| Budget Amount *help |
¥4,030,000 (Direct Cost: ¥3,100,000、Indirect Cost: ¥930,000)
Fiscal Year 2009: ¥780,000 (Direct Cost: ¥600,000、Indirect Cost: ¥180,000)
Fiscal Year 2008: ¥1,040,000 (Direct Cost: ¥800,000、Indirect Cost: ¥240,000)
Fiscal Year 2007: ¥2,210,000 (Direct Cost: ¥1,700,000、Indirect Cost: ¥510,000)
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| Research Abstract |
We developed the fundamental techniques of atom lithography using the computer-generated holograms and the evanescent wave, which is a promising candidate for the novel nanofabrication. We improved the efficiency in generating the ultra-cold atoms for the atom source of lithography. We also developed the light source near a wavelength of 400nm with a violet laser diode. The frequency of the 780nm-light was stabilized less than 0.4MHz for 2 hours with the saturation signal of the rubidium atoms, which is applicable to stabilizing the optical mask in lithography.
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