Resist pattern development in 25nm size by condensation control in nanometer scale

• Project/Area Number: 19360157
• Research Category: Grant-in-Aid for Scientific Research (B)
• Allocation Type: Single-year Grants
• Section: 一般
• Research Field: Electron device/Electronic equipment
• Research Institution: Nagaoka University of Technology
• Principal Investigator: KAWAI Akira Nagaoka University of Technology, 准教授 (00251851)
• Project Period (FY): 2007 – 2008
• Project Status: Completed (Fiscal Year 2008)
• Budget Amount: ¥18,590,000 (Direct Cost: ¥14,300,000、Indirect Cost: ¥4,290,000); Fiscal Year 2008: ¥5,330,000 (Direct Cost: ¥4,100,000、Indirect Cost: ¥1,230,000); Fiscal Year 2007: ¥13,260,000 (Direct Cost: ¥10,200,000、Indirect Cost: ¥3,060,000)
• Keywords: レジストパターン / 付着力 / 原子間力顕微鏡 / 半導体集積回路 / 高分子集合体 / リソグラフィー / ナノバブル / ナノスケールパターン / 空孔

Research Abstract

原子間力顕微鏡を用いて、ナノスケールのレジストパターンの凝集構造制御を実験的に試み、理想的な凝集構造の構築を目指した。実験では、レジストパターンへTipを近づけることにより非接触変形させて歪みを測定した。よって、微細レジストパターンを密に配置すると、それだけで変形が生じることを実証にした。また、レジストパターンの吸着水を変化させることで、表面の凝集構造を変化させることに成功した。また、現像および液浸リソグラフィに重要となるナノバブル検出および特性解析が可能となった。以上の成果により、25nmサイズの微小レジストパターンデザインの最適化を行った。

Research Products

• [Journal Article] Analysis of self-standing structure composed by thick resist layers., J (2009)
  • Author(s): Akihiro Takano, Akira Kawai
  • Journal Title: Photopolymer Science and Technology 22(in press)
  • Peer Reviewed
• [Journal Article] Katsuyoshi Hamasaki, Dielectric dispersion analysis of resist layer (2009)
  • Author(s): Hiroki Sasazaki, Takahiro Kato, Akira Kawai
  • Journal Title: J. Photopolymer Science and Technology 22(in press)
  • Peer Reviewed
• [Journal Article] Mask defect transfer in Si anisotropoc wet etching (2009)
  • Author(s): Junji Miyazaki, Akira Kawai
  • Journal Title: J. Photopolymer Science and Technology 22(in press)
  • Peer Reviewed
• [Journal Article] Characterization of photpmask substrate in optical lithography (2009)
  • Author(s): Junji Miyazaki, Akira Kawai
  • Journal Title: J. Photopolymer Science and Technology 22(in press)
  • Peer Reviewed
• [Journal Article] Flowing control of micro bubbles in DFR micro fluidic channel formed on metal/insulatro composit substrate (2008)
  • Author(s): Daisuke Tanaka, Akira Kawai
  • Journal Title: J. Photopolymer Science and Technology 21 Pages: 63-68
  • Peer Reviewed
• [Journal Article] Micro channel device composed by fry film resist (2008)
  • Author(s): Akira Kawai, Daisuke Tanaka, Tomotaka Ariga
  • Journal Title: J. Photopolymer Science and Technology 21 Pages: 43-46
  • Peer Reviewed
• [Journal Article] Adsouption of micro tip on various surface energy substrates (2008)
  • Author(s): Akira Kawai, Takashi Yamaji, Hiroshi Horiguchi
  • Journal Title: J. Photopolymer and Science and Technology 21 Pages: 85-88
  • Peer Reviewed
• [Journal Article] Non-contact deformation of micro resist pattern due to van der Waals force (2008)
  • Author(s): Takashi Yamaji, Akira Kawai
  • Journal Title: J. Photopolymer Science and Technology 21 Pages: 89-94
  • Peer Reviewed
• [Journal Article] Nano-scale Deformation of Resist Film Surface by Humidifying and Drying Processes (2008)
  • Author(s): Akira Kawai, Masahito Hirano and Takashi Yamaji
  • Journal Title: J. Photopolymer Sci. Technol. 21 Pages: 737-738
  • NAID: 130004833238
  • Peer Reviewed
• [Journal Article] Micro Bubble Removal depending on Glass Cleanness (2008)
  • Author(s): Akira Kawai, Daisuke Tanaka
  • Journal Title: J. Photopolymer Sci. Technol. 21 Pages: 727-728
  • NAID: 130004833235
  • Peer Reviewed
• [Journal Article] Internal Stress of Dry Film Resist in Multilayer Structure (2008)
  • Author(s): Akira Kawai, Takashi Yamaji
  • Journal Title: J. Photopolymer Sci. Technol. 21 Pages: 725-726
  • NAID: 130004833234
  • Peer Reviewed
• [Journal Article] Surface Energy change of Si(100)Wafer by Exposing to Air (2008)
  • Author(s): Akira Kawai, Junko Kawakami, Hiroki Sasazaki
  • Journal Title: J. Photopolymer Sci. Technol 21 Pages: 739-740
  • NAID: 130004833239
  • Peer Reviewed
• [Journal Article] Hotaka Endo and Daisuke Tanaka, Pinning Effects of Micro Bubbles adhered on Resist Substrate (2008)
  • Author(s): Akira Kawai
  • Journal Title: J. Photopolymer Science. Technol. 21 Pages: 753-754
  • Peer Reviewed
• [Journal Article] Spreading of Liquid Drop on Resist Film Surface (2008)
  • Author(s): Akira Kawai, Akihiro Takano
  • Journal Title: J.Photopolymer Sci. Technol. 21 Pages: 759-760
  • NAID: 130004833244
  • Peer Reviewed
• [Journal Article] Flowing control of micro bubbles in DFR micro fluidic channel formed on metal /insulatro composit substrate (2008)
  • Author(s): Daisuke Tanaka, Akira Kawai
  • Journal Title: J. Photopolymer Science and Technology 21 Pages: 63-68
  • Peer Reviewed
• [Journal Article] Adsouption of micro tip on various surface energy substrates (2008)
  • Author(s): Akira Kawai, Takashi Yamaj i, Hiroshi Horiguchi
  • Journal Title: J. Photopolymer Science and Technology 21 Pages: 85-88
  • Peer Reviewed
• [Journal Article] Nano-scale Deformation of Resist Film Surface by Humidifying and Drying Processes (2008)
  • Author(s): Akira Kawai, Masahito Hirano, Takashi Yamaii
  • Journal Title: J. Photopolymer Science and Technology 21 Pages: 737-738
  • NAID: 130004833238
  • Peer Reviewed
• [Journal Article] Micro Bubble Removal depending on Glass Cleanness (2008)
  • Author(s): Akira Kawai, Daisuke Tanaka
  • Journal Title: J. Photopolymer Science and Technology 21 Pages: 727-728
  • NAID: 130004833235
  • Peer Reviewed
• [Journal Article] Internal stress of Dry Film Resist in Multilayer Structure (2008)
  • Author(s): Akira Kawai, Takashi Yamaji
  • Journal Title: J. Photopolymer Science and Technology 21 Pages: 725-726
  • NAID: 130004833234
  • Peer Reviewed
• [Journal Article] Surface Energy change of Si(100)Wafer by Exposing to Air (2008)
  • Author(s): Akira Kawai, Junko Kawakami, Hiroki Sasazaki
  • Journal Title: J. Photopolymer Science and Technology 21 Pages: 739-740
  • NAID: 130004833239
  • Peer Reviewed
• [Journal Article] Pinning Effects of Micro Bubbles adhered on Resist Substrate (2008)
  • Author(s): Akira Kawai, Hotaka Endo, Daisuke Tanaka
  • Journal Title: J. Photopolymer Science and Technology 21 Pages: 753-754
  • NAID: 130004833242
  • Peer Reviewed
• [Journal Article] Spreading of Liquid Drop on Resist Film Surface (2008)
  • Author(s): Akira Kawai, Akihiro Takano
  • Journal Title: J. Photopolymer Science and Technology 21 Pages: 759-760
  • NAID: 130004833244
  • Peer Reviewed
• [Journal Article] Bubbles Condensed at Water/Resist Interface Analyzed by Atomic Force Microscopy (2007)
  • Author(s): Akira Kawai, Kenta Suzuki
  • Journal Title: J. Photopolymer Science and Technology 20 Pages: 673-678
  • Peer Reviewed
• [Journal Article] Visualization of stress distribution in resist film by surface plasma treatment (2007)
  • Author(s): Akira Kawai, Norio Moriike
  • Journal Title: J. Photopolymer Science and Technology 20 Pages: 783-785
  • NAID: 130004833188
  • Peer Reviewed
• [Journal Article] Analysis of micro meniscus shape by light scattering (2007)
  • Author(s): Masaki Yamanaka, Akira Kawai
  • Journal Title: J. Photopolymer Science and Technology 20 Pages: 781-782
  • NAID: 130004833187
  • Peer Reviewed
• [Journal Article] Non-contacting deformation (NCD) of line resist pattern due to interaction force with AFM tip (2007)
  • Author(s): Akira Kawai, Takahiro Moriuchi
  • Journal Title: J. Photopolymer Science and Technology 20 Pages: 777-780
  • NAID: 130004833186
  • Peer Reviewed
• [Journal Article] Micro bubbles formed on ArF excimer resist surface detected by tip scanning method (2007)
  • Author(s): Kenta Suzuki, Akira Kawai
  • Journal Title: J. Photopolymer Science and Technology 20 Pages: 805-806
  • NAID: 130004833192
  • Peer Reviewed
• [Journal Article] Wetting analysis of hydrophobic substrate treated by HMDS primer (2007)
  • Author(s): Akira Kawai, Junko Kawakami
  • Journal Title: J. Photopolymer Science and Technology 20 Pages: 815-816
  • NAID: 130004833196
  • Peer Reviewed
• [Journal Article] Nano-wetting of DI-water analyzed by AFM (2007)
  • Author(s): Akira Kawai, Masahito Hirano
  • Journal Title: J. Photopolymer Science and Technology 20 Pages: 813-814
  • NAID: 130004833195
  • Peer Reviewed
• [Journal Article] Native oxide growth on Si(100) surface in liquid environment (2007)
  • Author(s): Harumitsu Kubota, Akira Kawai
  • Journal Title: J. Photopolymer Science and Technology 20 Pages: 823-824
  • NAID: 130004833198
  • Peer Reviewed
• [Journal Article] Native oxide growth on Si (100) surface in liquid environment (2007)
  • Author(s): Harumitsu Kubota, Akira Kawai
  • Journal Title: J. Photopolymer Science and Technology 20 Pages: 823-824
  • NAID: 130004833198
  • Peer Reviewed
• [Presentation] Fabrication of micro-channel network composed with polymer material (2009)
  • Author(s): Akihiro Takano, Akira Kawai
  • Organizer: ACA2009(the third Asian Conference on Adhesion)
  • Place of Presentation: Hamamatsu, Japan
• [Presentation] Nanoscale lithograph of Si surface with micro tip depending on surface adsorption water (2009)
  • Author(s): Akira Kawai, Fumi Nishizaki, Akihiro Takano
  • Organizer: ACA2009(the third Asian Conference on Adhesion)
  • Place of Presentation: Hamamatsu, Japan
• [Presentation] Frequency dispersion of dielectric constant of liquid nitrogen (2009)
  • Author(s): Hiroki Sasazaki, Takahiro Kato, Akira Kawai, Katsuyoshi Hamasaki
  • Organizer: ACA2009(the third Asian Conference on Adhesion)
  • Place of Presentation: Hamamatsu, Japan
• [Presentation] Optical fringe pattern observed on condensed micro water droplets (2009)
  • Author(s): Akira Kawai, Tomomi Nishimura, Hiroki Sasazaki
  • Organizer: ACA2009(the third Asian Conference on Adhesion)
  • Place of Presentation: Hamamatsu, Japan
• [Presentation] Trap control of micro bubbles on patterned wall surface (2009)
  • Author(s): Hiroki Sasazaki, Akira Kawai
  • Organizer: ACA2009(the third Asian Conference on Adhesion)
  • Place of Presentation: Hamamatsu
• [Presentation] Dissolved oxygen concentration (DO) monitoring in deionized water by electrolysis method (2009)
  • Author(s): Akihiro Takano, Akira Kawai
  • Organizer: ACA2009(the third Asian Conference on Adhesion)
  • Place of Presentation: Hamamatsu, Japan
• [Presentation] Characterization of photomask substrate in optical lithography (2009)
  • Author(s): Junji Miyazaki, Akira Kawai
  • Organizer: ACA2009(the third Asian Conference on Adhesion)
  • Place of Presentation: Hamamatsu, Japan
• [Presentation] Analysis of self-standing structure composedby thick resist layers (2009)
  • Author(s): Akihiro Takano, Akira Kawai
  • Organizer: International symposium on materials & processes for advanced microlithography and nanotechnology 2009
  • Place of Presentation: Chiba, Japan
• [Presentation] Dielectric dispersio analysis of resist laye (2009)
  • Author(s): Hiroki Sasazaki, Takahiro Kato, Akira Kawai, Katsuyoshi Hamasaki
  • Organizer: International symposium on materials & processes for advanced microlithography and nanotechnology 2009
  • Place of Presentation: Chiba, Japan
• [Presentation] Characterization of photomask substrate in optical lithography (2009)
  • Author(s): Junji Miyazaki, Akira Kawai
  • Organizer: International symposium on materials & processes for advanced microlithography and nanotechnology 2009
  • Place of Presentation: Chiba, Japan
• [Presentation] Analysis of self-standing structure composed by thick resist layers. (2009)
  • Author(s): Akihiro Takano, Akira Kawai
  • Organizer: International symposium on materials & processes for advanced microlithography and nanotechnology 2009
  • Place of Presentation: Chiba, Japan
• [Presentation] 純水中のイオン電流測定による溶存酸素濃度モニタリング (2008)
  • Author(s): 高野覚啓、河合晃
  • Organizer: 平成20年度(第18回)電気学会東京支部新潟支所研究発表会
  • Place of Presentation: 新潟大学
  • Year and Date: 2008-11-08
• [Presentation] エクスリヤ ペットプーチャイ、アニール処理中のシリコン基板の表面酸化抑制 (2008)
  • Author(s): 河合 晃
  • Organizer: 平成20年度(第18回)電気学会東京支部新潟支所研究発表会
  • Place of Presentation: 新潟大学
  • Year and Date: 2008-11-08
• [Presentation] バブル法による液中ガス溶解度解析 (2008)
  • Author(s): 田中大祐、河合晃
  • Organizer: 平成20年度(第18回)電気学会東京支部新潟支所研究発表会
  • Place of Presentation: 新潟大学
  • Year and Date: 2008-11-08
• [Presentation] マスクシフト型異方性エッチングによるSi(100)面の真円加工 (2008)
  • Author(s): 山路貴司、河合晃
  • Organizer: 平成20年度(第18回)電気学会東京支部新潟支所研究発表会
  • Place of Presentation: 新潟大学
  • Year and Date: 2008-11-08
• [Presentation] 静電容量測定による液体窒素の誘電率の周波数分散特性 (2008)
  • Author(s): 笹崎大生, 加藤孝弘, 河合晃, 濱崎勝義
  • Organizer: 平成20年度(第18回)電気学会東京支部新潟支所研究発表会
  • Place of Presentation: 新潟大学
  • Year and Date: 2008-11-08
• [Presentation] アニール処理中のシリコン基板の表面酸化抑制 (2008)
  • Author(s): 河合晃, エクスリヤ ペットプーチヤイ
  • Organizer: 平成20年度(第18回)電気学会東京支部新潟支所研究発表会
  • Place of Presentation: 新潟大学
  • Year and Date: 2008-11-08
• [Presentation] 10nm以下の極近接領域で作用する固体の引力と変位解析 (2007)
  • Author(s): 山路貴司、河合 晃
  • Organizer: 第17回電気学会東京支部新潟支所研究発表会
  • Place of Presentation: 長岡技術科学大学
  • Year and Date: 2007-11-23
• [Presentation] シード層によるCuメッキ薄膜の成長促進メカニズム (2007)
  • Author(s): 田中竜太郎、河合 晃
  • Organizer: 第17回電気学会東京支部新潟支所研究発表会
  • Place of Presentation: 長岡技術科学大学
  • Year and Date: 2007-11-23
• [Presentation] 環境制御型走査電子顕微鏡(ESEM)を用いた直系10μm微粒子間のメニスカス操作による再配列技術の開発 (2007)
  • Author(s): 倉野一俊、河合 晃
  • Organizer: 第17回電気学会東京支部新潟支所研究発表会
  • Place of Presentation: 長岡技術科学大学
  • Year and Date: 2007-11-23
• [Presentation] 試作した縮小投影露光装置を用いた3μmルールリソグラフィー技術の開発 (2007)
  • Author(s): 田中大祐、山中雅貴、河合 晃
  • Organizer: 第17回電気学会東京支部新潟支所研究発表会
  • Place of Presentation: 長岡技術科学大学
  • Year and Date: 2007-11-23
• [Presentation] 液中動作MEMSデバイス内の微細パターン構造の破壊抑制 (2007)
  • Author(s): 倉野一俊、河合 晃
  • Organizer: 第17回電気学会東京支部新潟支所研究発表会
  • Place of Presentation: 長岡技術科学大学
  • Year and Date: 2007-11-23
• [Presentation] 自己振動プローブ機構を用いた地震振動スペクトルの新規検出システムの開発 (2007)
  • Author(s): 黒田真吾、河合 晃
  • Organizer: 第17回電気学会東京支部新潟支所研究発表会
  • Place of Presentation: 長岡技術科学大学
  • Year and Date: 2007-11-23
• [Presentation] 擬似欠陥マスクを用いたSi異方性エッチング形状異常の発生メカニズム (2007)
  • Author(s): 黒田真吾、河合 晃
  • Organizer: 第17回電気学会東京支部新潟支所研究発表会
  • Place of Presentation: 長岡技術科学大学
  • Year and Date: 2007-11-23
• [Presentation] 10.3μmΦシリカ粒子表面への銅薄膜メッキ技術の開発 (2007)
  • Author(s): 久保田陽満、河合 晃
  • Organizer: 第17回電気学会東京支部新潟支所研究発表会
  • Place of Presentation: 長岡技術科学大学
  • Year and Date: 2007-11-23
• [Presentation] 局所電界印加法による基板上に付着した10.3μmΦシリカ粒子の非接触除去 (2007)
  • Author(s): 久保田陽満、河合 晃
  • Organizer: 第17回電気学会東京支部新潟支所研究発表会
  • Place of Presentation: 長岡技術科学大学
  • Year and Date: 2007-11-23
• [Presentation] 微小液滴の冷却過程とカプセル化 (2007)
  • Author(s): 倉野一俊、河合 晃
  • Organizer: 日本接着学会第45回年次大会
  • Place of Presentation: 東京大学
  • Year and Date: 2007-06-28
• [Presentation] 原子間力顕微鏡(AFM)によるナノバブルの付着凝集解析 (2007)
  • Author(s): 河合 晃、倉野一俊、鈴木健太
  • Organizer: 日本接着学会第45回年次大会
  • Place of Presentation: 東京大学
  • Year and Date: 2007-06-28
• [Presentation] Bubbles condensed at resist/water interface analyzed by atomic force microscopy (2007)
  • Author(s): Akira Kawai and Kenta Suzuki
  • Organizer: International symposium on materials & processes for advanced microlithography and nanotechnology 2006
  • Place of Presentation: Chiba, Japan
• [Presentation] 微小液滴の冷却過程とカプセル化 (2007)
  • Author(s): 倉野一俊、河合晃
  • Organizer: 日本接着学会第45回年次大会、講演予稿集
  • Place of Presentation: 東京大学
• [Presentation] 原子間力顕微鏡(AFM)によるナノバブルの付着凝集解析 (2007)
  • Author(s): 河合 晃、倉野一俊、鈴木健太
  • Organizer: 日本接着学会第45回年次大会、講演予稿集
  • Place of Presentation: 東京大学
• [Presentation] 10nm以下の極近接領域で作用する固体の引力と変位解析 (2007)
  • Author(s): 山路貴司、河合 晃
  • Organizer: 第17回電気学会東京支部新潟支所研究発表会、予稿集
  • Place of Presentation: 長岡技術科学大学
• [Presentation] シード層によるCuメッキ薄膜の成長促進メカニズム (2007)
  • Author(s): 田中竜太郎、河合 晃
  • Organizer: 第17回電気学会東京支部新潟支所研究発表会、予稿集
  • Place of Presentation: 長岡技術科学大学
• [Presentation] 環境制御型走査電子顕微鏡(ESEM)を用いた直系10μm微粒子間のメニスカス操作による再配列技術の開発 (2007)
  • Author(s): 倉野一俊、河合 晃
  • Organizer: 第17回電気学会東京支部新潟支所研究発表会、予稿集
  • Place of Presentation: 長岡技術科学大学
• [Presentation] 試作した縮小投影露光装置を用いた3μmルールリソグラフィー技術の開発 (2007)
  • Author(s): 田中大祐, 山中雅貴、河合晃
  • Organizer: 第17回電気学会東京支部新潟支所研究発表会、予稿集
  • Place of Presentation: 長岡技術科学大学
• [Presentation] 液中動作MEMSデバイス内の微細パターン構造の破壊抑制 (2007)
  • Author(s): 倉野一俊、河合晃
  • Organizer: 第17回電気学会東京支部新潟支所研究発表会、予稿集
  • Place of Presentation: 長岡技術科学大学
• [Presentation] 自己振動プローブ機構を用いた地震振動スペクトルの新規検出システムの開発 (2007)
  • Author(s): 黒田真吾、河合晃
  • Organizer: 第17回電気学会東京支部新潟支所研究発表会、予稿集
  • Place of Presentation: 長岡技術科学大学
• [Presentation] 擬似欠陥マスクを用いたSi異方性エッチング形状異常の発生メカニズム (2007)
  • Author(s): 黒田真吾、河合晃
  • Organizer: 第17回電気学会東京支部新潟支所研究発表会、予稿集
  • Place of Presentation: 長岡技術科学大学
• [Presentation] 10.3μmφシリカ粒子表面への銅薄膜メッキ技術の開発 (2007)
  • Author(s): 久保田陽満、河合晃
  • Organizer: 第17回電気学会東京支部新潟支所研究発表会、予稿集
  • Place of Presentation: 長岡技術科学大学
• [Presentation] 局所電界印加法による基板上に付着した10.3μmφシリカ粒子の非接触除去 (2007)
  • Author(s): 久保田陽満、河合晃
  • Organizer: 第17回電気学会東京支部新潟支所研究発表会、予稿集
  • Place of Presentation: 長岡技術科学大学
• [Book] プリンタブル・エレクトロニクス技術開発技術情報協会 (2008)
• [Book] 接着界面の分析・試験法 (2008)
  • Author(s): (分担執筆)
  • Publisher: 情報機構
• [Book] 微小液滴の基礎物性とその制御 (2008)
  • Author(s): (分担執筆)
  • Publisher: 技術情報協会
• [Book] 接着界面の分析・試験法 (2008)
  • Author(s): 河合晃
  • Total Pages: 242
  • Publisher: 情報機構
• [Book] プリンタブル・エレクトロニクス技術開発 (2008)
  • Author(s): 河合晃
  • Total Pages: 294
  • Publisher: 技術情報協会
• [Book] レジストパターン上の気泡除去 (2007)
  • Author(s): (分担執筆)
  • Publisher: 技術情報協会
• [Book] インクジェットプリンターの応用と材料II、インクジェットインク・微小液滴の基礎物性 (2007)
  • Author(s): (分担執筆)
  • Publisher: シーエムシー出版
• [Book] 表面・深さ方向の分析方法、レジスト、サイエンス&テクノロジー (2007)
  • Author(s): (分担執筆)
• [Remarks]
  • URL: http://kawai.nagaokaut.ac.jp
• [Remarks]
  • URL: http://kawai.nagaokaut.ac.jp
• [Patent(Industrial Property Rights)] 屈折率分布の解析方法 (2007)
  • Inventor(s): 河合 晃、川上喜章
  • Industrial Property Rights Holder: 長岡技術科学大学
  • Industrial Property Number: 2007-038310
  • Filing Date: 2007-02-19
• [Patent(Industrial Property Rights)] 振動測定装置及び振動測定方法 (2007)
  • Inventor(s): 河合 晃
  • Industrial Property Rights Holder: 長岡技術科学大学
  • Industrial Property Number: 2007-169543
  • Filing Date: 2007-06-27
• [Patent(Industrial Property Rights)] ナノ気泡の判別方法及びその装置 (2007)
  • Inventor(s): 鈴木健太、河合 晃
  • Industrial Property Rights Holder: 長岡技術科学大学
  • Industrial Property Number: 2007-293673
  • Filing Date: 2007-11-19
• [Patent(Industrial Property Rights)] ナノ気泡の判別方法及びその装置 (2007)
  • Inventor(s): 鈴木健太, 河合 晃
  • Industrial Property Rights Holder: 長岡技術科学大学
  • Industrial Property Number: 2007-293673
  • Filing Date: 2007-11-19