (2007)
  • Author(s): G. Nakagawa and T. Asano
  • Journal Title: Ext. Abstr, 2007 Int. Conf. on Solid State Devices and Materials Pages: 790-791
  • NAID: 10022550685
  • Peer Reviewed
• [Journal Article] Application of Electrostatic Inkjet Printing to Ni-Nano-Particles Induced Crystallization of a-Si (2007)
  • Author(s): Y. Ishida, G. Nakagawa and T. Asano
  • Journal Title: Dig. Tech. Papers, The 14th Int. Workshop on Active-Matrix Flatpanel Displays and Devices Pages: 267-270
  • Peer Reviewed
• [Journal Article] Characterization of Grain Boundary Effect on TFT Fabricated on Laterally Grown poly-Si Film (2007)
  • Author(s): T. Asano, K. Watanabe, K. Akiyama, G. Nakagawa and T. Kudo
  • Journal Title: Dig. Tech. Papers, The 14th Int. Workshop on Active-Matrix Flatpanel Displays and Devices Pages: 195-198
  • Peer Reviewed
• [Journal Article] 静電型インクジェットによる微細液滴吐出とSi の金属誘起固相結晶化への応用 (2007)
  • Author(s): 石田雄二, 中川豪, 浅野種正
  • Journal Title: 信学技報 Vol.107 No.13 Pages: 5-10
• [Journal Article] Location and Orientation Control of Si Thin-Film Grains Using Metal Nano-Imprint Seeding of Laser Annealing (2007)
  • Author(s): T. Asano and G. Nakagawa
  • Journal Title: Proc. 3rd International TFT Conference Pages: 74-77
  • Peer Reviewed
• [Journal Article] Inkjet-Printed Metal-Collid-Induced Crysatallization of Amorphous Sllicon (2007)
  • Author(s): Y.Ishida, G. Nakagawa and T.Asano
  • Journal Title: Jpn.J.Appl.Phys. 46,3B Pages: 1263-1267
• [Journal Article] Inkjet Printing of Nickel Nanosized Particles for Metal-lnduced Crystallization of Amorphous Silicon (2007)
  • Author(s): Y.Ishida, G. Nakagawa and T.Asano
  • Journal Title: Jpn.J.Appl.Phys. 46,9B Pages: 6437-6443
• [Journal Article] Ni-imprint induced solid-phase crystallization in Sil-xGex(x:0-1) on insulator (2007)
  • Author(s): K.ToKo, H. Kanno, A. Kenjo, T.Sadoh, T.Asano and M.Miyao
  • Journal Title: Appl.Phys.Lett. 91
• [Journal Article] Location and Orientation Control of Si Thin-Film Grains Using Metal nano-lmprint Seeding of Laser Annealing (2007)
  • Author(s): T.Asano and G.Nakagawa
  • Journal Title: Proc.3rd International TFT Conference Pages: 74-77
• [Journal Article] Characterization of Grain Boundary Effect on TFT Fabricated on LaterallyGrown poly-Si Film (2007)
  • Author(s): T.Asano, K. Watanabe, K.Akiyama, G. Nakagawa and T. Kudo
  • Journal Title: Dig.Tech.Papers, 14th lnt'l Active-Matrix Flat-Panel Displays and Devices Pages: 195-198
• [Journal Article] Catalytic Effect of Ni in Crystallization of Amorphous SiGe Films by Imprint Technique (2007)
  • Author(s): K.Toko, H. Kanno, A. Kenjo, T.Sadoh, T.Asano and M.Miyao
  • Journal Title: Dig.Tech.Papers, The 14th Int.Workshop on Active-Matrix Flatpanel Displays and Devices Pages: 275-278
• [Journal Article] Application of Electrostatic Inkjet Printing to Ni-Nano-Particles Induced Crystallization of a-Si (2007)
  • Author(s): Y.Iahida, G. Nakagawa, and T.Asano
  • Journal Title: Dig.Tech.Papers, The 14th Int. Workshopon Active-Matrix Flatpanel Displays and Devices Pages: 267-270
• [Journal Article] Orientpd Growth of Location-Controlled Si Crystal Grains Using Ni Nano-imprint and Excimed Laser Annealing (2007)
  • Author(s): G.Nakagawa and T.Asano
  • Journal Title: Ext.Abs.2007 Int'l Conf.Solid State Devices and Materials Pages: 790-791
• [Journal Article] Droplet Ejecton Behavior in Electrostatic Inkjet Driving (2007)
  • Author(s): Y.Ishida, K. Sogabe, S. Kai and T.Asano
  • Journal Title: Dig.Papers, 20th Int'l Conf.Microprocessesand Nanotechnology Conference Pages: 384-385
• [Journal Article] Low-Temperature Source/Drain Contact Formation Using SiHcidaton Induced Activation of Implanted Impurities (2007)
  • Author(s): T.Asano, M. Esaki and G.Nakagawa
  • Journal Title: Ext. Abs. 5th Int'l Symposium on Control of Semiconductor Interfaces Pages: 199-200
• [Journal Article] Location and Orientation Control of Si Thin-Film Grains Using Metal Nano-Imprint Seeding of Laser Annealing (Invited) (2007)
  • Author(s): T.Asano, G.Nakagawa
  • Journal Title: Proc. 2007 International TFT Conference (in press) Pages: 74-77
• [Journal Article] 固相とレーザーの組み合わせ結晶化による結晶方位制御の可能性 (2006)
  • Author(s): 浅野種正, 中川豪
  • Journal Title: レーザー研究 第34 巻第10 号 Pages: 684-688
  • NAID: 10018312187
  • Peer Reviewed
• [Journal Article] Orientation Control of Location-Controlled Si Crystal Grain by Combining Ni Nano-Imprint and Excimer Laser Annealing with Si Double-Layer Process (2006)
  • Author(s): G. Nakagawa and T. Asano
  • Journal Title: Jpn.J.Appl.Phys. Vol.45 No.49
  • NAID: 10018461137
  • Peer Reviewed
• [Journal Article] Combination of Metal Nano-Imprint and Excimer Laser Annealing for Location Control of Si Thin-Film Grain (2006)
  • Author(s): G. Nakagawa and T. Asano
  • Journal Title: Mat. Res. Soc. Symp. Proc. Vol.910 Pages: 503-508
  • Peer Reviewed
• [Journal Article] Location and Orientation Control of Si Grain by Combining Metal-Induced Lateral Crystallization and Excimer Laser Annealing (2006)
  • Author(s): N. Higashi, G. Nakagawa, T. Asano, M. Miyasaka, and J. Stoemenos
  • Journal Title: Jpn.J.Appl.Phys. Vol.45 No.5B Pages: 4347-4350
  • Peer Reviewed
• [Journal Article] Location Control of Si Thin-Film Grain Using Ni Imprint and Excimer Laser Annealing (2006)
  • Author(s): G. Nakagawa, T. Asano, and M. Miyasaka
  • Journal Title: Jpn.J.Appl.Phys. Vol.45 No.5B Pages: 4335-4339
  • Peer Reviewed
• [Journal Article] Inkjet Printing of Ni Nano-Size-Particles for Metal Induced Crystallization of Amorphous Si (2006)
  • Author(s): Y. Ishida, G. Nakagawa and T. Asano
  • Journal Title: Dig. Papers, The 19th Int. Microprocesses and Nanotechnology Conference Pages: 336-337
  • Peer Reviewed
• [Journal Article] Inkjet-Printed Ni-Colloid Induced Crystallization of Amorphous Si (2006)
  • Author(s): Y. Ishida, G. Nakagawa and T. Asano
  • Journal Title: Dig. Tech. Papers, The 13th Int. Workshop on Active-Matrix Flatpanel Displays and Devices Pages: 51-54
  • Peer Reviewed
• [Journal Article] Low Temperature Formation of Source and Drain Using Snow Plow Effect of Silicidation (2006)
  • Author(s): T. Asano, M. Esaki and G. Nakagawa
  • Journal Title: Dig. Tech. Papers, The 13th Int. Workshop on Active-Matrix Flatpanel Displays and Devices Pages: 31-34
  • Peer Reviewed
• [Journal Article] ダブルパルスレーザー走査法による多結晶Si結晶粒の横方向成長とTFT 特性 (2006)
  • Author(s): 渡邉一徳, 江崎真彦, 中川豪, 浅野種正, 櫻木進, 工藤利雄
  • Journal Title: 信学技報 Vol.106 No.5 Pages: 19-22
  • NAID: 110004718825
• [Journal Article] Location and Orientation Control of Si Grains by Combining Metal-Induced Lateral Crystallization and Excimer Laser Annealing (2006)
  • Author(s): N.Higashi, G.Nakagawa, T.Asano, M.Miyasaka, J.Stoemenos
  • Journal Title: Jpn. J. Appl. Phys. 45 Pages: 4373-4350
• [Journal Article] Location Control of Si Thin-Film Grain Using Ni Imprint and Excimer Laser Annealing (2006)
  • Author(s): G.Nakagawa, T.Asano, M.Miyasaka
  • Journal Title: Jpn. J. Appl. Phys. 45 Pages: 4335-4399
• [Journal Article] Properties of Ink-Droplet Formation in Double-Gate Electrospray (2006)
  • Author(s): Y.Ishida, K.Sogabe, K.Hakiai, A.Baba, T.Asano
  • Journal Title: Jpn. J. Appl. Phys. 45 Pages: 6475-6480
  • NAID: 40007382163
• [Journal Article] 固相とレーザーの組み合わせ結晶化による結晶方位制御の可能性 (2006)
  • Author(s): 浅野種正, 中川豪
  • Journal Title: レーザー研究 34 Pages: 684-688
  • NAID: 10018312187
• [Journal Article] Orientation Control of Location-Controlled Si Crystal Grain by Combining Ni Nao-Imprint and Excimer Laser Annealing with Si Double-Layer Process (2006)
  • Author(s): G.Nakagawa, T.Asano
  • Journal Title: Jpn. J. Appl. Phys. 45
• [Journal Article] Low Temperature Formation of Source and Drain Using Snow Plow Effect of Silicidation (2006)
  • Author(s): T.Asano, M.Esaki, G.Nakagawa
  • Journal Title: Dig. Tech. Papers, The 13th Int. Workshop on Active-Matrix Flatpanel Displays and Devices Pages: 31-34
• [Journal Article] Inkjet-Printed Ni-Colloid Induced Crystallization of Amorphous Si (2006)
  • Author(s): Y.Ishida, G.Nakagawa, T.Asano
  • Journal Title: Dig. Tech. Papers, The 13th Int. Workshop on Active-Matrix Flatpanel Displays and Devices Pages: 54-51
• [Journal Article] Inkjet Printing of Ni Nano-Size Particles for Metal Induced Crystallization of Amorphous Si (2006)
  • Author(s): Y.Ishida, G.Nakagawa, T.Asano
  • Journal Title: Dig. Papers, 2006 International Microprocess and Nanotechnology Conf. Pages: 336-337
• [Presentation] Silicon Crystal Nano-Wires Produced by Metal-Induced Lateral Crystallization (2008)
  • Author(s): G. Nakagawa and T. Asano
  • Organizer: The 21th Int. Microprocesses and Nanotechnology Conference
  • Place of Presentation: 福岡
  • Year and Date: 2008-10-30
• [Presentation] Fabrication of a-Si Nano-Wires using UV Nano-Imprint Lithography and Its Crystallization Characteristics (2008)
  • Author(s): G. Nakagawa, T. Asano
  • Organizer: The 7th Int. Conf. on Nanoimprint and Nanoprint Technology
  • Place of Presentation: 京都
  • Year and Date: 2008-10-14
• [Presentation] Investigation on Characteristic Variation of Polycrystalline-Si Thin-Film Transistor Having Stripe Channels (2008)
  • Author(s): K. Akiyama, K. Watanabe and T. Asano
  • Organizer: The 15th Int. Workshop on Active-Matrix Flatpanel Displays and Devices
  • Place of Presentation: 東京
  • Year and Date: 2008-07-04
• [Presentation] Investigation on Characteristic Variation of Polycrystalline-Si Thin-Film Transistor Having Stripe Channels (2008)
  • Author(s): K. Akiyama, K. Watanabe, T. Asano
  • Organizer: The 15th Int. Workshop on Active-Matrix Flat panel Displays and Devices
  • Place of Presentation: 東京
  • Year and Date: 2008-07-04
• [Presentation] Self-Heating of Laterally Grown Polycrystalline Si TFT (2008)
  • Author(s): G. Nakagawa and T. Asano
  • Organizer: The 15th Int. Workshop on Active-Matrix Flatpanel Displays and Devices pp.76-77
  • Place of Presentation: 東京
  • Year and Date: 2008-07-03
• [Presentation] Self-Heating of Laterally Grown Polycrystalline Si TFT (2008)
  • Author(s): K. Watanabe and T. Asano
  • Organizer: The 15th Int. Workshop on Active-Matrix Flatpanel Displays and Devices
  • Place of Presentation: 東京
  • Year and Date: 2008-07-03
• [Presentation] Self-Heating of Laterally Grown Polycrystalline Si TFT (2008)
  • Author(s): K. Watanabe, T. Asano
  • Organizer: The 15th Int. Workshop on Active-Matrix Flat panel Displays and Devices
  • Place of Presentation: 東京
  • Year and Date: 2008-07-03
• [Presentation] ストライプ型チャネルを持つ多結晶シリコン薄膜トランジスタの特性ばらつきの評価 (2008)
  • Author(s): 秋山浩司, 渡邊一徳, 浅野種正
  • Organizer: 電子情報通信学会技術研究報告SDM2008-5
  • Place of Presentation: 沖縄
  • Year and Date: 2008-04-11
• [Presentation] Discussion on the Characteristic Variation of Laterally Grown Poly-Si TFT (2008)
  • Author(s): K. Watanabe, K. Akiyama, G. Nakagawa, T. Kudo and T. Asano
  • Organizer: The 4th International TFT Conference
  • Place of Presentation: Seoul, Korea
  • Year and Date: 2008-01-24
• [Presentation] Low-Temperature Source/Drain Contact Formation Using Silicidation Induced Activation of Implanted Impurities (2007)
  • Author(s): T. Asano, M. Esaki and G. Nakagawa
  • Organizer: The 5th Int. Symp. on Control of Semiconductor Interfaces, pp.199-200.
  • Place of Presentation: 東京
  • Year and Date: 2007-11-13
• [Presentation] Nickel Metal Induced Lateral Crystallization of Patterned Amorphous Silicon Thin Film (2007)
  • Author(s): G. Nakagawa and T. Asano
  • Organizer: The 6th Pacific Rim Int. Conf. on Advanced Materials and Processing, S9-4-3
  • Place of Presentation: Jeju, Jeju Island, Korea
  • Year and Date: 2007-11-08
• [Presentation] Droplet Ejection Behavior in Electrostatic Inkjet Driving (2007)
  • Author(s): Y. Ishida, K. Sogabe, S. Kai and T. Asano
  • Organizer: The 20th Int. Microprocesses and Nanotechnology Conference
  • Place of Presentation: 京都
  • Year and Date: 2007-11-06
• [Presentation] Oriented Growth of Location-Controlled Si Crystal Grains Using Ni Nano-Imprint and Excimer Laser Annealing (2007)
  • Author(s): G. Nakagawa and T. Asano
  • Organizer: 2007 Int. Conf. on Solid State Devices and Materials
  • Place of Presentation: 茨城
  • Year and Date: 2007-09-20
• [Presentation] Application of Electrostatic Inkjet Printing to Ni-Nano-Particles Induced Crystallization of a-Si (2007)
  • Author(s): Y. Ishida, G. Nakagawa and T. Asano
  • Organizer: The 14th Int. Workshop on Active-Matrix Flatpanel Displays and Devices
  • Place of Presentation: 兵庫
  • Year and Date: 2007-07-13
• [Presentation] Characterization of Grain Boundary Effect on TFT Fabricated on Laterally Grown poly-Si Film (2007)
  • Author(s): T. Asano, K. Watanabe, K. Akiyama, G. Nakagawa and T. Kudo
  • Organizer: The 14th Int. Workshop on Active-Matrix Flatpanel Displays and Devices
  • Place of Presentation: 兵庫
  • Year and Date: 2007-07-12
• [Presentation] 静電型インクジェットによる微細液滴吐出とSi の金属誘起固相結晶化への応用 (2007)
  • Author(s): 石田雄二, 中川豪, 浅野種正
  • Organizer: 電子情報通信学会技術研究報告ED2007-2
  • Place of Presentation: 福岡
  • Year and Date: 2007-04-20
• [Presentation] Location and Orientation Control of Si Thin-Film Grains Using Metal Nano-Imprint Seeding of Laser Annealing (2007)
  • Author(s): T. Asano and G. Nakagawa
  • Organizer: The 3rd International TFT Conference
  • Place of Presentation: Rome, Italy.
  • Year and Date: 2007-01-25
• [Presentation] Inkjet Printing of Ni Nano-Size-Particles for Metal Induced Crystallization of Amorphous Si (2006)
  • Author(s): Y. Ishida, G. Nakagawa and T. Asano
  • Organizer: The 19th Int. Microprocesses and Nanotechnology Conference
  • Place of Presentation: 神奈川
  • Year and Date: 2006-10-26
• [Presentation] Inkjet-Printed Ni-Colloid Induced Crystallization of Amorphous Si (2006)
  • Author(s): Y. Ishida, G. Nakagawa and T. Asano
  • Organizer: The 13th Int. Workshop on Active-Matrix Flatpanel Displays and Devices
  • Place of Presentation: 東京
  • Year and Date: 2006-07-05
• [Presentation] Low Temperature Formation of Source and Drain Using Snow Plow Effect of Silicidation (2006)
  • Author(s): T. Asano, M. Esaki and G. Nakagawa
  • Organizer: The 13th Int. Workshop on Active-Matrix Flatpanel Displays and Devices
  • Place of Presentation: 東京
  • Year and Date: 2006-07-05
• [Presentation] Combination of Metal Nano-Imprint and Excimer Laser Annealing for Location Control of Si Thin-Film Grain (2006)
  • Author(s): G. Nakagawa and T. Asano
  • Organizer: 2006 Materials Research Society Symp. Vol.910, A20.5.
  • Place of Presentation: San Francisco, CA, USA.
  • Year and Date: 2006-04-20
• [Presentation] ダブルパルスレーザー走査法による多結晶Si結晶粒の横方向成長とTFT特性 (2006)
  • Author(s): 渡邉一徳, 江崎真彦, 中川豪, 浅野種正, 櫻木進, 工藤利雄
  • Organizer: 電子情報通信学会技術研究報告 ED2006-4
  • Place of Presentation: 福岡
  • Year and Date: 2006-04-17
• [Remarks]
  • URL: http://fed.ed.kyushu-u.ac.jp/index.html
• [Remarks]
  • URL: http://hyoka.ofc.kyushu-u.ac.jp/scarch/dctails/K002917/index.html