Study on nanoscale chemical reaction for the establishment of scientific foundation of ultrafine patterning using extreme ultraviolet radiation

• Project/Area Number: 19360428
• Research Category: Grant-in-Aid for Scientific Research (B)
• Allocation Type: Single-year Grants
• Section: 一般
• Research Field: Nuclear engineering
• Research Institution: Osaka University
• Principal Investigator: KOZAWA Takahiro Osaka University, 産業科学研究所, 准教授 (20251374)
• Co-Investigator(Kenkyū-buntansha): SAEKI Akinori 大阪大学, 産業科学研究所, 特別科学研究員 (10362625)
• Project Period (FY): 2007 – 2009
• Project Status: Completed (Fiscal Year 2009)
• Budget Amount: ¥19,110,000 (Direct Cost: ¥14,700,000、Indirect Cost: ¥4,410,000); Fiscal Year 2009: ¥5,720,000 (Direct Cost: ¥4,400,000、Indirect Cost: ¥1,320,000); Fiscal Year 2008: ¥5,980,000 (Direct Cost: ¥4,600,000、Indirect Cost: ¥1,380,000); Fiscal Year 2007: ¥7,410,000 (Direct Cost: ¥5,700,000、Indirect Cost: ¥1,710,000)
• Keywords: 放射線 / X線 / 粒子線 / 半導体超微細化 / シミュレーション工学 / 計算物理 / 放射線、X線、粒子線 / 極端紫外光 / 微細加工 / ナノ空間 / 放射線化学 / レジスト / リソグラフィ / 二次電子 / 有機材料

Research Abstract

The reaction mechanism of resist pattern formation and the spatial distribution of reactive intermediates were clarified through the pulse radiolysis of model materials for the resists used for the mass-production of semiconductor devices. On the basis of the reaction mechanisms, a Monte Carlo simulation code was developed.

Research Products

• [Journal Article] Effect of Polymer Protection and Film Thickness on Acid Generator Distribution in Chemically Amplified Resists (2009)
  • Author(s): T. Fukuyama, T. Kozawa, H. Yamamoto, S. Tagawa, M. Irie, T. Mimura, T. Iwai, J. Onodera, I. Hirosawa, T. Koganesawa, K. Horie
  • Journal Title: J. Photopolym. Sci. Technol 22巻 Pages: 105-109
  • NAID: 40016635401
  • Peer Reviewed
• [Journal Article] 放射線化学に基づく化学増幅型EB・EUVレジスト材料・プロセスの研究 (2009)
  • Author(s): 古澤孝弘
  • Journal Title: 放射線化学 87巻 Pages: 2-13
  • Peer Reviewed
• [Journal Article] Dynamics of Radical Cation of Poly(4-hydroxystyrene) and Its Copolymer for Extreme Ultraviolet and Electron Beam Resists (2009)
  • Author(s): K. Okamoto, M. Tanaka, T. Kozawa, S. Tagawa
  • Journal Title: Jpn. J. Appl. Phys 48巻
  • NAID: 210000066906
  • Peer Reviewed
• [Journal Article] Effect of Molecular Structure on Depth Profile of Acid Generator Distribution in Chemically Amplified Resist Films (2009)
  • Author(s): T. Fukuyama, T. Kozawa, K. Okamoto, S. Tagawa, M. Irie, T. Mimura, T. Iwai, J. Onodera, I. Hirosawa, T. Koganesawa, K. Horie
  • Journal Title: Jpn. J. Appl. Phys 48巻
  • NAID: 210000066903
  • Peer Reviewed
• [Journal Article] Effect of Polymer Protection and Film Thickness on Acid Generator Distribution in Chemically Amplified Resists (2009)
  • Author(s): T.Fukuyama, T.Kozawa, H.Yamamoto, S.Tagawa, M.Irie, T.Mimura, T.Iwai, J.Onodera, I.Hirosawa, T.Koganesawa, K.Horie
  • Journal Title: J.Photopolym.Sci.Technol. 22 Pages: 105-109
  • NAID: 40016635401
  • Peer Reviewed
• [Journal Article] 放射線化学に基づく化学増幅型EB・EUVレジスト材料・プロセスの研究 (2009)
  • Author(s): 古澤孝弘
  • Journal Title: 放射線化学 87 Pages: 2-13
  • Peer Reviewed
• [Journal Article] Dynamics of Radical Cation of Poly (4-hydroxystyrene) and Its Copolymer for Extreme Ultraviolet and Electron Beam Resists (2009)
  • Author(s): K.Okamoto, M.Tanaka, T.Kozawa, S.Tagawa
  • Journal Title: Jpn.J.Appl.Phys. 48
  • NAID: 210000066906
  • Peer Reviewed
• [Journal Article] Effect of Molecular Structure on Depth Profile of Acid Generator Distribution in Chemically Amplified Resist Films (2009)
  • Author(s): T.Fukuyama, T.Kozawa, K.Okamoto, S.Tagawa, M.Irie, T.Mimura, T.Iwai, J.Onodera, I.Hirosawa, T.Koganesawa, K.Horie
  • Journal Title: Jpn.J.Appl.Phys. 48
  • NAID: 210000066903
  • Peer Reviewed
• [Journal Article] Resolution degradation caused by multispur effect in chemically amplified extreme ultraviolet resists (2008)
  • Author(s): T. Kozawa, S. Tagawa, M. Shell
  • Journal Title: J. Appl. Phys 103巻 Pages: 84306-84306
  • Peer Reviewed
• [Journal Article] heoretical Study on the Dependence of Acid Distribution on Material Properties of Chemically Amplified Extreme Ultraviolet Resists (2008)
  • Author(s): T. Kozawa, S. Tagawa, M. Shell
  • Journal Title: Jpn. J. Appl. Phys 47巻 Pages: 6288-6292
  • Peer Reviewed
• [Journal Article] Study of the Reaction of Acid Generators with Epithermal and Thermalized Electrons (2008)
  • Author(s): K. Natsuda, T. Kozawa, A. Saeki, S. Tagawa, T. Kai, T. Shimokawa
  • Journal Title: Jpn. J. Appl. Phys 47巻 Pages: 4932-4935
  • Peer Reviewed
• [Journal Article] Resolution degradation caused by multispur effect in chemically amplified extreme ultraviolet resists (2008)
  • Author(s): T. Kozawa, S. Tagawa, M. Shell
  • Journal Title: J. Appl. Phys. (2008) 103 Pages: 84306-84306
  • Peer Reviewed
• [Journal Article] Theoretical Study on the Dependence of Acid Distribution on Material Properties of Chemically Amplified Extreme Ultraviolet Resists (2008)
  • Author(s): T. Kozawa, S. Tagawa, M. Shell
  • Journal Title: Jpn. J. Appl. Phys. 47 Pages: 6288-6292
  • NAID: 40016210997
  • Peer Reviewed
• [Journal Article] Study of the Reaction of Acid Generators with Epithermal and Thermalized Electrons (2008)
  • Author(s): K. Natsuda, T. Kozawa, A. Saeki, S. Tagawa, T. Kai, T. Shimokawa
  • Journal Title: Jpn. J. Appl. Phys. 47 Pages: 4932-4935
  • Peer Reviewed
• [Journal Article] Acid distribution in chemically amplified extreme ultraviolet resist (2007)
  • Author(s): T. Kozawa, S. Tagawa, H.B. Cao, H. Deng, M.J. Leeson
  • Journal Title: J. Vac. Sci. Technol. B 25巻 Pages: 2481-2485
  • Peer Reviewed
• [Journal Article] Point Spread Function for the Calculation of Acid Distribution in Chemically Amplified Resists Used for Electron-Beam Lithography (2007)
  • Author(s): T. Kozawa, S. Tagawa
  • Journal Title: Jpn. J. Appl. Phys 46巻
  • NAID: 210000063830
  • Peer Reviewed
• [Journal Article] Study of Acid-Base Equilibrium in Chemically Amplified Resist (2007)
  • Author(s): K. Natsuda, T. Kozawa, K. Okamoto, S. Tagawa
  • Journal Title: Jpn. J. Appl. Phys 46巻 Pages: 7285-7289
  • NAID: 40015705098
  • Peer Reviewed
• [Journal Article] Acid distribution in chemically amplified extreme ultraviolet resist (2007)
  • Author(s): T. Kozawa, S. Tagawa, H. B. Cao, H. Deng, and M. J. Leeson
  • Journal Title: J. Vac. Sci. Technol. B 25 Pages: 2481-2485
  • Peer Reviewed
• [Journal Article] Point Spread Function for the Calculation of Acid Distribution in Chemically Amplified Resists Used for Electron-Beam Lithography (2007)
  • Author(s): T. Kozawa and S. Tagawa
  • Journal Title: Jpn. J. Appl. Phys. 46
  • NAID: 210000063830
  • Peer Reviewed
• [Journal Article] Study of Acid-Base Equilibrium in Chemically Amplified Resist (2007)
  • Author(s): K. Natsuda, T. Kozawa, K. Okamoto, and S. Tagawa
  • Journal Title: Jpn. J. Appl. Phys. 46 Pages: 7285-7289
  • NAID: 40015705098
  • Peer Reviewed
• [Presentation] Development Status and Future Prospect of Extreme Ultraviolet Resists (2009)
  • Author(s): T. Kozawa
  • Organizer: International Workshop on EUV Lithography
  • Place of Presentation: Honolulu, Hawaii, USA
  • Year and Date: 2009-07-16
• [Presentation] Effect of molecular structures of acid generators on acid generation in chemically amplified resists upon exposure to 75 keV electron beam (2008)
  • Author(s): K. Natsuda, T. Kozawa, K. Okamoto, S. Tagawa
  • Organizer: 21st International Microprocesses and Nanotechnology Conference
  • Place of Presentation: Fukuoka, Japan
  • Year and Date: 2008-10-28
• [Presentation] Nanoscale Distribution of Intermediates in Resist Materials for Next Generation Lithography (2007)
  • Author(s): T. Kozawa, S. Tagawa
  • Organizer: ASR Symposium
  • Place of Presentation: 茨城県那珂郡東海村
  • Year and Date: 2007-11-08
• [Remarks]
  • URL: http://www.sanken.osaka-u.ac.jp