| Project/Area Number |
19360056
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| Research Category |
Grant-in-Aid for Scientific Research (B)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Production engineering/Processing studies
|
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| Research Institution | Ibaraki University |
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Principal Investigator |
ZHOU Libo Ibaraki University, 工学部, 教授 (90235705)
|
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| Co-Investigator(Kenkyū-buntansha) |
SHIMIZU Jun 茨城大学, 工学部, 准教授 (40292479)
OJIMA Hirotaka 茨城大学, 工学部, 講師 (90375361)
YAMAMOTO Takeyuki 茨城大学, 工学部, 技術専門職員 (40396594)
江田 弘 茨城大学, 工学部, 教授 (60007995)
|
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| Co-Investigator(Renkei-kenkyūsha) |
KAMIYA Sumio , トヨタ自動車・第2機能材料部, 担当部長
IWASE Hisao , トヨタ自動車・第2機能材料部
YAMASHITA Teruki , トヨタ自動車・第2機能材料部
TASHIRO Yoshiaki 東京ダイヤモンド工具製作所, 技術部
TIAN Yebin 茨城大学, VBL, 非常勤研究員
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| Project Period (FY) |
2007 – 2009
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| Project Status |
Completed (Fiscal Year 2009)
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| Budget Amount *help |
¥20,150,000 (Direct Cost: ¥15,500,000、Indirect Cost: ¥4,650,000)
Fiscal Year 2009: ¥2,860,000 (Direct Cost: ¥2,200,000、Indirect Cost: ¥660,000)
Fiscal Year 2008: ¥2,470,000 (Direct Cost: ¥1,900,000、Indirect Cost: ¥570,000)
Fiscal Year 2007: ¥14,820,000 (Direct Cost: ¥11,400,000、Indirect Cost: ¥3,420,000)
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| Keywords | キーワード / エタロン / 単結晶シリコン / 極薄ウエハ / CMG / 化学・機械融合加工 / 分散補償器 / 平坦度 / 加工変質層 |
|---|
| Research Abstract |
Si based etalon is a core element of tunable dispersion compensator for ultra high-speed optical communication, which demands both high geometrical accuracy and high surface integrity. Aiming at establishing manufacturing technology to fulfill such application, this research has developed a one-stop grinding system by full use of the advantage of CMG. After optimizations of CMG wheel and process, it was successful to thin 8 inch Si wafer down to 15μm with GBIR<0.3μm.
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