| Project/Area Number |
18560021
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| Research Category |
Grant-in-Aid for Scientific Research (C)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Thin film/Surface and interfacial physical properties
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| Research Institution | Kagawa University |
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Principal Investigator |
TAKAHASHI Naoshi Kagawa University, Faculty of Education, Associate Professor (80325307)
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| Co-Investigator(Kenkyū-buntansha) |
MIYAGAWA Hayato Kagawa Univ, Faculty of Engineer, Assistant Professor (00380197)
OHURA Miyuki Kagawa Univ, Faculty of Education, Research Assistant (70346625)
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| Project Period (FY) |
2006 – 2007
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| Project Status |
Completed (Fiscal Year 2007)
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| Budget Amount *help |
¥3,700,000 (Direct Cost: ¥3,400,000、Indirect Cost: ¥300,000)
Fiscal Year 2007: ¥1,300,000 (Direct Cost: ¥1,000,000、Indirect Cost: ¥300,000)
Fiscal Year 2006: ¥2,400,000 (Direct Cost: ¥2,400,000)
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| Keywords | surface / interface / semiconductor |
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| Research Abstract |
We tried to investigate electron and spin state, and changing of Fermi level concerning to surface material (for example iron, nickel) and its thickness of ferro-magnetic layer (and/or multi layer), that are grown on semiconductor surface of negative electron affinity (NEA). At first we modified the pumping power of a MBE vacuum chamber by installing ion-pump, and then modified the sample manipulation system. After achieving a good vacuum condition we grew several types of samples with iron and/or Dy and its compound with gallium-arsenide. During the growth we monitored the surface condition with the reflection high electron energy diffraction (RHEED) and after the growth half of samples were checked the x-ray diffraction (XRD) and the transmission electron microscope (TEM). (A part of these work were published) For the rest of samples, we chose amorphous arsenic cap to keep the condition of the surface even after taking out of the vacuum chamber. To investigate the surface electron state and Fermi level, we employed the photoelectron spectroscopy with several photon energy from synchrotron radiation facility in Tosu (Saga Light Centre). Spectrum analysis from these samples is undergoing. Through this work, we established an easy and reliable method of arsenic capping in the MBE chamber, that were also checked by photoelectron spectroscopy because we could see clear evidence of clean surface after removing the arsenic capping layer by heat decapping.
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