Dynamic analyses of nano-structures and states at interface of resistive random access memory

• Project/Area Number: 19560029
• Research Category: Grant-in-Aid for Scientific Research (C)
• Allocation Type: Single-year Grants
• Section: 一般
• Research Field: Thin film/Surface and interfacial physical properties
• Research Institution: National Institute for Materials Science
• Principal Investigator: ISHII Masashi National Institute for Materials Science, 量子ビームセンター, 主任研究員 (90281667)
• Project Period (FY): 2007 – 2008
• Project Status: Completed (Fiscal Year 2008)
• Budget Amount: ¥4,810,000 (Direct Cost: ¥3,700,000、Indirect Cost: ¥1,110,000); Fiscal Year 2008: ¥910,000 (Direct Cost: ¥700,000、Indirect Cost: ¥210,000); Fiscal Year 2007: ¥3,900,000 (Direct Cost: ¥3,000,000、Indirect Cost: ¥900,000)
• Keywords: 界面 / 表面・界面物性 / 放射線、X線、粒子線 / X線反射率 / X線光電子分光 / 誘電緩和測定 / イットリア / 金 / 格子欠陥 / メモリー / プラチナ

Research Abstract

メモリ効果としての応用が期待される巨大な抵抗変化を伴う界面の酸化・還元反応について、動的解析と制御を試みた。X線回折による結晶性評価、メモリ特性、X線反射率によるデバイスの層構造の評価、誘電緩和による構造と電気特性の相関など、統合分析を行った。界面化学反応の活性中心を生み出す核の形成制御、酸化・還元のバランスをとる複合酸化物の形成など、新しいデバイス実現へのアプローチを示した。

Research Products

• [Journal Article] Y_2O_3 Thin Film Deposited by Two-step Process and Its Resistance to Halogen Plasma (2009)
  • Author(s): M. Ishii, N. Ikeda, D. Tsuya, K. Sakurai
  • Journal Title: Materials Science and Engineering A Pages: 205-212
  • Peer Reviewed
• [Journal Article] Nucleation Expansion and Compression of Y2O3 nano-crystals: Crystallogenesis in Annealing Process of Metalorganic Decomposition Method (2008)
  • Author(s): M. Ishii, A. Nakao, and K. Sakurai
  • Journal Title: Transactions of the Materials Research Society of Japan 33 Pages: 583-583
  • NAID: 130007809505
  • Peer Reviewed
• [Journal Article] Nucleation, Expansion and Compression of Y_2O_3 nano-crystals : Crystallogenesis in Annealing Process of Metalorganic Decomposition Method (2008)
  • Author(s): M. Ishii, A. Nakao, K. Sakurai
  • Journal Title: Transactions of the Materials Research Society of Japan 33 Pages: 583-586
  • Peer Reviewed
• [Journal Article] Nucleation,Expansion and Compression of Y_2O_3 nano-crystals:Crystallogenesis in Annealing Process of Metalorganic Decomposition Method (2008)
  • Author(s): M. Ishii, A. Nakao, K. Sakurai
  • Journal Title: Transactions of the Materials Research Society of Japan
  • Peer Reviewed
• [Journal Article] Chemical Data Writing into Metal/oxide Interface: Characterization of Low Dimensional Interface Reactions by I-V Measurements (2007)
  • Author(s): M. Ishii, A. Nakao, and K. Sakurai
  • Journal Title: MRS Proceedings 1056E
  • Peer Reviewed
• [Journal Article] Application of x-ray reflectivity measurement to monitoring of chemical reactions at 'buried' interface (2007)
  • Author(s): M. Ishii, A. Nakao, and K. Sakurai
  • Journal Title: Journal of Physics: Conference Series 83 Pages: 12014-1
  • Peer Reviewed
• [Journal Article] Chemical Data Writing into Metal/oxide Interface:Characterization of Low Dimensional Interface Reactions by I-V Measurements (2007)
  • Author(s): M. Ishii, A. Nakao, K. Sakurai
  • Journal Title: MRS Proceedings 1056E
  • Peer Reviewed
• [Journal Article] Application of x-ray reflectivity measurement to monitoring of chemical reactions at 'buried'interface (2007)
  • Author(s): M. Ishii, A. Nakao, K. Sakurai
  • Journal Title: Journal of Physics:Conference Series 83
  • Peer Reviewed
• [Journal Article] Y2O3 Thin Film Deposited by Two-step Process and Its Resistance to Halogen Plasma
  • Author(s): M. Ishii, N. Ikeda, D. Tsuya, and K. Sakurai
  • Journal Title: Materials Science and Engineering A (印刷中)
  • Peer Reviewed
• [Presentation] 二段階プロセスで成膜したイットリア薄膜の結晶性とフッ素系ハロゲンプラズマ耐性 (2009)
  • Author(s): 石井真史、池田直樹、津谷大樹、桜井健次
  • Organizer: 第26回希土類討論会
  • Place of Presentation: 札幌 北海道
  • Year and Date: 2009-05-28
• [Presentation] 二段階プロセスで成膜したイットリア薄膜の結晶性とフッ素系ハロゲンプラズマ耐性 (2009)
  • Author(s): 石井真史, 池田直樹, 津谷大樹, 桜井健次
  • Organizer: 第26回希土類討論会
  • Place of Presentation: 札幌市、北海道(発表予定)
  • Year and Date: 2009-05-28
• [Presentation] 二段階プロセスによるY2O3薄膜の堆積とそのハロゲンプラズマ耐性 (2009)
  • Author(s): 石井真史、池田直樹、津谷大樹、桜井健次
  • Organizer: 第56回応用物理学関係連合講演会
  • Place of Presentation: つくば、茨城
  • Year and Date: 2009-03-30
• [Presentation] 二段階プロセスによるY_2O_3薄膜の堆積とそのハロゲンプラズマ耐性 (2009)
  • Author(s): 石井真史, 池田直樹, 津谷大樹, 桜井健次
  • Organizer: 第56回応用物理学関係連合講演会
  • Place of Presentation: 筑波大学つくば、茨城県
  • Year and Date: 2009-03-30
• [Presentation] Y2O3 Thin Film Deposited by Two-step Process and Its Resistance to Halogen Plasma (2008)
  • Author(s): つくば、茨城
  • Organizer: 2008 European Materials Science Society Fall meeting
  • Place of Presentation: Warsaw Poland
  • Year and Date: 2008-09-15
• [Presentation] Y_2O_3 Thin Film Deposited by Two-step Process and Its Resistance to Halogen Plasma (2008)
  • Author(s): M. Ishii, N. Ikeda, D. Tsuya, K. Sakurai
  • Organizer: 2008 European Materials Science Society Fall meeting
  • Place of Presentation: Warsaw University of Technology, Warsaw, Poland
  • Year and Date: 2008-09-15
• [Presentation] Low temperature chemical reaction at gold/yttria interface characterized by dielectric relaxation measurement (2008)
  • Author(s): M. Ishii, A. Nakao, and K. Sakurai
  • Organizer: International Materials Research Conference
  • Place of Presentation: Chongqing, China
  • Year and Date: 2008-06-09
• [Presentation] Low temperature chemical reaction at gold/yttria interface characterized by dielectric relaxation measurement (2008)
  • Author(s): M. Ishii, A. Nakao, K. Sakurai
  • Organizer: International Materials Research Conference
  • Place of Presentation: Chonqing International Convention & Exhibition Center, Chongqing, China
  • Year and Date: 2008-06-09
• [Presentation] 金属/Y2O3界面における低温化学反応 : 誘電緩和による評価 (2008)
  • Author(s): 石井真史、中尾愛子、桜井健次
  • Organizer: 第55回応用物理学関係連合講演会
  • Place of Presentation: 船橋市 日本
  • Year and Date: 2008-03-27
• [Presentation] 金属/Y_2O_3界面における低温化学反応:誘電緩和による評価 (2008)
  • Author(s): 石井 真史、中尾 愛子、桜井 健次
  • Organizer: 第55回応用物理学関係連合講演会
  • Place of Presentation: 船橋市,日本
  • Year and Date: 2008-03-27
• [Presentation] Thermal and electric data writing into metal/oxide interface: 2D reactions at metal/yttria interface observed by x-ray (2007)
  • Author(s): M. Ishii, A. Nakao, K. Sakurai
  • Organizer: 2007 MRS Fall Meeting
  • Place of Presentation: Boston USA
  • Year and Date: 2007-11-26
• [Presentation] Thermal and electric data writing into metal/oxide interface:2D reactions at metal/yttria interface observed by x-ray (2007)
  • Author(s): M. Ishii, A. Nakao, K. Sakurai
  • Organizer: 2007MRS Fall Meeting
  • Place of Presentation: Boston,USA
  • Year and Date: 2007-11-26
• [Presentation] Observation of soft reaction at metal/oxide interface with X-ray reflectivity (2007)
  • Author(s): M. Ishii, A. Nakao, K. Sakurai
  • Organizer: 9th International Conference on Atomically Controlled Surfaces, Interfaces and Nanostructures
  • Place of Presentation: Tokyo Japan
  • Year and Date: 2007-11-12
• [Presentation] Observation of soft reaction at metal/oxide interface with X-ray reflectivity (2007)
  • Author(s): M. Ishii, A. Nakao, K. Sakurai
  • Organizer: 9th International Conference on Atomically Controlled Surfaces, Interfaces and Nanostructures
  • Place of Presentation: Tokyo,Japan
  • Year and Date: 2007-11-12
• [Presentation] 金属/ Y2O3界面化学反応過程の構造および化学分析 (2007)
  • Author(s): 石井真史、中尾愛子、桜井健次
  • Organizer: 第68回応用物理学会学術講演会
  • Place of Presentation: 札幌市 日本
  • Year and Date: 2007-09-04
• [Presentation] 金属/Y_2O_3界面化学反応過程の構造および化学分析 (2007)
  • Author(s): 石井 真史、中尾 愛子、桜井 健次
  • Organizer: 第68回応用物理学会学術講演会
  • Place of Presentation: 札幌市,日本
  • Year and Date: 2007-09-04
• [Presentation] 埋もれた界面の化学反応を利用した電子デバイスへのX線反射率測定の応用 (2007)
  • Author(s): 石井真史
  • Organizer: 埋もれた界面のX線・中性子線に関するワークショップ2007
  • Place of Presentation: 仙台 日本
  • Year and Date: 2007-07-22
• [Presentation] 埋もれた界面の化学反応を利用した電子デバイスへのX線反射率測定の応用 (2007)
  • Author(s): 石井 真史
  • Organizer: 埋もれた界面のX線・中性子線に関するワークショップ2007
  • Place of Presentation: 仙台,日本
  • Year and Date: 2007-07-22
• [Presentation] 有機金属分解法によって作製したY2O3薄膜のX線反射率測定 (2007)
  • Author(s): 石井真史、桜井健次
  • Organizer: 第24回希土類討論会
  • Place of Presentation: 福岡市 日本
  • Year and Date: 2007-05-17
• [Presentation] 有機金属分解法によって作製したY_2O_3薄膜のX線反射率測定 (2007)
  • Author(s): 石井 真史、桜井 健次
  • Organizer: 第24回希士類討論会
  • Place of Presentation: 福岡市,日本
  • Year and Date: 2007-05-17