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Crystal with Metal-Insulator Transition by Plasma Processing Technique and Its Application to Switching Devices

Research Project

Project/Area Number 18540495
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeSingle-year Grants
Section一般
Research Field Plasma science
Research InstitutionTokai University

Principal Investigator

OKIMURA Kunio  Tokai University, School of Information Technology and Electronics, Professor (00194473)

Co-Investigator(Kenkyū-buntansha) SHINDO Haruo  Tokai University, School of Information Technology and Electronics, Professor (20034407)
Project Period (FY) 2006 – 2007
Project Status Completed (Fiscal Year 2007)
Budget Amount *help
¥3,610,000 (Direct Cost: ¥3,400,000、Indirect Cost: ¥210,000)
Fiscal Year 2007: ¥910,000 (Direct Cost: ¥700,000、Indirect Cost: ¥210,000)
Fiscal Year 2006: ¥2,700,000 (Direct Cost: ¥2,700,000)
Keywordsvanadium dioxide / ICP-assisted sputtering / epitaxial growth / metal-insulator transition / resistive change / switching phenomenon / planer structure / stoichiometry / ププラズマプロセス / ICP支援スパッタ装置
Research Abstract

In this project, we deposited vanadium dioxide (V0_2) films on Al_2O_3 substrates with metal-insulator transition (MIT) by using inductively coupled plasma (ICP)-assisted sputtering technique. In addition, we tried to fabricate a new switching device utilizing VO_2 film with MIT.
First, we found that by selecting oxygen flow rate proper value compared to flow rate of Ar gas we can deposit stoichiometric film with MIT. Films under adequate conditions revealed MIT with three orders change in resistivity at temperature around 340 K. It was shown that this MIT is caused by crystalline structural transition from monoclinic phase to tetragonal phase through XRD analyses.
Next, we fabricated a device of VO_2 with two terminal metal electrodes. We observed current jump phenomena by applying voltage to this device. We call this electric field-induced metal-insulator transition. When we decreased gap length between the two electrodes, threshold voltage that can trigger the electric field-induced MIT decreased. Thus we can control resistance change in this device by changing electrodes gap length.
Finally, we fabricated two kinds of planar type devices with dimensions of the electrode gap of 5 μm and the electrode of 1500 μm and 10 μm /10 μm (electrodes gap /electrode width). In these devices, we observed fast resistance change phenomena within 200 ns. Low threshold voltage of 2 V was achieved in the former device, while large resistance ratio was achieved in the latter.
Switching phenomena revealed in this project offer great interests not only in applications of VO_2 based planar device to functional electronic devices such as switching and memory devices but also in discussion on physical mechanism of switching phenomenon in oxide material with strong correlation.

Report

(3 results)
  • 2007 Annual Research Report   Final Research Report Summary
  • 2006 Annual Research Report
  • Research Products

    (25 results)

All 2008 2007 2006

All Journal Article (17 results) (of which Peer Reviewed: 7 results) Presentation (7 results) Patent(Industrial Property Rights) (1 results)

  • [Journal Article] Advantages of Inductively Coupled Plasma-Assisted Sputtering for Preparation of Ctoichiometric VO_2 films with Metal-Insulator Transition2008

    • Author(s)
      Yusuke Nihei, Yusuke Sasakawa and Kunio Okimura
    • Journal Title

      Thin Solid Films Vol.516

      Pages: 3572-3576

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2007 Final Research Report Summary
    • Peer Reviewed
  • [Journal Article] Advantages of Inductively Coupled Plasma -Assisted Sputtering for Preparation of Stoichiometric V0_2 films with Metal-Insulator Transition2008

    • Author(s)
      Yusuke, Nihei, Yusuke, Sasakawa, Kunio, Okimura
    • Journal Title

      Thin Solid Films Vol. 516

      Pages: 3572-3576

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2007 Final Research Report Summary
  • [Journal Article] Advantages of Inductively Coupled Plasma -Assisted Sputtering for Preparation of Stoichiometric VO_2 films with Metal Insulator Transition2008

    • Author(s)
      Y.Nihei, Y.Sasakawa and K.Okimura
    • Journal Title

      Thin Solid Films (On-line)

    • Related Report
      2007 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Time-dependent Characteristics of Electric Field-Induced Metal-Insulator Transition of Planer VO_2/Al_2O_3 Structure2007

    • Author(s)
      Kunio Okimura and J Sakai
    • Journal Title

      Japanese Journal of Applied Physics Vol.46,No.34

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2007 Final Research Report Summary
    • Peer Reviewed
  • [Journal Article] Growth of VO_2 films wtih metal-insulator transition on silicon substrates in inductively coupled plasma-assisted sputtering2007

    • Author(s)
      Kunio Okimura and N.Kubo
    • Journal Title

      Thin Solid Films Vol.515

      Pages: 4992-4995

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2007 Final Research Report Summary
    • Peer Reviewed
  • [Journal Article] Electric Field Induced Metal-Insulator Transition of Vanadium Dioxide Films on Sapphire Substrate Prepared by Inductively Coupled Plasma-Assisted Sputtering2007

    • Author(s)
      Kunio Okimura, Yusuke Nihei and Yusuke Sasakawa
    • Journal Title

      Solid State Phenomena Vols.123-126

      Pages: 703-706

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2007 Final Research Report Summary
    • Peer Reviewed
  • [Journal Article] Time-dependent Characteristics of Electric Field-Induced Metal-Insulator Transition of Planer VO_2 /Al_2O_3 Structure2007

    • Author(s)
      Kunio, Okimura, J, Sakai
    • Journal Title

      Japanese Journal of Applied Physics Vol. 46, No. 34

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2007 Final Research Report Summary
  • [Journal Article] Growth of V0_2 films with metal-insulator transition on silicon substrates in inductively coupled plasma -assisted sputtering2007

    • Author(s)
      Kunio, Okimura, N., Kubo
    • Journal Title

      Thin Solid Films Vol. 515

      Pages: 4992-4995

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2007 Final Research Report Summary
  • [Journal Article] Electric Field Induced Metal-Insulator Transition of Vanadium Dioxide Films on Sapphire Substrate Prepared by Inductively Coupled Plasma-Assisted Sputtering2007

    • Author(s)
      Kunio, Okimura, Yusuke, Nihei, Yusuke, Sasakawa
    • Journal Title

      Solid State Phenomena Vol. 124-126

      Pages: 703-706

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2007 Final Research Report Summary
  • [Journal Article] Time-dependent Characteristics of Electric Field-Induced Metal-Insulator Transition of Planer VO_2/Al_2O_3 Structure2007

    • Author(s)
      K.Okimura and J.Sakai
    • Journal Title

      Japanese Journal of Applied Physics Vol.46,No.34

    • Related Report
      2007 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Growth of VO_2 films with metal-insulator transition on silicon substrates in inductively coupled plasma-assisted sputtering2007

    • Author(s)
      K.Okimura, N.Kubo
    • Journal Title

      Thin Solid Films Vol.515

      Pages: 4992-4995

    • Related Report
      2006 Annual Research Report
  • [Journal Article] Electric Field Induced Metal-Insulator Transition of Vanadium Dioxide Films on Sapphire Substrate Prepared by Inductively Coupled Plasma-Assisted Sputtering2007

    • Author(s)
      K.Okimura, Y.Nihei, Y.sasakawa
    • Journal Title

      Solid State Phenomena Vols.124-126

      Pages: 703-706

    • Related Report
      2006 Annual Research Report
  • [Journal Article] X-ray Diffraction Study of Electric Field-Induced Metal-Insulator Transition of Vanadium Dioxide Film on Sapphire Substrate2006

    • Author(s)
      Kunio Okimura, Yusuke Sasakawa and Yusuke Nihei
    • Journal Title

      Japanese Jouranl of Applied Physics Vol.45,No.12

      Pages: 9200-9202

    • NAID

      40015182135

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2007 Final Research Report Summary
    • Peer Reviewed
  • [Journal Article] X-ray Diffraction Study of Electric Field-Induced Metal-Insulator Transition of Vanadium Dioxide Film on Sapphire Substrate2006

    • Author(s)
      Kunio, Okimura, Yusuke, Sasakawa, Yusuke, Nihei
    • Journal Title

      Japanese Journal of Applied Physics Vol. 45, No. 12

      Pages: 9200-9202

    • NAID

      40015182135

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2007 Final Research Report Summary
  • [Journal Article] X-ray Diffraction Study of Electric Field-Induced Metal-Insulator Transition of Vanadium Dioxide Film on Sapphire Substrate2006

    • Author(s)
      K.Okimura, Y.Sasakawa, Y.Nihei
    • Journal Title

      Japanese Journal of Applied Physics Vol.45

      Pages: 9200-9202

    • NAID

      40015182135

    • Related Report
      2006 Annual Research Report
  • [Journal Article] Advantages of Inductively Coupled Plasma-Assisted Sputtering for Preparation of Stoichiometric VO_2 Films with Metal-Insulator Transition2006

    • Author(s)
      Y.Nihei, Y.Sasakawa, K.Okimura
    • Journal Title

      Proceedings of 6^<th> International Symposium on Dry Process

      Pages: 117-118

    • Related Report
      2006 Annual Research Report
  • [Journal Article] Epitaxial Growth of Conductive Anatase TiO_2 : Nb Films on SrTiO_3 Substrate by Reactive Sputtering2006

    • Author(s)
      J.Takayama, K.Okimura
    • Journal Title

      Proceedings of 6^<th> International Symposium on Dry Process

      Pages: 269-270

    • Related Report
      2006 Annual Research Report
  • [Presentation] Electric Field Induced Fast Switching Phenomena of Vanadium Dioxide (VO_2) on Sapphire Substrate2007

    • Author(s)
      Nurul Ezreena Mohamad, Yusuke Sasakawa, Yusuke Nihei and Kunio Okimura
    • Organizer
      Malaysia-Japan International Symposium On Advanced Technology 2007 (MJISAT)
    • Place of Presentation
      Kuararunpul,Malaysia
    • Year and Date
      2007-11-14
    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2007 Final Research Report Summary
  • [Presentation] Electric Field Induced Fast Switching Phenomena of Vanadium Dioxide(VO_2) on Sapphire Substrate2007

    • Author(s)
      Nurul Ezreena, Yusuke Sasakawa, Yusuke Nihei and Kunio Okimura
    • Organizer
      Malaysia-Japan International Symposium On Advanced Technology 2007
    • Place of Presentation
      Malaysia,Kuala Lumpur
    • Year and Date
      2007-11-14
    • Related Report
      2007 Annual Research Report
  • [Presentation] Electric Field Induced Fast Switching Phenomena of Vanadium Dioxide(V0_2) on Sapphire Substrate2007

    • Author(s)
      Ezreena, Mohamad, Yusuke Sasakawa, Yusuke Nihei, Kunio, Okimura
    • Organizer
      Malaysia-Japan International Symposium On Advanced Technology 2007(MJISAT)
    • Place of Presentation
      Kuararunpul, Malaysia
    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2007 Final Research Report Summary
  • [Presentation] Expitaxial Growth of Conductive Anatase TiO_2:Nb Films on SrTiO_3 Substrate by Reactive Sputtering2006

    • Author(s)
      Jun Takayama and Kunio Okimura
    • Organizer
      6th International Symposium on Dry Process
    • Place of Presentation
      Nagoya,Japan
    • Year and Date
      2006-11-30
    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2007 Final Research Report Summary
  • [Presentation] X-ray Diffraction Study on Electric field induced Metal-Insulator Transition of Vanadium Dioxide Films on Sapphire Substrate Prepared by Reactive Sputtering2006

    • Author(s)
      Yusuke Sasakawa and Kunio Okimura
    • Organizer
      Kyoto Conference on Solid State Chemistry, Transition Metal Oxides Past, Present and Future
    • Place of Presentation
      Kyoto,Japan
    • Year and Date
      2006-11-12
    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2007 Final Research Report Summary
  • [Presentation] X-ray Diffraction Study on Electric field induced Metal-Insulator Transition of Vanadium Dioxide Films on Sapphire Substrate Prepared by Reactive Sputtering2006

    • Author(s)
      Yusuke, Sasakawa, Kunio, Okimura
    • Organizer
      Kyoto Conference on Solid State Chemistry, Transition Metal Oxides Past, Present and Future
    • Place of Presentation
      Kyoto
    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2007 Final Research Report Summary
  • [Presentation] Epitaxial Growth of Conductive Anatase TiO_2 : Nb Films on SrTiO_3 Substrate by Reactive Sputtering2006

    • Author(s)
      Jun, Takayama, Kunio, Okimura
    • Organizer
      6th International Symposium on Dry Process
    • Place of Presentation
      Nagoya
    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2007 Final Research Report Summary
  • [Patent(Industrial Property Rights)] メモリー素子の製造方法およびメモリー素子2007

    • Inventor(s)
      沖村邦雄, 笹川裕介
    • Industrial Property Rights Holder
      学校法人東海大学
    • Industrial Property Number
      2007-038800
    • Filing Date
      2007-02-20
    • Related Report
      2006 Annual Research Report

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Published: 2006-04-01   Modified: 2016-04-21  

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