Application of catalytic chemical vapor deposition technique to oxidizing gases

• Project/Area Number: 19550015
• Research Category: Grant-in-Aid for Scientific Research (C)
• Allocation Type: Single-year Grants
• Section: 一般
• Research Field: Physical chemistry
• Research Institution: Shizuoka University
• Principal Investigator: UMEMOTO Hironobu Shizuoka University, 工学部, 教授 (80167288)
• Project Period (FY): 2007 – 2008
• Project Status: Completed (Fiscal Year 2008)
• Budget Amount: ¥4,680,000 (Direct Cost: ¥3,600,000、Indirect Cost: ¥1,080,000); Fiscal Year 2008: ¥1,690,000 (Direct Cost: ¥1,300,000、Indirect Cost: ¥390,000); Fiscal Year 2007: ¥2,990,000 (Direct Cost: ¥2,300,000、Indirect Cost: ¥690,000)
• Keywords: 化学気相堆積 / 酸化性ガス / 金属触媒 / 酸素原子 / 水素原子 / OHラジカル / イリジウム触媒 / タングステン触媒

Research Abstract

加熱金属表面における触媒分解過程が、これまでの還元性ラジカルの生成に加え、酸素原子やOHラジカルなどの酸化性ラジカルの選択的生成にも利用できることを示した。特に、イリジウムは、高温でも酸素や酸化窒素、水蒸気等によって酸化されることはなく、これを用いることにより金属汚染のない酸化物薄膜の成膜や表面処理が可能である。また、タングステンとイリジウムにおける発生ラジカル種の比較から、両者における反応過程の相違についての知見を得た。

Research Products

• [Journal Article] Photoresist Removal Using Atomic Hydrogen Generated by Hot-Wire Catalyzer and Effects on Si-wafer Surface (2009)
  • Author(s): M. Yamamoto, H. Horibe, H. Umemoto, K. Takao, E. Kusano, M. Kase, S. Tagawa
  • Journal Title: Jpn.J.Appl.Phys. 48[2]026503 Pages: 7-7
  • NAID: 40016464779
  • Peer Reviewed
• [Journal Article] Detection of Radical Species Produced by Catalytic Decomposition of H_2, O_2 and their Mixtures on Heated Ir Surfaces (2009)
  • Author(s): H. Umemoto, H. Kusanagi, K. Nishimura, and M. Ushijima
  • Journal Title: Thin Solid Films 517, [12] Pages: 3446-3448
  • Peer Reviewed
• [Journal Article] Detection of Radical Species Produced by Catalytic Decomposition of H_2, 0_2 and their Mixtures on Heated Ir Surfaces (2009)
  • Author(s): H. Umemoto, et al.
  • Journal Title: Thin Solid Films (In press)
  • Peer Reviewed
• [Journal Article] Photoresist Removal Using Atomic Hydrogen Generated by Hot-wire Catalyzer and Effects on Si-wafer Surface (2009)
  • Author(s): M. Yamamoto, et al.
  • Journal Title: Jpn. J. Appl. Phys. 48
  • Peer Reviewed
• [Journal Article] Catalytic Decomposition of O_2, NO, N_2O and NO_2 on a Heated Ir Filament to Produce Atomic Oxygen (2008)
  • Author(s): H. Umemoto and H. Kusanagi
  • Journal Title: J.Phys.D : Appl.Phys. 41[22]225505 Pages: 5-5
  • Peer Reviewed
• [Journal Article] Coverage Properties of SiN_x Films Prepared by Catalytic Chemical Vapor Deposition on Trenched Substrates below 80℃ (2008)
  • Author(s): A. Heya, T. Minamikawa, T. Niki, S. Minami, A. Masuda, H. Umemoto, N. Matsuo,and H. Matsumura
  • Journal Title: Thin Solid Films 516, [10] Pages: 3000-3004
  • Peer Reviewed
• [Journal Article] Coating Techniques of Metal Chambers for Remote Catalytic Chemical Vapor Deposition Applications (2008)
  • Author(s): H. Umemoto, S. Setoguchi, H. Uemura,and H. Matsumura
  • Journal Title: J.Vac.Sci.Tech.A 26, [2] Pages: 309-311
  • NAID: 120000796463
  • Peer Reviewed
• [Journal Article] Production and Detection of Reducing and Oxidizing Radicals in the Catalytic Decomposition of H_2/O_2 Mixtures on Heated Tungsten Surfaces (2008)
  • Author(s): H. Umemoto and M. Moridera
  • Journal Title: J.Appl.Phys. 103, [3]034905 Pages: 6-6
  • Peer Reviewed
• [Journal Article] Catalytic CVD Processes of Oxidizing Species and the Prevention of Oxidization of Heated Tungsten Filaments by H_2 (2008)
  • Author(s): H. Umemoto, S.G. Ansari, T. Morimoto, S. Setoguchi, H. Uemura,and H. Matsumura
  • Journal Title: Thin Solid Films 516, [5] Pages: 829-831
  • Peer Reviewed
• [Journal Article] Cat-CVD SiN Passivation Films for OLEDs and Packaging (2008)
  • Author(s): A. Heya, T. Minamikawa, T. Niki, S. Minami, A. Masuda, H. Umemoto, N. Matsuo,and H. Matsumura
  • Journal Title: Thin Solid Films 516, [5] Pages: 553-557
  • Peer Reviewed
• [Journal Article] Future Prospect of Remote Cat-CVD on the Basis of Gas-phase Diagnoses (2008)
  • Author(s): H. Umemoto and H. Matsumura
  • Journal Title: Thin Solid Films 516, [5] Pages: 500-502
  • Peer Reviewed
• [Journal Article] 有機ELの保護膜形成技術 (2008)
  • Author(s): 部家彰、松尾直人、南川俊治、仁木敏一、南茂平、増田淳、梅本宏信、松村英樹
  • Journal Title: 月間ディスプレイ Vol.14, No.9 Pages: 49-56
• [Journal Article] Coverage Properties of SiN_x Films Prepared by Catalytic Chemical Vapor Deposition on Trenched Substrates below 80℃ (2008)
  • Author(s): A. Heya, et al.
  • Journal Title: Thin Solid Films 516 Pages: 3000-3004
  • Peer Reviewed
• [Journal Article] Catalytic Decomposition of O_2, NO, N_2O and N0_2 on a Heated Ir Filament to Produce Atomic Oxygen (2008)
  • Author(s): H. Umemoto, et al.
  • Journal Title: J. Phys. D : Appl. Phys. 41
  • Peer Reviewed
• [Journal Article] 有機ELの保護膜形成技術 (2008)
  • Author(s): 部家彰ほか
  • Journal Title: 月間ディスプレイ 14 Pages: 49-56
• [Journal Article] Future Prospect of Remote Cat-CVD on the Basis of Gas-phase Diagnoses (2008)
  • Author(s): H.Umemoto, et, al.
  • Journal Title: Thin Solid Films 516 Pages: 500-502
  • Peer Reviewed
• [Journal Article] Cat-CVD SiN Passivation Films for OLEDs and Packaging (2008)
  • Author(s): A.Heya, et. al.
  • Journal Title: Thin Solid Films 516 Pages: 553-557
  • Peer Reviewed
• [Journal Article] Catalytic CVD Processes of Oxidizing Species and the Prevention of Oxidization of Heated Tungsten Filaments by H_2 (2008)
  • Author(s): H.Umemoto, et. al.
  • Journal Title: Thin Solid Films 516 Pages: 829-831
  • Peer Reviewed
• [Journal Article] Production and Detection of Reducing and Oxidizing Radicals in the Catalytic Decomposition of H_2/O_2 Mixtures on Heated Tungsten Surfaces (2008)
  • Author(s): H.Umemoto, et. al.
  • Journal Title: J.Appl.Phys. 103 Pages: 34905-34905
  • Peer Reviewed
• [Journal Article] Coating Techniques of Metal Chambers for Remote Catalytic Chemical Vapor Deposition Applications (2008)
  • Author(s): H.Umemoto, et. al.
  • Journal Title: J.Vac.Sci.Tech.A 26 Pages: 309-311
  • NAID: 120000796463
  • Peer Reviewed
• [Journal Article] Production Yields of H(D) Atoms in the Reactions of N_2(A ^3Σ_u^+)with C_2H_4, C_2H_2 and their Deuterated Variants (2007)
  • Author(s): H. Umemoto
  • Journal Title: J.Chem.Phys. 127, [1]014304 Pages: 7-7
  • Peer Reviewed
• [Journal Article] Production Yields of H(D)Atoms in the Reactions of N_2 (A^3Σ_u^+) with C_2H_4,C_2H_2 and their Deuterated Variants (2007)
  • Author(s): H.Umemoto
  • Journal Title: J.Chem.Phys. 127 Pages: 14307-14307
  • Peer Reviewed
• [Presentation] 加熱イリジウム触媒体上における水蒸気分子分解過程 (2009)
  • Author(s): 梅本宏信、草薙弘樹
  • Organizer: 春季第56回応用物理学関係連合講演会
  • Place of Presentation: つくば
  • Year and Date: 2009-03-30
• [Presentation] Resist removal and evaluation of Si-wafer by atomic hydrogen (2008)
  • Author(s): M. Yamamoto, H. Horibe, H. Umemoto, E. Kusano,and S. Tagawa
  • Organizer: 30th International Symposium on Dry Process
  • Place of Presentation: 東京
  • Year and Date: 2008-11-27
• [Presentation] Detection of radical species produced by catalytic decomposition of H_2, O_2 and their mixtures on heated Ir surfaces (2008)
  • Author(s): H. Umemoto, H. Kusanagi, K. Nishimura,and M. Ushijima
  • Organizer: 5th International Conference on Hot-Wire CVD(Cat-CVD)Process
  • Place of Presentation: Cambridge
  • Year and Date: 2008-08-20
• [Presentation] Detection of radical species produced by catalytic decomposition of H_2, O_2 and their mixtures on heated Ir surfaces (2008)
  • Author(s): H. Umemoto, et al.
  • Organizer: 5th International Conference on Hot-Wire CVD (Cat-CVD) Process
  • Place of Presentation: Cambridge, MA(USA)
  • Year and Date: 2008-08-20
• [Presentation] 化学気相堆積過程における気相、表面反応 (2008)
  • Author(s): 梅本宏信
  • Organizer: 第5回Cat-CVD研究会
  • Place of Presentation: 相模原
  • Year and Date: 2008-06-20
• [Presentation] 加熱イリジウム触媒体上における酸化性分子分解過程 (2008)
  • Author(s): 梅本宏信、草薙弘樹、西村和晃、牛島満
  • Organizer: 第5回Cat-CVD研究会
  • Place of Presentation: 相模原
  • Year and Date: 2008-06-20
• [Presentation] 加熱金属触媒体による酸化性および還元性ラジカルの生成 (2008)
  • Author(s): 梅本宏信、草薙弘樹
  • Organizer: 第24回化学反応討論会
  • Place of Presentation: 札幌
  • Year and Date: 2008-06-02
• [Presentation] 加熱イリジウム触媒体上における水素分子、酸素分子の分解過程 (2008)
  • Author(s): 梅本宏信、草薙弘樹、西村和晃、牛島満
  • Organizer: 春季第55回応用物理学関係連合講演会
  • Place of Presentation: 船橋
  • Year and Date: 2008-03-30
• [Presentation] 原子状水素原子の濃度とレジスト除去速度との関係 (2008)
  • Author(s): 山本雅史、梅本宏信、堀邊英夫、三浦敏特、田川精一
  • Organizer: 春季第55回応用物理学関係連合講演会
  • Place of Presentation: 船橋
  • Year and Date: 2008-03-27
• [Presentation] 酸素/水素混合系触媒分解過程における酸化性および還元性ラジカルの検出 (2007)
  • Author(s): 梅本宏信、森寺真司
  • Organizer: 秋季第68回応用物理学会学術講演会
  • Place of Presentation: 札幌
  • Year and Date: 2007-09-04
• [Presentation] 酸素/水素混合系触媒分解過程における水素原子の検出 (2007)
  • Author(s): 梅本宏信
  • Organizer: 第4回Cat-CVD研究会
  • Place of Presentation: 北九州
  • Year and Date: 2007-06-29
• [Presentation] 最低励起三重項状態の窒素分子とC_2H_2(C_2D_2)との反応におけるH(D)原子の収率 (2007)
  • Author(s): 梅本宏信
  • Organizer: 第23回化学反応討論会
  • Place of Presentation: 神戸
  • Year and Date: 2007-06-14
• [Book] 「触媒CVD(Cat-CVD)の新展開-ラジカルを用いる新プロセス技術-」(中山弘(監修)第1章第2節) (2008)
  • Author(s): 梅本宏信
  • Publisher: シーエムシー出版(株)
• [Book] 触媒CVD(Cat-CVD)の新展開-ラジカルを用いる新プロセス技術- (2008)
  • Author(s): 梅本宏信
  • Total Pages: 13
  • Publisher: シーエムシー出版
• [Remarks]
  • URL: http://www.ipc.shizuoka.ac.jp/~thumemo/kaken08.pdf
• [Remarks]
  • URL: http://www.ipc.shizuoka.ac.jp/~thumemo/kaken08.pdf
• [Remarks]
  • URL: http://www.ipc.shizuoka.ac.jp/~thumemo/kaken07.html