Study on the modeling of reactive sputter deposition including the transport process of sputtered and gas particles

• Project/Area Number: 19560048
• Research Category: Grant-in-Aid for Scientific Research (C)
• Allocation Type: Single-year Grants
• Section: 一般
• Research Field: Applied physics, general
• Research Institution: Seikei University
• Principal Investigator: NAKANO Takeo Seikei University, 理工学部, 助教 (40237342)
• Project Period (FY): 2007 – 2009
• Project Status: Completed (Fiscal Year 2009)
• Budget Amount: ¥4,420,000 (Direct Cost: ¥3,400,000、Indirect Cost: ¥1,020,000); Fiscal Year 2009: ¥650,000 (Direct Cost: ¥500,000、Indirect Cost: ¥150,000); Fiscal Year 2008: ¥1,690,000 (Direct Cost: ¥1,300,000、Indirect Cost: ¥390,000); Fiscal Year 2007: ¥2,080,000 (Direct Cost: ¥1,600,000、Indirect Cost: ¥480,000)
• Keywords: 反応性スパッタリング / モデリング / 薄膜堆積プロセス

Research Abstract

Reactive sputter deposition process has been studied for the precise control of deposited film composition. We clarified the effects of transport process of sputtered metal atoms and sticking probability of reactive gases. Especially, the former leads the dependence of the composition on total gas pressure, which has not been pre-dicted by conventional process models. We also studied the characteristics of pulse power sputtering, which has been proved to be able to modify the film structure.

Research Products

• [Journal Article] Effect of the target bias voltage during off-pulse period on the impulse mag-netron sputtering (2010)
  • Author(s): T. Nakano, C. Murata, S. Baba
  • Journal Title: Vacuum vol.84 Pages: 1368-1371
  • Peer Reviewed
• [Journal Article] Effect of background gas environment on oxy-gen incorporation in TiN films depos-ited using UHV reactive magnetron sputtering (2008)
  • Author(s): T. Nakano, K. Hoshi, S. Baba
  • Journal Title: Vacuum vol.83 Pages: 467-469
  • Peer Reviewed
• [Journal Article] Effect of the target bias voltage during off-pulse period on the impulse magnetron sputtering
  • Author(s): T.Nakano, C.Murata, S.Baba
  • Journal Title: Vacuum(Web 公開済み:doi:10.1016/j.vacuum.2010.01.014) (in press)
  • Peer Reviewed
• [Presentation] パルスoff時のバイアス電位を制御したパルスマグネトロンスパッタの特性(2) (2009)
  • Author(s): 中野武雄, 新井完, 馬場茂
  • Organizer: 第70回応用物理学会学術講演会
  • Place of Presentation: 富山大学
  • Year and Date: 2009-09-09
• [Presentation] Ef-fects of vacuum environment on oxygen impurity during the reac-tive sputtering deposition of metal nitrides (2009)
  • Author(s): H. Hirukawa, T. Nakamura, A. Suzuki, T. Nakano, S. Baba
  • Organizer: ISSP2009
  • Place of Presentation: Kanazawa (Japan)
  • Year and Date: 2009-07-09
• [Presentation] Effects of vacuum environment on oxygen impurity during the reactive sputtering deposition of metal nitrides (2009)
  • Author(s): N.Hirukawa, T.Nakamura, A.Suzuki, T.Nakano, S.Baba
  • Organizer: 10th Intl.Symp.on Sputtering and Plasma Processes(ISSP2009)
  • Place of Presentation: 金沢国際ホテル(金沢市)
  • Year and Date: 2009-07-09
• [Presentation] パルスoff期のターゲット電位を変化させたパルスマグネトロンスパッタによる薄膜構造制御 (2009)
  • Author(s): 中野武雄, 原良輔, 日留川紀彦, 馬場茂
  • Organizer: 第57回応用物理学関係連合講演会
  • Place of Presentation: 東海大学
  • Year and Date: 2009-03-19
• [Presentation] スパッタリングにおける粒子輸送とプロセス圧力の効果 (2008)
  • Author(s): 中野武雄, 馬場茂
  • Organizer: 日本真空協会SP部会
  • Place of Presentation: 第111回定例研究会(機械振興会館)
  • Year and Date: 2008-11-20
• [Presentation] スパッタリングにおける粒子輸送とプロセス圧力の効果 (2008)
  • Author(s): 中野武雄, 馬場 茂
  • Organizer: 真空協会SP部会第111回定例研究会
  • Place of Presentation: 東京・機械振興会館
  • Year and Date: 2008-11-20
• [Presentation] Con-taminating Oxygen Incorporation during Reactive Sputter Deposi-tion of Metal Nitride Films (2008)
  • Author(s): T. Nakano, T. Nakamura, A. Su-zuki, N. Hirukawa, S. Baba
  • Organizer: VASSCAA-4
  • Place of Presentation: Matsue (Japan)
  • Year and Date: 2008-10-28
• [Presentation] Thickness and compositional uniformity of reactively sputter-deposited films: A consideration from particle transport processes (2008)
  • Author(s): T. Nakano, S. Baba
  • Organizer: ICCG-7
  • Place of Presentation: Eindhoven (The Netherlands)
  • Year and Date: 2008-06-17
• [Presentation] Thickness and compositional uniformity of reactively sputter-deposited films : A consideration from particle transport processes (Invited lecture) (2008)
  • Author(s): T. Nakano, S. Baba
  • Organizer: 7^<th> Intl. Conf. on Coatings on Glass and Plastics
  • Place of Presentation: オランダ王国Eindhoven 市
  • Year and Date: 2008-06-17
• [Presentation] Effects of sputtered atom weight and ambient gas pressure on the target mode transition during reactive sputtering of metal oxides (2007)
  • Author(s): T. Nakano, Y. Iimura, S. Baba
  • Organizer: IVC-17/ICSS-13 and ICN+T2007
  • Place of Presentation: Stockholm (Sweden)
  • Year and Date: 2007-07-06
• [Presentation] Effects of sputtered atom weight and ambient gas pressure on the target mode transition during reactive sputtering of metal oxides (2007)
  • Author(s): Takeo Nakano, Yasuhiro Iimura And shigeru baba
  • Organizer: IVC-17/ICSS-13 and ICN+T2007
  • Place of Presentation: Sweden,Stockholm
  • Year and Date: 2007-07-06
• [Book] スパッタ実務[q&a集] (2009)
  • Author(s): 中野武雄, 他
  • Total Pages: 315
  • Publisher: 技術情報協会
• [Book] スパッタ実務[Q & A集] (2009)
  • Author(s): 中野武雄, 他21名
  • Total Pages: 315
  • Publisher: 技術情報協会
• [Book] 薄膜ハンドブック(第2版) (2008)
  • Author(s): 中野武雄, 他
  • Publisher: オーム社
• [Remarks] 本研究で開発したシミュレーションプログラムの公開webページ
  • URL: http://surf.st.seikei.ac.jp/HISPUT/