| Budget Amount *help |
¥50,180,000 (Direct Cost: ¥38,600,000、Indirect Cost: ¥11,580,000)
Fiscal Year 2009: ¥3,380,000 (Direct Cost: ¥2,600,000、Indirect Cost: ¥780,000)
Fiscal Year 2008: ¥9,230,000 (Direct Cost: ¥7,100,000、Indirect Cost: ¥2,130,000)
Fiscal Year 2007: ¥37,570,000 (Direct Cost: ¥28,900,000、Indirect Cost: ¥8,670,000)
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| Research Abstract |
The liquid phase deposition (LPD) of metal oxide thin films at the liquid-liquid interface was investigated. Just after the start of the LPD reaction, depositions were observed continually at the liquid-liquid interface. The deposition grew two-dimensionally into a self-standing film with thickness of 1・m and domain size of up to ca. 1mm without any solid substrates. The self-standing film was formed with asymmetrical morphology, which consisted of flat surface on the side of the liquid-liquid interface and relatively rough surface on the side of the bulk solution. The structure was characterized by Raman spectroscopy, confirming that metastable ammonium titanium oxide fluoride (NH_4TiOF_3) was first deposited at the liquid-liquid interface, on which anatase-type titanium oxide (TiO_2) was deposited second to forming the asymmetrical bilayer structure.
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