• Search Research Projects
  • Search Researchers
  • How to Use
  1. Back to previous page

Preparation of electrochemically active hydrate and hydroxide thin films by sputtering

Research Project

Project/Area Number 18560297
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeSingle-year Grants
Section一般
Research Field Electronic materials/Electric materials
Research InstitutionKitami Institute of Technology

Principal Investigator

ABE Yoshio  Kitami Institute of Technology, Faculty of Engineering, Department of Materials Science, Professor (20261399)

Co-Investigator(Kenkyū-buntansha) SASAKI Katsutaka  Kitami Institute of Technology, Faculty of Engineering Department of Materials Science, Professor (80091552)
KAWAMURA Midori  Kitami Institute of Technology, Faculty of Engineering Department of Materials Science, Associate Professor (70261401)
Project Period (FY) 2006 – 2007
Project Status Completed (Fiscal Year 2007)
Budget Amount *help
¥3,010,000 (Direct Cost: ¥2,800,000、Indirect Cost: ¥210,000)
Fiscal Year 2007: ¥910,000 (Direct Cost: ¥700,000、Indirect Cost: ¥210,000)
Fiscal Year 2006: ¥2,100,000 (Direct Cost: ¥2,100,000)
Keywordsreactive sputtering / hydrated Ta_2O_5 thin film / NiOOH thin film / solid-electrolyte / electrochromic / Ta_2O_5固体電解質 / 水和酸化物 / 水酸化物 / 固体電解質薄膜 / 電気化学 / スーパーキャパシタ
Research Abstract

Hydrated Ta_2O_5 is a proton-conducting solid-electrolyte and Ni oxyhydroxide (NiOOH) is an electrochromic (EC) material. Thin films of hydrated Ta_2O_5 and NiOOH were prepared by reactive sputtering, which is one of the most widely used dry processing methods.
1) A Ta metal target was reactively sputtered using H_2O as a reactive gas. Substrate temperature was cooled to -20℃ during sputtering to decrease the desorption of H_2O molecules from the films surface. The amount of hydrogen atoms incorporated into the Ta_2O_5 films was estimated by Ratherford Back Scattering (RBS) and Hydrogen Forward Scattering (HFS). It is found that hydrogen content in the Ta_2O_5 films increased with decreasing substrate temperature and a maximum H/Ta atomic ratio of 2.2 was obtained at a substrate temperature of -20℃. The film density was found to decrease with decreasing substrate temperature by X-ray Reflectivity (XRR) measurement. Corresponding to the increase of the hydrogen content and the decrease of film density, the ion-conductivity of the Ta_2O_5 films increased and a maximum ion-conductivity of 4x10^<-8> S/cm was obtained at a substrate temperature of -20℃.
2) A Ni metal target was reactively sputtered using O_2+H_2O mixed gas, and the formation of NiOOH thin films was confirmed at H_2O flow ratios above 5% by Fourier Transform Infrared Spectroscopy (FTIR). EC properties of the NiOOH thin films were studied in a KOH aqueous electrolyte and a coloration efficiency of approximately 30 cm^2/C was obtained.
3) All-solid-state reflective-type EC devices were fabricated using the hydrated Ta_2O_5 solid-electrolyte and the NiOOH EC layers, and reflectance change of 5:1 was obtained.
From these results, it is clarified that hydrate and hydroxide thin films can be prepared by the sputtering method. In the future, we will search for new solid electrolyte materials with high-ion-conductivity and develop high-performance thin-film-electrochemical-devices.

Report

(3 results)
  • 2007 Annual Research Report   Final Research Report Summary
  • 2006 Annual Research Report
  • Research Products

    (22 results)

All 2008 2007 Other

All Journal Article (6 results) (of which Peer Reviewed: 3 results) Presentation (16 results)

  • [Journal Article] Ion conducting Properties of Hydrogen-Containing Ta_2O_5 Thin Films Prepared by Reactive Sputtering2008

    • Author(s)
      Y. Abe, N. Itadani, M. Kawamura, K. Sasaki, H. Itoh
    • Journal Title

      Vacuum (掲載決定)

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2007 Final Research Report Summary
    • Peer Reviewed
  • [Journal Article] Ion conducting Properties of Hydrogen-Containing Ta_2O_5 Thin Films Prepared by Reactive Sputtering2008

    • Author(s)
      Y. Abe, N. Itadani, M. Kawamura, K. Sasaki, H. Itoh
    • Journal Title

      Vacuum (掲載决定)

    • Related Report
      2007 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Preparation of Hydrogen-Containing Ta_2O_5 Thin Films by Reactive Sputtering Using O_2+H_2O Mixed Gas2007

    • Author(s)
      Y. Abe, N. Itadani, M. Kawamura, K. Sasaki, H. Itoh
    • Journal Title

      Japanese Journal of Applied Physics 46

      Pages: 777-779

    • NAID

      10018545797

    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2007 Final Research Report Summary
    • Peer Reviewed
  • [Journal Article] Preparation of hydrogen-containing Ta_2O_5 thin films by reactive sputtering using 0_2+H_2O mixed gas2007

    • Author(s)
      Y. Abe, N. Itadani, M. Kawamura, K. Sasaki, H. Itoh
    • Journal Title

      Japanese Journal of Applied Physics vol.46

      Pages: 777-779

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2007 Final Research Report Summary
  • [Journal Article] Preparation of Hydrogen-Containing Ta_2O_5 Thin Films by Reactive Sputtering Using O_2+H_2O Mixed Gas2007

    • Author(s)
      Y.Abe, N.Itadani, M.Kawamura, K.Sasaki, H.Itoh
    • Journal Title

      Japanese Journal of Applied Physics 46・2

      Pages: 777-779

    • NAID

      10018545797

    • Related Report
      2006 Annual Research Report
  • [Journal Article] Ion conducting properties of hydrogen-containing Ta_2O_5 thin films prepared by reactive sputtering

    • Author(s)
      Y. Abe, N. Itadani, M. Kawamura, K. Sasaki, H. Itoh
    • Journal Title

      Vacuum (In press)

    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2007 Final Research Report Summary
  • [Presentation] Ion conducting properties of hydrogen-containing Ta_2O_5 thin films prepared by reactive sputtering2008

    • Author(s)
      Y. Abe, N. Itadani, M. Kawamura, K. Sasaki, H. Itoh
    • Organizer
      The 9th International Symposium on Sputtering and Plasma Processes
    • Place of Presentation
      Kanazawa
    • Year and Date
      2008-06-07
    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2007 Final Research Report Summary
  • [Presentation] Effects of substrate cooling on the ionic conductivity of Ta_2O_5 solid-electrolyte thin films prepared by reactive sputtering using H_2O gas2008

    • Author(s)
      Y. Abe, F. Peng, Y. Takiguchi, M. Kawamura, K. Sasaki, H. Itoh, T. Suzuki
    • Organizer
      The 213th Meeting of the Electrochemical Society
    • Place of Presentation
      Phoenix (USA)
    • Year and Date
      2008-05-20
    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2007 Final Research Report Summary
  • [Presentation] 水素添加Ta_2O_5スパッタ薄膜のイオン伝導性に対する膜中水素量の影響2008

    • Author(s)
      彭〓、滝口康弘、阿部良夫、川村みどり、佐々木克孝、伊藤英信、鈴木勉
    • Organizer
      第55回応用物理学関係連合講演会
    • Place of Presentation
      船橋市
    • Year and Date
      2008-03-29
    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2007 Annual Research Report 2007 Final Research Report Summary
  • [Presentation] Effects of hydrogen content in Ta_2O_5 thin films on their ion conductivity2008

    • Author(s)
      F. Peng, Y. Takiguchi, Y. Abe, M. Kawamura, K. Sasaki, H. Itoh, T. Suzuki
    • Organizer
      The 55th Spring Meeting of the Japan Society of Applied Physics and Related Societies
    • Place of Presentation
      Funabashi
    • Year and Date
      2008-03-29
    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2007 Final Research Report Summary
  • [Presentation] 水素添加Ta_2O_5スパッタ薄膜のイオン伝導性に及ぼす基板温度の影響2008

    • Author(s)
      滝口康弘、彭〓、阿部良夫、佐々木克孝、川村みどり、伊藤英信、鈴木勉
    • Organizer
      三学協会北海道支部会
    • Place of Presentation
      札幌市
    • Year and Date
      2008-01-30
    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2007 Annual Research Report 2007 Final Research Report Summary
  • [Presentation] Effects of substrate temperature on the ion-conducting properties of hydrogen-containing Ta_2O_5 thin films2008

    • Author(s)
      Y. Takiguchi, F. Peng, Y. Abe, K. Sasaki, M. Kawamura, H. Itoh, T. Suzuki
    • Organizer
      Hokkaido Branch Meeting of the Electrochemical Society of Japan, Japan Society of Corrosion Engineering, and the Surface Finishing Society of Japan
    • Place of Presentation
      Sapporo
    • Year and Date
      2008-01-30
    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2007 Final Research Report Summary
  • [Presentation] Electrochromic Devices Based on Nickel Oxyhydroxide Thin Film2007

    • Author(s)
      H. Ueta, Y. Abe, F. Peng, K. Kato, M. Kawamura, K. Sasaki, H. Itoh
    • Organizer
      The 14th International Display Workshops
    • Place of Presentation
      札幌市
    • Year and Date
      2007-12-05
    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2007 Annual Research Report 2007 Final Research Report Summary
  • [Presentation] Electrochromic devices based on nickel oxyhydroxide thin film2007

    • Author(s)
      H. Ueta, Y. Abe, F. Peng, K. Kato, M. Kawamura, K. Sasaki, H. Itoh
    • Organizer
      The 14th International Display Workshops
    • Place of Presentation
      Sapporo
    • Year and Date
      2007-12-05
    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2007 Final Research Report Summary
  • [Presentation] Nickel Oxyhydroxide Thin Films Prepared by Reactive Sputtering UsingO_2+H_2O Mixed Gas2007

    • Author(s)
      H. Ueta, Y. Abe, K. Kato, M. Kawamura, K. Sasaki, H. Itoh
    • Organizer
      The 212th Meeting of the Electrochemical Society
    • Place of Presentation
      アメリカ合衆国、ワシントン
    • Year and Date
      2007-10-08
    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2007 Final Research Report Summary
  • [Presentation] Nickel oxyhydroxide thin films prepared by reactive sputtering using O_2+H_2O mixed gas2007

    • Author(s)
      H. Ueta, Y. Abe, K. Kato, M. Kawamura, K. Sasaki, H. Itoh
    • Organizer
      The 212th Meeting of the Electrochemical Society
    • Place of Presentation
      Washington DC (USA)
    • Year and Date
      2007-10-08
    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2007 Final Research Report Summary
  • [Presentation] Nickel Oxyhydroxide Thin Films Prepared by Reactive Sputtering Using O_2+H_2O Mixed Gas2007

    • Author(s)
      H. Ueta, Y. Abe, K. Kato, M. Kawamura, K. Sasaki, H. Itoh
    • Organizer
      The 212th Meeting of The Electrochemical Society
    • Place of Presentation
      アメリカ合衆国、ワシントン
    • Year and Date
      2007-10-08
    • Related Report
      2007 Annual Research Report
  • [Presentation] Effects of Substrate Temperature on Hydrogen Content of Ta_2O_5 Thin Films Prepared by Reactive Sputtering in an Atmosphere of Water Vapor2007

    • Author(s)
      F. Peng Y. Abe, M. Kawamura, K. Sasaki, H. Itoh, T. Suzuki
    • Organizer
      第68回応用物理学会学術講演会
    • Place of Presentation
      札幌市
    • Year and Date
      2007-09-07
    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2007 Annual Research Report 2007 Final Research Report Summary
  • [Presentation] 水蒸気を用いた反応性スパッタリングによるオキシ水酸化ニッケル薄膜の作製2007

    • Author(s)
      上田英明、阿部良夫、川村みどり、加藤清彦、佐々木克孝
    • Organizer
      第68回応用物理学会学術講演会
    • Place of Presentation
      札幌市
    • Year and Date
      2007-09-07
    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2007 Annual Research Report 2007 Final Research Report Summary
  • [Presentation] Effects of substrate temperature on hydrogen content of Ta_2O_5 thin films prepared by reactive sputtering in an atmosphere of water vapor2007

    • Author(s)
      F. Peng Y. Abe, M. Kawamura, K. Sasaki, H. Itoh, T. Suzuki
    • Organizer
      The 68 the Autumn Meeting of the Japan Society of Applied Physics
    • Place of Presentation
      Sapporo
    • Year and Date
      2007-09-07
    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2007 Final Research Report Summary
  • [Presentation] Nickel oxyhydroxide thin films prepared by reactive sputtering using water vapor2007

    • Author(s)
      H. Ueta, Y. Abe, M. Kawamura, K. Kato, K. Sasaki
    • Organizer
      The 68 the Autumn Meeting of the Japan Society of Applied Physics
    • Place of Presentation
      Sapporo
    • Year and Date
      2007-09-07
    • Description
      「研究成果報告書概要(欧文)」より
    • Related Report
      2007 Final Research Report Summary
  • [Presentation] Ion conducting Properties of Hydrogen-Containing Ta_2O_5 Thin Films Prepared by Reactive Sputtering2007

    • Author(s)
      Y. Abe, N. Itadani, M. Kawamura, K. Sasaki, H. Itoh
    • Organizer
      The 9th International Symposium on Sputtering and Plasma Processes
    • Place of Presentation
      金沢市
    • Year and Date
      2007-06-07
    • Description
      「研究成果報告書概要(和文)」より
    • Related Report
      2007 Annual Research Report 2007 Final Research Report Summary

URL: 

Published: 2006-04-01   Modified: 2016-04-21  

Information User Guide FAQ News Terms of Use Attribution of KAKENHI

Powered by NII kakenhi