Novel electrochemical nanofabrication process for developing precise micro-chemical analytical systems

• Project/Area Number: 18360357
• Research Category: Grant-in-Aid for Scientific Research (B)
• Allocation Type: Single-year Grants
• Section: 一般
• Research Field: Material processing/treatments
• Research Institution: Waseda University
• Principal Investigator: HOMMA Takayuki Waseda University, 理工学術院, 教授 (80238823)
• Co-Investigator(Kenkyū-buntansha): 逢坂 哲彌 早稲田大学, 理工学術院, 教授 (20097249) ; 佐藤 裕崇 早稲田大学, 理工学術院, 助手 (90386607)
• Project Period (FY): 2006 – 2008
• Project Status: Completed (Fiscal Year 2008)
• Budget Amount: ¥13,520,000 (Direct Cost: ¥11,600,000、Indirect Cost: ¥1,920,000); Fiscal Year 2008: ¥4,290,000 (Direct Cost: ¥3,300,000、Indirect Cost: ¥990,000); Fiscal Year 2007: ¥4,030,000 (Direct Cost: ¥3,100,000、Indirect Cost: ¥930,000); Fiscal Year 2006: ¥5,200,000 (Direct Cost: ¥5,200,000)
• Keywords: ナノ加工 / 電気化学反応 / シリコンプロセス / MEMS / ナノ構造体 / 機能ナノ構造体

Research Abstract

金属析出やエッチングなど種々のナノ加工に適用される電気化学反応系を理論的・実験的手法により詳細に解析すると共に,その特徴を活かした新規なプロセスの開発を試みた.その結果,Si表面へサブμmサイズの微細リアクターアレイを形成できるプロセスを得るとともに,これを基にしたリアクター系の構築を実現した.さらに強磁性ナノドットアレイなど種々のシステムに適用可能な機能ナノ構造体の精密形成プロセスを確立した.

Research Products

• [Journal Article] Electrochemical Fabrication of CoPt Nanodot Arrays on Glass Disks by UV Nanoimprint Lithography (2009)
  • Author(s): T. Ouchi, Y. Arikawa, J. Mizuno, S. Shoji, T. Homma
  • Journal Title: Electrochem. Soc.Trans 16 (45) Pages: 57-62
• [Journal Article] Electrochemical Evaluation and Finite Element Structural Analysis of Si Wafer Surface under Mechanical Stress (2009)
  • Author(s): K. Sakata, T. Homma
  • Journal Title: Electrochem. Soc.Trans 16 (40) Pages: 79-84
• [Journal Article] Preparation of Electrodeposited Pt Nano Patterned Electrode using UV-Nano Imprint Lithography (2009)
  • Author(s): M. Saito, J. Mizuno, H. Nishikubo, H. Fujiwara, T. Homma
  • Journal Title: Electrochem. Soc.Trans 16 (25) Pages: 131-136
• [Journal Article] Raman Microscopy and Scanning Surface Potential Microscopy Analysis of Nanoscale Defects on Si Wafer Surfaces (2009)
  • Author(s): T. Homma, M. Kato, N. Kubo, K. Sakata, N. Kubo, M. Yanagisawa
  • Journal Title: J.Electrochem. Soc. 156
• [Journal Article] Effect of Cu Seed Layers on the Properties of Electroplated Sn-Cu Films (2009)
  • Author(s): M. Saito, H. Sasaki, K. Katou, T. Toba, T. Homma
  • Journal Title: J.Electrochem. Soc. 156
• [Journal Article] Characterization of the Surface Layer on Strained Si Wafer by Electrochemical Methods (2008)
  • Author(s): K. Sakata, M. Kato, N. Kubo, T. Senda, K. Izunome, T. Homma
  • Journal Title: J.Phys.Chem.C 112 Pages: 3785-3788
• [Journal Article] Estimation of Redox Potential of Strained Si by Density Functional Theory Calculation (2008)
  • Author(s): K. Sakata, S. Ishizaki, H. Nakai, T. Homma
  • Journal Title: J.Phys.Chem.C 112 Pages: 3104-3107
• [Journal Article] Fabrication of CoPt Magnetic Nanodot Arrays by Electrodeposition Process (2008)
  • Author(s): T. Ouchi, Y. Arikawa, T. Homma
  • Journal Title: J.Magn.Magn.Mater 320 Pages: 3104-3107
• [Journal Article] Fabrication of CoPt Magnetic Nanodot Arrays by Electrodeposition Process (2008)
  • Author(s): T. Ouchi, Y. Arikawa, T. Homma
  • Journal Title: J. Magn. Magn. Mater. 320 Pages: 3104-3107
  • Peer Reviewed
• [Journal Article] Nanoscopic and Electroohemioal characterization of Defects and strain at Si Wafer Surfaces (2008)
  • Author(s): T. Homma, K. Sakata, N. Kubo
  • Journal Title: Proo. Adv. Sci. Tech. Si Mat. 5 Pages: 32-36
  • Peer Reviewed
• [Journal Article] Fabrication of Catalyst-Functionalized Three-Dimensional Micromesh structures (2008)
  • Author(s): S. Keino, H. Sato, T. Homma, S. Shoji
  • Journal Title: Jpn. J. Appl. Phys. 47 Pages: 5204-5207
  • Peer Reviewed
• [Journal Article] Electrochemical Evaluation and Finite Element Structural Analysis of Si Wafer Surface Under Mechanical Stress (2008)
  • Author(s): K. Sakata, T. Homma
  • Journal Title: Electrochem. Soc. Trans. 16 Pages: 79-86
  • Peer Reviewed
• [Journal Article] Preparation of Electrodeposited Pt Nano Patterned Electrode using UV-Nano Imprinting Lithography (2008)
  • Author(s): M. Saito, J. Mizuno, H. Nishikubo, H. Fujiwara, T. Homma
  • Journal Title: Electroohem. Soc. Trans. 16 Pages: 131-136
  • Peer Reviewed
• [Journal Article] Characterization Of The Surface Layer On Strained Si Wafer By Electrochemical Methods (2008)
  • Author(s): K.Sakata, M.Kato, N.Kubo, T.Senda, K.Izunome, T.Homma
  • Journal Title: J.Phys.Chem.C 112 Pages: 3785-3788
  • Peer Reviewed
• [Journal Article] Estimation Of Redox Potential Of Strained Si By Density Functional Theory Calculation (2008)
  • Author(s): K.Sakata, S.Ishizaki, H.Nakai, T.Homma
  • Journal Title: J.Phys.Chem.C 112 Pages: 3538-3542
  • Peer Reviewed
• [Journal Article] Molecular Orbital Study on the Oxidation Mechanism of Hydrazine and Hydroxylamine as Reducing Agents for Electroless Deposition Process (2007)
  • Author(s): T. Shimada, A. Tamaki, H. Nakai, T. Homma
  • Journal Title: Electrochemistry 75 Pages: 45-49
  • NAID: 10018285935
• [Journal Article] Density Functional Theory Study on the Reaction Mechanism of Reductants for Electroless Ag Deposition Process (2007)
  • Author(s): T. Shimada, H. Nakai, T. Homma
  • Journal Title: J.Electrochem.Soc. 154
• [Journal Article] Self-aligned Formation of Nanoholes to Arrayed Micro Glass Tubes (2007)
  • Author(s): H. Sato, T. Yamaguchi, T. Isobe, T. Homma, S. Shoji
  • Journal Title: Electrochim. Acta 53 Pages: 200-204
• [Journal Article] Self-Aligned Formation Of Nano-Holes To Arrayed Micro Glass Tubes (2007)
  • Author(s): H.Sato, T.Yamaguchi, T.Isobe, T.Homma, S.Shoji
  • Journal Title: Electrochim.Acta 53 Pages: 200-204
  • Peer Reviewed
• [Journal Article] Molecular Orbital Study on the Oxidation Mechanism of Hydrazine and Hydroxylamine as Reducing Agents for Electroless Deposition Process (2007)
  • Author(s): T.Shimada, A.Tamaki, H.Nakai, T.Homma
  • Journal Title: Electrochemistry 75 Pages: 45-45
  • NAID: 10018285935
• [Journal Article] Density Functional Theory Study on the Reaction Mechanism of Reductants for Electroless Ag Deposition Process (2007)
  • Author(s): T.Shimada, H.Nakai, T.Homma
  • Journal Title: J.Electrochem.Soc. 154(印刷中)
• [Journal Article] Fabrication of High-Aspect-Ratio Arrayed Structures Using Si Electrochemical Etching (2006)
  • Author(s): H. Sato, T. Homma
  • Journal Title: Sci.Tech. of Adv.Mater 7 Pages: 468-474
• [Journal Article] Fabrication of High-Aspect-Ratio Arrayed Structures Using Si Electrochemical Etching (2006)
  • Author(s): H.Sato, T.Homma
  • Journal Title: Sci.Tech.of Adv.Mater. 7 Pages: 468-468
• [Presentation] Electrochemical Nanostructuring Processes for Fabricating Functional Surfaces (2009)
  • Author(s): T. Homma
  • Organizer: Trends in Nanoscience 2009
  • Place of Presentation: Irsee Germany
• [Presentation] Eleotroohemical nanostru Gturing processes for fabricating functional surfaces (2009)
  • Author(s): T. Homma
  • Organizer: Trends in Nanoscience 2009
  • Place of Presentation: Irsee, Germany
• [Presentation] 無電解めっきの還元剤酸化反応に対するチオ尿素作用機構のエネルギー密度解析による検討 (2009)
  • Author(s): 三重野顕, 中井浩巳, 本間敬之
  • Organizer: 表面技術協会第119回講演大会
  • Place of Presentation: 甲府
• [Presentation] 非平滑金属表面における次亜リン酸酸化反応機構の密度汎関数法による解析 (2009)
  • Author(s): 高橋奈々, 中井浩巳, 本間敬之
  • Organizer: 表面技術協会第119回講演大会
  • Place of Presentation: 甲府
• [Presentation] 無電解析出反応に対する鉛添加の影響の密度汎関数法による解析 (2009)
  • Author(s): 國本雅宏, 中井浩巳, 本間敬之
  • Organizer: 表面技術協会第119回講演大会
  • Place of Presentation: 甲府
• [Presentation] Electrochemical Characterization of Sputtered Silicon Anodized in Hydrofluoric Acid Solutions (2009)
  • Author(s): J. B. Ratchford, T. Homma
  • Organizer: 電気化学会第76回大会
  • Place of Presentation: 京都
• [Presentation] 走査プローブ顕微鏡を用いたひずみSOIウェハの表面の特性評価 (2009)
  • Author(s): 内田武夫, 阪田薫穂, M. Bibee, A. Mehta, p. Pianetta, 本間敬之
  • Organizer: 電気化学会第76回大会
  • Place of Presentation: 京都
• [Presentation] Si電解エッチングによる微細孔アレイ形成における孔密度制御 (2009)
  • Author(s): 川名功泰. 鵜澤健太郎, 大内隆成, 本間敬之
  • Organizer: 電気化学会第76回大会
  • Place of Presentation: 京都
• [Presentation] CoPt磁性ナノドツトアレイ形成におけるパターン微細化の検討 (2009)
  • Author(s): 久野泰伴, 有川勇輝, 林政平, 大内隆成, 水野潤, 庄子習一, 本間敬之
  • Organizer: 電気化学会第76回大会
  • Place of Presentation: 京都
• [Presentation] めっきプロセスを用いたナノギヤツプ電極の作製および分子ナノワイヤの特性評価 (2009)
  • Author(s): 石崎将士, 小林千秋, 阪田薫穂. 齋藤美紀子, 本間敬之
  • Organizer: 電気化学会第76回大会
  • Place of Presentation: 京都
• [Presentation] 歪みゲルマニウム表面におけるハロゲン種の反応に関する第-原理計算解析 (2009)
  • Author(s): 阪田薫穂, B. Magyari-K&ouml : pe, Y. Nishi, 本間敬之
  • Organizer: 電気化学会第76回大会
  • Place of Presentation: 京都
• [Presentation] めっき条件制御に伴うラテラル方向への成長形態変化に際する基板表面分子修飾の検討 (2009)
  • Author(s): 吉田脩平, 小林千秋, 石崎将士, 阪田薫穂, 齋藤美紀子, 本間敬之
  • Organizer: 電気化学会第76回大会
  • Place of Presentation: 京都
• [Presentation] Si陽極化成法によるナノ微細孔アレイ形成に及ぼす印加電圧の影響 (2008)
  • Author(s): 鵜澤 健太郎, 磯部 哲彦, 穐本 譲史, 本間 敬之
  • Organizer: 電気化学会第75回講演大会
  • Place of Presentation: 山梨
  • Year and Date: 2008-03-31
• [Presentation] Electrochemical Processes for Fabrication of Functional Microstructures (2008)
  • Author(s): T. Homma
  • Organizer: INTERFINISH 2008
  • Place of Presentation: Busan, Korea
• [Presentation] Fabrication of Magnetic Nanodot Arrays using Wet Processes (2008)
  • Author(s): T. Honma, T. Ouchi, Y. Arikawa
  • Organizer: ACEC2008
  • Place of Presentation: Taipei, Taiwan
• [Presentation] Fabrication of Ferromagnetic Nanodot Arrays by Electrochemical Processes (2008)
  • Author(s): T. Ouchi, Y. Arikawa, J. Mizuno, S. Shoji, T. Homma
  • Organizer: INTERFINISH2008
  • Place of Presentation: Busan, Korea
• [Presentation] Modeling of Electroless Deposition Process--Reaction Mechanism and Additive Effects-- (2008)
  • Author(s): T. Homma, M. Kunimoto, A. Mieno, H. Nakai
  • Organizer: EMNT2008
  • Place of Presentation: Ein Gedi, Israel
• [Presentation] 無電解析出反応におけるCu表面の触媒活性の理論計算による検討 (2008)
  • Author(s): 國本雅宏, 中井浩巳, 本間敬之
  • Organizer: 表面技術協会第118回講演大会
  • Place of Presentation: 大阪
• [Presentation] 無電解めっきの還元剤酸化反応に対するチオ尿素作用機構の密度汎関数法による解析 (2008)
  • Author(s): 三重野顕, 中井浩巳, 本間敬之
  • Organizer: 表面技術協会第118回講演大会
  • Place of Presentation: 大阪
• [Presentation] めっきプロセスによるナノギヤツプ電極の作製および評価 (2008)
  • Author(s): 石崎将士, 小林千秋, 阪田薫穂, 齋藤美紀子, 若山裕, 本間敬之
  • Organizer: 表面技術協会第118回講演大会
  • Place of Presentation: 大阪
• [Presentation] Eleotrochemioal evaluation and finite element structural analysis of Si wafer surface under echanical stress (2008)
  • Author(s): K. Sakata, T. Homma
  • Organizer: 214th Meeting of the Electrochemical Society
  • Place of Presentation: Hawaii, USA
• [Presentation] Preparation of Electrodeposited Pt Nano Patterned Electrode using UV-Nano Imprinting Lithography (2008)
  • Author(s): M. Saito J. Mizuno, H. Nishikubo, H. Fujiwara, T. Horana
  • Organizer: 214th Meeting of the Electrochemical Society
  • Place of Presentation: Hawaii, USA
• [Presentation] Electrochemical Synthesis of Metal Nano Particles Using Eleotrodeposited Pt Electrode with Nano Patterned Surface (2008)
  • Author(s): H. Nishikubo, H. Fujiwara, M. Saito, J. Mizuno, T. Homna
  • Organizer: 214th Meeting of the Electrochemical Society
  • Place of Presentation: Hawaii, USA
• [Presentation] Eleotrochemioal Fabrication of CoPt Nanodot Arrays on Glass Disks by UV Nanoimprint Lithography (2008)
  • Author(s): T. Ouohi, Y. Arikawa, J. Mizuno, S. Shoji, T. Homma
  • Organizer: 214th Meeting of the Eleotroohemioal Society
  • Place of Presentation: Hawaii, USA
• [Presentation] Theoretical analysis of the H2PO2- dehydrogenation in the eleotroless deposition process (2008)
  • Author(s): M. Kunimoto, H. Nakai, T. Homma
  • Organizer: lUMRS(International Union of Materials Research Societies)
  • Place of Presentation: Nagoya, Japan
• [Presentation] Size-oontrolled miorofabrioation of pore arrays to Si wafer surface (2008)
  • Author(s): K. Uzawa, N. Kawana, T. Ouohi, T. Homma
  • Organizer: lUMRS(International Union of Materials Research Societies)
  • Place of Presentation: Nagoya, Japan
• [Presentation] Enhancing Lateral Growth of Electrodeposition for Fabrication of Au Ultra Thin Films onto Non-Gonductive Surfaces (2008)
  • Author(s): C. Kobayashi, S. Yoshida, S. Ishizaki, K. Sakata, M. Saito, T. Homma
  • Organizer: lUMRS(International Union of Materials Research Societies)
  • Place of Presentation: Nagoya, Japan
• [Presentation] Fabrication of CoPt Magnetic Nanodot Arrays by Electrodeposition Process (2007)
  • Author(s): T. Ouchi, Y. Arikawa, T. Homma
  • Organizer: The 8th Perpendicular Magnetic Reeording Conference
  • Place of Presentation: Tokyo
  • Year and Date: 2007-10-16
• [Presentation] Si電解エッチングによる微細孔アレイ形成に及ぼす光照射条件の影響 (2007)
  • Author(s): 磯部 哲彦, 穐本 譲史, 鵜澤 健太郎, 本間 敬之
  • Organizer: 電気化学会2007秋季大会
  • Place of Presentation: 東京
  • Year and Date: 2007-09-19
• [Presentation] Hybrid orientation technology(HOT)ウェハにおける張り合わせ界面および表面での特性評価 (2007)
  • Author(s): 加藤 真裕, 阪田 薫穂, 本間 敬之, 仙田 剛士, 泉妻 宏治
  • Organizer: 電気化学会2007秋季大会
  • Place of Presentation: 東京
  • Year and Date: 2007-09-19
• [Presentation] ウェットプロセスによる強磁性ナノドットアレイ構造体の形成 (2007)
  • Author(s): 本間 敬之
  • Organizer: 表面技術協会第116回講演大会
  • Place of Presentation: 長崎
  • Year and Date: 2007-09-18
• [Presentation] Density Functional Theory Study on Electroless Deposition Processes (2007)
  • Author(s): T. Homma, T. Shimada, K. Endo, M. Kunimoto, H. Nakai
  • Organizer: 58th Meeting of International Society of Electrochemisty
  • Place of Presentation: Banff,Canada
  • Year and Date: 2007-09-11
• [Presentation] Electrochemical fabrication and modification processes for arrayed microstructures on Si wafer surfaces (2007)
  • Author(s): T. Homma, H. Sato, T. Yamaguchi, T. Isobe, T. Ouchi
  • Organizer: 211th Meeting of the Electrochemical Society
  • Place of Presentation: Chicago,IL,USA
  • Year and Date: 2007-05-08
• [Presentation] Density Functional Theory Study on Electroless Deposition Processes (2007)
  • Author(s): T. Homma, T. Shimada, K. Endo, M. Kunimoto, H. Nakai
  • Organizer: International Society of Electrochemisty
  • Place of Presentation: Banff, Canada
• [Presentation] Electrochemical Fabrication and Modification Processes for Arrayed Microstructures on Si Wafer Surfaces (2007)
  • Author(s): T. Homma, H. Sato, T. Yamaguchi, T. Isobe, T. Ouchi
  • Organizer: The Electrochemical Society
  • Place of Presentation: Chicago, USA
• [Book] Electrocrystallization in Nanotechnology -Electrochemical Fabrication of Arrayed Nanostructures- (2007)
  • Author(s): T. Homma, (G. Staikov, Eds.)
  • Publisher: Willey-VCH
• [Book] Electrocrystallization in Nanotechnology (Edited by G.Staikov) (2007)
  • Author(s): T.Homma(共著)
  • Total Pages: 279
  • Publisher: Wiley-VCH
• [Book] 図解 最先端表面処理技術のすべて(関東学院大学表面工学研究所編) (2006)
  • Author(s): 本間敬之(共著)
  • Total Pages: 323
  • Publisher: 工業調査会
• [Remarks]
  • URL: http://www.waseda-applchem.jp/lab/lab012.html
• [Patent(Industrial Property Rights)] マイクロリアクタの製造方法 (2009)
  • Inventor(s): 本間敬之, 庄子習一, 逢坂哲彌, 佐藤裕崇
  • Industrial Property Rights Holder: 早稲田大学
  • Filing Date: 2009-08-14
• [Patent(Industrial Property Rights)] 電極、金属微粒子の製造装置および金属微粒子の製造方法 (2007)
  • Inventor(s): 本間敬之, 齋藤美紀子, 水野潤, 原田琢也, 藤原英道
  • Industrial Property Rights Holder: 早稲田大学, 古河電気工業 (株)
  • Patent Publication Number: 2007-327117
  • Filing Date: 2007-12-20
• [Patent(Industrial Property Rights)] 相分離を利用した分離相, ナノ構造素子及びナノ構造体の製造方法 (2006)
  • Inventor(s): 宇野岳夫, 藤原英道, 本間敬之, 斎藤美紀子
  • Industrial Property Rights Holder: 早稲田大学, 古河電気工業 (株)
  • Patent Publication Number: 2006-249535
  • Filing Date: 2006-09-21